화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Comparative study of Cl-2, Cl-2/O-2, and Cl-2/N-2 inductively coupled plasma processes for etching of high-aspect-ratio photonic-crystal holes in InP
Carlstrom CF, van der Heijden R, Andriesse MSP, Karouta F, van der Heijden RW, van der Drift E, Salemink HWM
Journal of Vacuum Science & Technology B, 26(5), 1675, 2008
2 Cl-2/O-2-inductively coupled plasma etching of deep hole-type photonic crystals in InP
Carlstrom CF, van der Heijden R, Karouta F, van der Heijden RW, Salemink HWM, van der Drift E
Journal of Vacuum Science & Technology B, 24(1), L6, 2006