화학공학소재연구정보센터
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No. Article
1 Hetero- and homogeneous three-dimensional hierarchical tungsten oxide nanostructures by hot-wire chemical vapor deposition
Houweling ZS, Harks PPRML, Kuang Y, van der Werf CHM, Geus JW, Schropp REI
Thin Solid Films, 575, 76, 2015
2 Optimization of hydrogenated amorphous silicon germanium thin films and solar cells deposited by hot wire chemical vapor deposition
Veldhuizen LW, Van der Werf CHM, Kuang Y, Bakker NJ, Yun SJ, Schropp REI
Thin Solid Films, 595, 226, 2015
3 All hot wire chemical vapor deposition low substrate temperature transparent thin film moisture barrier
Spee DA, Schipper MR, van der Werf CHM, Rath JK, Schropp REI
Thin Solid Films, 532, 84, 2013
4 Synthesis of poly(meta-diethynyl benzene) with initiated chemical vapour deposition
Bakker R, Weijers P, Spee DA, van Steenbergen MJ, van der Werf CHM, Rath JK, Schropp REI
Thin Solid Films, 519(14), 4418, 2011
5 Comparison of surface passivation of crystalline silicon by a-Si:H with and without atomic hydrogen treatment using hot-wire chemical vapor deposition
Schuttauf JWA, van der Werf CHM, van Sark WGJHM, Rath JK, Schropp REI
Thin Solid Films, 519(14), 4476, 2011
6 Polymer layers by initiated chemical vapor deposition for thin film gas barrier encapsulation
Spee DA, Bakker R, van der Werf CHM, van Steenbergen MJ, Rath JK, Schropp REI
Thin Solid Films, 519(14), 4479, 2011
7 Response to simulated typical daily outdoor irradiation conditions of thin-film silicon-based triple-band-gap, triple-junction solar cells
Krishnan P, Schuttauf JWA, van der Werf CHM, Hassanzadeh BH, van Sark WGJHM, Schropp REI
Solar Energy Materials and Solar Cells, 93(6-7), 691, 2009
8 Nanostructured thin films for multibandgap silicon triple junction solar cells
Schropp REI, Li H, Franken RHJ, Rath JK, van der Werf CHM, Schuttauf JA, Stolk RL
Solar Energy Materials and Solar Cells, 93(6-7), 1129, 2009
9 Ultrafast deposition of silicon nitride and semiconductor silicon thin films by hot wire chemical vapor deposition
Schropp REI, van der Werf CHM, Verlaan V, Rath JK, Li H
Thin Solid Films, 517(10), 3039, 2009
10 Reversibility of silicidation of Ta filaments in HWCVD of thin film silicon
van der Werf CHM, Li H, Verlaan V, Oliphant CJ, Bakker R, Houweling ZS, Schropp REI
Thin Solid Films, 517(12), 3431, 2009