1 - 11 |
Sub-threshold 10T SRAM bit cell with read/write XY selection Feki A, Allard B, Turgis D, Lafont JC, Drissi FT, Abouzeid F, Haendler S |
12 - 17 |
Effect of SiNx gate insulator thickness on electrical properties of SiNx/In0.17Al0.83N/AlN/GaN MIS-HEMTs Downey BP, Meyer DJ, Katzer DS, Marron TM, Pan M, Gao X |
18 - 26 |
An efficient BTX sensor based on ZnO nanoflowers grown by CBD method Acharyya D, Bhattacharyya P |
27 - 33 |
Static impedance behavior of programmable metallization cells Rajabi S, Saremi M, Barnaby HJ, Edwards A, Kozicki MN, Mitkova M, Mahalanabis D, Gonzalez-Velo Y, Mahmud A |
34 - 43 |
Numerical study of inhomogeneity effects on Hall measurements of graphene films Lee K, Asbeck P |
44 - 49 |
Doping induces large variation in the electrical properties of MoS2 monolayers Eshun K, Xiong HD, Yu S, Li QL |
50 - 53 |
High accuracy thermal resistance measurement in GaN/InGaN laser diodes Wen PY, Li DY, Zhang SM, Liu JP, Zhang LQ, Zhou K, Feng MX, Li ZC, Tian AQ, Yang H |
54 - 62 |
On the permanent component profiling of the negative bias temperature instability in p-MOSFET devices Djezzar B, Tahi H, Benabdelmoumene A, Chenouf A, Goudjil M, Kribes Y |
63 - 67 |
Reactively sputtered hafnium oxide on silicon dioxide: Structural and electrical properties Kolkovsky V, Lukat K, Kurth E, Kunath C |
68 - 77 |
Palladium contamination in silicon Polignano ML, Mica I, Ceresoli M, Codegoni D, Somaini F, Bianchi I, Volonghi D |
78 - 80 |
Obtaining DC and AC isothermal electrical characteristics for RF MOSFET Sahoo AK, Fregonese S, Scheer P, Celi D, Juge A, Zimmer T |
81 - 86 |
Radiation-enhanced gate-induced-drain-leakage current in the 130 nm partially-depleted SOI pMOSFET Peng C, Hu ZY, Ning BX, Dai LH, Bi DW, Zhang ZX |