화학공학소재연구정보센터

Solid-State Electronics

Solid-State Electronics, Vol.133 Entire volume, number list
ISSN: 0038-1101 (Print) 

In this Issue (13 articles)

1 - 5 Effects of mechanical stresses on the reliability of low-temperature polycrystalline silicon thin film transistors for foldable displays
Bae MS, Park C, Shin D, Lee SM, Yun I
6 - 9 The electrical performance and gate bias stability of an amorphous InGaZnO thin-film transistor with HfO2 high-k dielectrics
Wang RZ, Wu SL, Li XY, Zhang JT
10 - 16 Properties of N-rich Silicon Nitride Film Deposited by Plasma-Enhanced Atomic Layer Deposition
Jhang PC, Lu CP, Shieh JY, Yang LW, Yang T, Chen KC, Lu CY
17 - 24 Charge based, continuous compact model for the channel current in organic thin-film transistors for all regions of operation
Hain F, Graef M, Iniguez B, Kloes A
25 - 30 A new high-voltage interconnection shielding method for SOI monolithic ICs
Zhang L, Zhu J, Sun WF, Huang XQ, Zhao MN, Chen JJ, Shi LX, Chen J, Ding DS
31 - 37 Study on the electrical degradation of AlGaN/GaN MIS-HEMTs induced by residual stress of SiNX passivation
Bai ZY, Du JF, Liu Y, Xin Q, Liu Y, Yu Q
38 - 44 Forming operation in Ge-rich GexSbyTez phase change memories
Palumbo E, Zuliani P, Borghi M, Annunziata R
45 - 52 Study on the influence of gamma-ray total dose radiation effect on the electrical properties of the uniaxial strained Si nanometer NMOSFET
Hao MR, Hu HY, Wang B, Liao CG, Kang HY, Su H
53 - 63 Van-der-Pauw measurement on devices with four contacts and two orthogonal mirror symmetries
Ausserlechner U
64 - 69 Reliability improvement in GaN HEMT power device using a field plate approach
Wu WH, Lin YC, Chin PC, Hsu CC, Lee JH, Liu SC, Maa JS, Iwai H, Chang EY, Hsu HT
70 - 77 Low frequency noise investigation of 2-3 mu m GaSb-based laser diodes
Glemza J, Pralgauskaite S, Palenskis V, Matukas J
78 - 82 GaN-based Schottky barrier ultraviolet photodetectors with graded doping on patterned sapphire substrates
Mou WJ, Zhao LN, Chen LL, Yan DW, Ma HR, Yang GF, Gu XF
83 - 87 Strong Fermi-level pinning induced by argon inductively coupled plasma treatment and post-metal deposition annealing on 4H-SiC
Tsui BY, Cheng JC, Yen CT, Lee CY