1 - 2 |
Selected Full-Length Papers from the EUROSOI 2011 Conference Foreword Godoy A, Gamiz F |
3 - 7 |
Function of the parasitic bipolar transistor in the 40 nm PD SOI NMOS device considering the floating body effect Chena CH, Kuo JB, Chen D, Yeh CS |
8 - 13 |
Analysis and optimisation of lateral thin-film silicon-on-insulator (SOI) PMOS transistor with an NBL layer in the drift region Cortes I, Toulon G, Morancho F, Flores D, Hugonnard-Bruyere E, Villard B |
14 - 19 |
LDMOS-transistors on semi-insulating silicon-on-polycrystalline-silicon carbide substrates for improved RF and thermal properties Lotfi S, Li LG, Vallin O, Vestling L, Norstrom H, Olsson J |
20 - 26 |
Low frequency noise characterization in n-channel FinFETs Talmat R, Achour H, Cretu B, Routoure JM, Benfdila A, Carin R, Collaert N, Mercha A, Simoen E, Claeys C |
27 - 32 |
Improved 1/f noise characterization of strained SiGe on insulator MOSFETs fabricated on wafers obtained by the Ge enrichment technique Valenza M, Husseini JE, Martinez F, Bawedin M, Le Royer C, Damlencourt JF |
33 - 38 |
CMOS without doping: Multi-gate silicon-nanowire field-effect-transistors Wessely F, Krauss T, Schwalke U |
39 - 43 |
Analysis of temperature variation influence on the analog performance of 45 degrees rotated triple-gate nMuGFETs Pavanello MA, de Souza M, Martino JA, Simoen E, Claeys C |
44 - 49 |
GIDL behavior of p- and n-MuGFET devices with different TiN metal gate thickness and high-k gate dielectrics Galeti M, Rodrigues M, Martino JA, Collaert N, Simoen E, Claeys C |
50 - 58 |
Ultra-thin body and thin-BOX SOI CMOS technology analog figures of merit Kilchytska V, Arshad MKM, Makovejev S, Olsen S, Andrieu F, Poiroux T, Faynot O, Raskin JP, Flandre D |
59 - 66 |
FinFlash with buried storage ONO layer for flash memory application Chang SJ, Bawedin ML, Xiong W, Lee JH, Lee JH, Cristoloveanu S |
67 - 72 |
An analysis on the ambipolar current in Si double-gate tunnel FETs Hraziia, Vladimirescu A, Amara A, Anghel C |
73 - 80 |
Subband engineering in n-type silicon nanowires using strain and confinement Stanojevic Z, Sverdlov V, Baumgartner O, Kosina H |
81 - 91 |
Confinement-induced carrier mobility increase in nanowires by quantization of warped bands Neophytou N, Kosina H |
92 - 100 |
Influence of discrete dopant on quantum transport in silicon nanowire transistors Akhavan ND, Ferain I, Yu R, Razavi P, Colinge JP |
101 - 105 |
Reaching sub-32 nm nodes: ET-FDSOI and BOX optimization Sampedro C, Gamiz F, Donetti L, Godoy A |
106 - 113 |
Quantum simulation of an ultrathin body field-effect transistor with channel imperfections Vyurkov V, Semenikhin I, Filippov S, Orlikovsky A |