1705 - 1716 |
A physical compact model for direct tunneling from NMOS inversion layers Clerc R, O'Sullivan P, McCarthy KG, Ghibaudo G, Pananakakis G, Mathewson A |
1717 - 1723 |
A study of hot-carrier induced interface-trap profiles in lateral asymmetric channel MOSFETs using a novel charge pumping technique Mahapatra S, Rao VR, Vasi J, Cheng B, Woo JCS |
1725 - 1732 |
A two dimensional analytical model for the current distribution in a lateral IGBT Henkel I, Feiler W, Kostka A |
1733 - 1741 |
Hydrogenation effects on AlGaAs/GaAs heterojunction bipolar transistors Luo B, Ip K, Ren F, Lee KP, Abernathy CR, Pearton SJ, Mackenzie KD |
1743 - 1746 |
Properties of HgCdTe crystals passivated by A(2)B(6) layers Virt I, Bilyk M, Stefaniuk I, Kuzma M |
1747 - 1751 |
High-concentration diffusion profiles of low-energy ion-implanted B, As and BF2 in bulk silicon Suzuki K |
1753 - 1761 |
Non-local microscopic view of signal propagation times in BJTs biased up to high currents Palestri P, Selmi L |
1763 - 1771 |
Design considerations for buried p-layers to suppress substrate-trapping effects in GaAs MESFETs Kunihiro K, Ohno Y |
1773 - 1785 |
Modeling of time dependence of hole current and prediction of Q(BD) and t(BD) for thin gate MOS devices based upon anode hole injection Quddus MT, DeMassa TA, Schroder DK, Sanchez JJ |
1787 - 1791 |
Determination of the Fowler-Nordheim tunneling parameters from the Fowler-Nordheim plot Chiou YL, Gambino JP, Mohammad M |
1793 - 1798 |
Hall effect measurements in double-gate SOI MOSFETs Vandooren A, Cristoloveanu S, Flandre D, Colinge JP |
1799 - 1803 |
MOSFET triggering silicon controlled rectifiers for electrostatic discharge protection circuits Jang SL, Li SH |
1805 - 1808 |
On the structure of the recessed-channel MOSFET for sub-100 nm SiCMOS Tao M, Varahramyan K |
1809 - 1813 |
The n+n combined structure gas sensor based on burnable gases Wang YD, Wu XH, Li YF, Zhou ZL |
1815 - 1819 |
Voltage dependence of photocurrent in metal-semiconductor-metal structures under front-illuminated conditions Niemcharoen S, Kobayashi K, Kimura M, Sato K |
1821 - 1826 |
Dynamic behavior of scaled microdisk lasers Thiyagarajan SMK, Levi AFJ |
1827 - 1830 |
Phase-locking of an InP/InGaP/InGaAs resonant tunneling diode relaxation oscillator by direct optical injection Kahn M, Lasri J, Orenstein M, Ritter D, Eisenstein G |
1831 - 1835 |
Growth and characterization of InGaAs/InAlAs quantum cascade lasers Liu FQ, Zhang QS, Zhang YZ, Ding D, Xu B, Wang ZG |
1837 - 1842 |
Electrical effects of N-2 plasma exposure on dry-etch damage in p- and n-GaN Schottky diodes Kent DG, Lee KP, Zhang AP, Luo B, Overberg ME, Abernathy CR, Ren F, Mackenzie KD, Pearton SJ, Nakagawa Y |
1843 - 1845 |
Implication of non-ideality of coupling capacitors in the performance of multistage amplifiers Fahmi MME, El Ahl AMHS, Mohammad SN |
1847 - 1850 |
Lateral current spreading in SiC Schottky diodes using metal overlap edge termination Zhang Q, Sudarshan TS |
1851 - 1857 |
Design considerations for 25 nm MOSFET devices Saha S |
1859 - 1865 |
Investigation of degeneracy of current-voltage characteristics of asymmetrical IGBT with n-buffer layer concentration Khanna VK, Kumar A, Sood SC, Gupta RP, Jasuja KL, Maj B, Kostka A |