화학공학소재연구정보센터

Journal of Chemical Engineering of Japan

Journal of Chemical Engineering of Japan, Vol.48, No.9 Entire volume, number list
ISSN: 0021-9592 (Print) 

In this Issue (9 articles)

721 - 729 Modeling of Bed Depth Profile of Materials in Rotary Drums Using Support Vector Regression (SVR): Comparison with a Well-Structured Parametric Model
Yousefi MR, Shirvani M
730 - 741 Effect of Aperture Structure of Dutch Weave Mesh on Flow Resistivity
Yoshida Y, Inoue Y, Shimosaka A, Shirakawa Y, Hidaka J
742 - 755 Integrated Framework for Determining Safety Integrity Level for Improved Process Safety
Dan S, Kim J, Kim IH, Cho S, Yoon ES, Shin D
756 - 765 Fault Detection Based on Diffusion Maps and k Nearest Neighbor Diffusion Distance of Feature Space
Wang GZ, Liu JC, Li Y, Shang LL
766 - 773 Propagation Analysis of Plant-Wide Oscillations Using Partial Directed Coherence
Zhang L, Zheng JR, Xia CM
774 - 781 Saccharification of Lignocellulosic Biomass under Mild Condition Using Ionic Liquid
Muranaka Y, Suzuki T, Hasegawa I, Mae K
782 - 786 Comparison of Rhodococcus erythropolis CS98 Strain Immobilized in Agarose Gel and PVA Gels for Accumulation of Radioactive Cs-137
Takei T, Kamagasako T, Yuzi Y, Tomioka N, Yoshida M
787 - 794 Crystal Growth of Anthracene Thin Films on Silicon by Rapid Expansion of Supercritical Solutions (RESS) Using Carbon Dioxide
Fujii T, Uchida H
795 - 803 Effects of Solution Concentrations on Crystal Growth of Anthracene Thin Films on Silicon by Rapid Expansion of Supercritical Solutions (RESS) Using Carbon Dioxide
Fujii T, Takahashi Y, Uchida H