1 - 10 |
Simulation and Optimization of the Dual Lithium Ion Insertion Cell Fuller TF, Doyle M, Newman J |
10 - 15 |
Electrochemical Synthesis of Composite Films of Manganese-Dioxide and Polypyrrole and Their Properties as an Active Material in Lithium Secondary Batteries Kuwabata S, Kishimoto A, Tanaka T, Yoneyama H |
15 - 27 |
Modeling of Cylindrical Alkaline Cells .5. High Discharge Rates Podlaha EJ, Cheh HY |
28 - 35 |
Modeling of Cylindrical Alkaline Cells .6. Variable Discharge Conditions Podlaha EJ, Cheh HY |
35 - 40 |
Charge and Ion-Transport in Poly(Pyrrole Copper Phthalocyanine Tetrasulfonate) During Redox Switching Reynolds JR, Pyo MH, Qiu YJ |
41 - 45 |
Electrocatalytic Activity of Nafion-Impregnated Pyrolyzed Cobalt Phthalocyanine - A Correlative Study Between Rotating-Disk and Solid Polymer Electrolyte Fuel-Cell Electrodes Tamizhmani G, Dodelet JP, Guay D, Lalande G |
46 - 53 |
Selective Electrodeposition of Catalyst Within Membrane-Electrode Structures Verbrugge MW |
54 - 63 |
Theoretical-Analysis of the Discharge Performance of a Niooh/H-2 Cell Mao Z, Devidts P, White RE, Newman J |
64 - 70 |
Electrochromic Oxidation and Reduction of Cobalt and Zinc Naphthalocyanine Thin-Films Yanagi H, Toriida M |
71 - 78 |
Corrosion of Alpha-Al Bronze in Saline Water Ateya BG, Ashour EA, Sayed SM |
78 - 82 |
The Effect of Solution pH and Heat-Treatment on the Properties of Electroless Nickel-Boron Films Evans WT, Schlesinger M |
83 - 90 |
X-Ray-Absorption Study of Electrochemically Grown Oxide-Films on Alcr Sputtered Alloys Frankel GS, Schrott AG, Davenport AJ, Isaacs HS, Jahnes CV, Russak MA |
91 - 96 |
The Dissolution Behavior of Silver in Ammoniacal Solutions with Cupric Ammine Guan YC, Han KN |
96 - 104 |
Surface-Films Produced by Cathodic Polarization of Aluminum Lin CF, Porter MD, Hebert KR |
L1 - L3 |
The Surface-Chemistry of Lithium Electrodes in Alkyl Carbonate Solutions Aurbach D, Einely Y, Zaban A |
L4 - L6 |
Influence of Polarization Time and Temperature on the Adsorption of Carbon-Dioxide on Platinum Maier CU, Bandi A, Specht M |
L6 - L8 |
In-Situ Multielement XANES Study of Formation and Reduction of the Oxide Film on Stainless-Steel Davenport AJ, Sansone M, Bardwell JA, Aldykiewicz AJ, Taube M, Vitus CM |
L8 - L9 |
Enhancement of the Reactive Deposition Rate of Tin Films at Low Nitrogen-Content Barankova H, Bardos L, Berg S |
104 - 110 |
Changes Produced by Cathodic Polarization in the Electrical-Conduction Behavior of Surface-Films on Aluminum Lin CF, Hebert KR |
111 - 116 |
Chemical-Composition, Chemical-States, and Resistance to Localized Corrosion of Passive Films on an Fe-17-Percent-Cr Alloy Yang WP, Costa D, Marcus P |
116 - 122 |
In-Situ Atomic-Force Microscopy Study of the Plating and Stripping of Silver Kowal K, Xie L, Huq R, Farrington GC |
122 - 130 |
The Role of Oxygen Reduction in Electrical-Stimulation of Neural Tissue Morton SL, Daroux ML, Mortimer JT |
131 - 140 |
Zinc Electrowinning in Acidic Sulfate Electrolytes - Impedance Analysis and Modeling of the Influence on Nickel Impurities Cachet C, Wiart R |
140 - 147 |
Polyoxometalate-Based Layered Composite Films on Electrodes - Preparation Through Alternate Immersions in Modification Solutions Ingersoll D, Kulesza PJ, Faulkner LR |
147 - 150 |
Partially Immersed Cylindrical Horizontally Revolving Electrodes for the Production of Conducting Polymers Kathirgamanathan P, Qayyum MM |
151 - 156 |
A Finite-Difference Method for Pseudo-2-Dimensional Boundary-Value-Problems Mao Z, White RE |
156 - 160 |
Study of the Redox Process of Poly(2-Naphthol) Film Using in-Situ Multiple Internal-Reflection FTIR Spectroscopy Pham MC, Lacaze PC |
161 - 172 |
Modeling the Wafer Temperature Profile in a Multiwafer LPCVD Furnace Badgwell TA, Trachtenberg I, Edgar TF |
173 - 178 |
Improving Axial Oxygen Precipitation Uniformity in Cz Silicon-Crystals Using the S-Curve Concept Chiou HD |
178 - 184 |
The Effects of Process-Induced Defects on the Chemical Selectivity of Highly Doped Boron Etch Stops in Silicon Desmond CA, Hunt CE, Farrens SN |
184 - 187 |
Dynamic Dilution Calibration System for Calibrating Analytical Instruments Used in Gas-Analysis Ketkar SN, Scott AD, Depinillos JV |
188 - 192 |
Influence of the Existence of an Underlying SiO2 Layer on the Lateral Solid-Phase Epitaxy of Amorphous-Silicon Morimoto Y, Nakanishi S, Oda N, Yamaji T, Matuda H, Ogata H, Yoneda K |
192 - 205 |
Ion-Implanted Photoresist and Damage-Free Stripping Hirose K, Shimada H, Shimomura S, Onodera M, Ohmi T |
205 - 210 |
Process and Film Characterization of Chemical-Bath-Deposited ZnS Thin-Films Dona JM, Herrero J |
210 - 220 |
Covalent Binding of Pd Catalysts to Ligating Self-Assembled Monolayer Films for Selective Electroless Metal-Deposition Dressick WJ, Dulcey CS, Georger JH, Calabrese GS, Calvert JM |
220 - 225 |
Effect of Gas-Diffusion Process on Sensing Properties of SnO2 Thin-Film Sensors in a SiO2/SnO2 Layer-Built Structure Fabricated by Sol-Gel Process Feng CD, Shimizu Y, Egashira M |
225 - 230 |
Effects of Thermal and Chemical Treatments on the Composition and Structure of Electrodeposited CuInSe2 Thin-Films Guillen C, Herrero J |
230 - 237 |
Dual-Bath Electrodeposition of Cu/Ni Compositionally Modulated Multilayers Haseeb AS, Celis JP, Roos JR |
237 - 241 |
Structure of TiO2/SiO2 Multilayer Films Nakayama T |
242 - 246 |
Fe Incorporation and Precipitation in Semiinsulating Fe-Doped InP Grown by Metalorganic Chemical-Vapor-Deposition Chu SN, Logan RA, Ha NT, Nakahara S, Karlicek RF, Grenko JA |
246 - 250 |
Electrical-Conductivity Measurement in Liquefied Hydrogen-Chloride Ishihara Y, Ohmi T, Hasegawa H, Ikeda T, Takasaki T, Yamane S, Fukushima R |
251 - 254 |
A New Global Planarization Technique Using in-Situ Isotropic Photoresist Mask Erosion Grivna G, Goodner R |
255 - 258 |
Surface Damage on GaAs Etched Using a Multipolar Electron-Cyclotron-Resonance Source Ko KK, Pang SW |
259 - 263 |
Growth-Rate and Characterization of Silicon-Oxide Films Grown in N2O Atmosphere in a Rapid Thermal Processor Lange P, Bernt H, Hartmannsgruber E, Naumann F |
264 - 269 |
Hydrofluoric-Acid Etching of Silicon Dioxide Sacrificial Layers .1. Experimental-Observations Monk DJ, Soane DS, Howe RT |
270 - 274 |
Hydrofluoric-Acid Etching of Silicon Dioxide Sacrificial Layers .2. Modeling Monk DJ, Soane DS, Howe RT |
274 - 277 |
Metal Impurity Evaluation in Silane Gas from the Qualification of Poly-Si Layers Morin M, Koyanagi M, Friedt JM, Hirose M |
278 - 281 |
Theoretical Aspects for Low-Pressure Diamond Syntheses Wang JT, Cao CB, Zheng PJ |
282 - 290 |
Evaluation of Isothermal Chemical-Vapor Infiltration with Langmuir-Hinshelwood Type Kinetics Moene R, Dekker JP, Makkee M, Schoonman J, Moulijn JA |
291 - 293 |
Effect of Gas Ambient on the Resistance of Bf(2)+ Ion-Implanted Polycrystalline Diamond Film Lee SL, Lin SJ, Hwang J |
294 - 298 |
On the Amorphous and Crystalline State of Electrodeposited Nickel-Phosphorus Coatings Bredael E, Blanpain B, Celis JP, Roos JR |
299 - 302 |
Electrical-Conduction Through Anodic Oxides on Sulfur Passivated InP Eftekhari G |
302 - 306 |
Intermetallic Compound Formation in Ti/Al Alloy Thin-Film Couples and Its Role in Electromigration Lifetime Jawarani D, Stark JP, Kawasaki H, Olowolafe JO, Lee CC, Klein J, Pintchovski F |
306 - 310 |
Spectroscopic Ellipsometry and Atomic-Force Microscopy of Polyphenylene Oxide-Films Wall JF, Brumfield JC, Murray RW, Irene EA |
L10 - L11 |
Electrochemically Layered Copper-Nickel Nanocomposites with Enhanced Hardness Simunovich D, Schlesinger M, Snyder DD |