Journal of the Electrochemical Society

Journal of the Electrochemical Society, Vol.142, No.1 Entire volume, number list

ISSN: 0013-4651 (Print)

In this Issue (62 articles)

1 - 8	Performance Modeling of the Ballard-Mark-IV Solid Polymer Electrolyte Fuel-Cell .1. Mechanistic Model Development Amphlett JC, Baumert RM, Mann RF, Peppley BA, Roberge PR, Harris TJ
9 - 15	Performance Modeling of the Ballard-Mark-IV Sold Polymer Electrolyte Fuel-Cell .2. Empirical-Model Development Amphlett JC, Baumert RM, Mann RF, Peppley BA, Roberge PR, Harris TJ
16 - 19	Chemical-Stability of Solutions of Niobium-V in Molten NaCl-KCl at 750-Degrees-C Arurault L, Bouteillon J, Poignet JC
20 - 26	In-Situ Raman-Study on Electrochemical Li-Intercalation into Graphite Inaba M, Yoshida H, Ogumi Z, Abe T, Mizutani Y, Asano M
26 - 33	In-Situ Spectroelectrochemical Studies on the Sulfur-Dioxide Reduction in Dimethylsulfoxide Kim BS, Park SM
34 - 40	Spectroelectrochemical Studies on the Reduction of Thionyl Chloride Kim BS, Park SM
40 - 45	Electrochemical Oxidation of Ethanol in Aqueous Carbonate Solutions Park SM, Chen NC, Doddapaneni N
46 - 51	X-Ray-Absorption Studies of the Effect of Plasticizers on Ion-Pair Dissociation in a Poly(Ethylene Oxide) Potassium-Salt Complex Yang XQ, Lee HS, Hanson LK, Mcbreen J, Xu ZS, Skotheim TA, Okamoto Y, Lu F
51 - 58	The Electrochemical-Behavior of the Al3Ta Intermetallic Compound and Pitting in 2-Phase Al-Ta Alloys Buchheit RG, Zavadil KR, Scully JR, Knight TO
58 - 63	Hydrogen Sensing with Thin-Filmed Copper Dicyanoanthraquinone Diimine Electrodes Wang CM, Wang WY, Lin HL, Liu LK
64 - 69	Current Distribution at the Electrodes in Zinc Electrowinning Cells Bouzek K, Borve K, Lorentsen OA, Osmundsen K, Rousar I, Thonstad J
70 - 74	Residual-Stress Measurements in Electrolytic Copper-Nickel Compositionally Modulated Multilayers Celis JP, Vanacker K, Callewaert K, Vanhoutte P
74 - 81	An X-Ray Photoelectron Spectroscopic Study of the Passive Film Formed on Pure Mo and Mosi2 in 4M HCl Halada GP, Clayton CR, Herman H, Sampath S, Tiwari R
81 - 87	Fabrication of Gold Bumps Using Gold Sulfite Plating Honma H, Hagiwara K
87 - 91	The Effects of Aeration and Accumulation of Carbonate Ions on the Mechanical-Properties of Electroless Copper Coatings Matsuoka M, Yoshida Y, Iwakura C
91 - 96	The Electrochemical-Behavior of Electroless-Plated Ni-P Alloys in Concentrated NaOH Solution Lo PH, Tsai WT, Lee JT, Hung MP
97 - 101	Optimization of Porosity and Thickness of a Battery Electrode by Means of a Reaction-Zone Model Newman J
L1 - L2	Ambient-Temperature, Rechargeable, All-Solid Lithium Polypyrrole Polymer Battery Kakuda S, Momma T, Osaka T, Appetecchi GB, Scrosati B
L3 - L5	Layered Polyaniline Composites with Cation-Exchanging Properties for Positive Electrodes of Rechargeable Lithium Batteries Morita M, Miyazaki S, Ishikawa M, Matsuda Y, Tajima H, Adachi K, Anan F
L6 - L8	A New Charge Storage Mechanism for Electrochemical Capacitors Zheng JP, Jow TR
L8 - L11	The Effect of the Hydrostatic-Pressure on the Ionic-Conductivity in a Perovskite Lanthanum Lithium Titanate Inaguma Y, Yu JD, Shan YJ, Itoh M, Nakamura T
102 - 111	The Wavelength and Potential Dependency of Spatially-Resolved Photoelectrochemical Measurements on TiO2 Preusser S, Stimming U, Tokunaga S
112 - 119	An Analytical Description of the Consequences of Abandoning the Principles of Detailed Balance and Microscopic Reversibility in Semiconductor Photoelectrochemistry Shreve GA, Lewis NS
120 - 124	Chemical-Reactions in Phases at Different Electric Potentials Alberty RA
125 - 129	Proton Deficiency in a Phosphoric-Acid Fuel-Cell Aragane J, Urushibata H, Murahashi T
130 - 135	Electrolytic Carbonylation of Methanol over the Cucl2 Anode in the Gas-Phase Otsuka K, Yagi T, Yamanaka I
136 - 142	A New Oscillatory Electrochemical Phenomenon Observed in the Electropolymerization of Pyrrole in Mecn+n(Bu)(4)PF6 on an Iron Electrode Studied by the Ring-Disk-Electrode Technique Petitjean J, Aeiyach S, Ferreira CA, Lacaze PC, Takenouti H
142 - 148	Electrochemical Impedance Study of Platinum-Electrode in Fused Na2SO4 10-Mole Percent NaVO3 Melts Zheng XJ, Rapp RA
148 - 153	Preparation of Perovskite-Type Oxides of Cobalt by the Malic-Acid Aided Process and Their Electrocatalytic Surface-Properties in Relation to Oxygen Evolution Tiwari SK, Chartier P, Singh RN
154 - 156	Hydrogen-Atom Direct-Entry Mechanism into Metal Membranes Zheng G, Popov BN, White RE
157 - 160	Humidity Dependence of Carbon-Monoxide Oxidation Rate in a Nafion-Based Electrochemical-Cell Lee SB, Cocco A, Keyvani D, Maclay GJ
161 - 165	Theoretical-Analysis of the Electromotive-Force of a Cell Incorporating a Composition Gradient Solid-Electrolyte Mukhopadhyay S, Jacob KT
166 - 169	Preparation and Characterization of Copper-Films Deposited in Hydrogen Remote Plasma by Copper(II) Acetylacetonate Aoki T, Wickramanayaka S, Wrobel AM, Nakanishi Y, Hatanaka Y
170 - 176	The Band Model and the Etching Mechanism of Silicon in Aqueous KOH Chen LC, Chen MJ, Lien CH, Wan CC
177 - 182	The Processing Windows for Selective Copper Chemical-Vapor-Deposition from Cu(Hexafluoroacetylacetonate)Trimethylvinylsilane Chiou JC, Juang KC, Chen MC
183 - 185	The Oxidation of Chemically Vapor-Deposited Silicon-Nitride and Silicon-Nitride Coated Graphite Fergus JW, Worrell WL
186 - 190	PECVD Silicon-Nitride as a Gate Dielectric for Amorphous-Silicon Thin-Film-Transistor - Process and Device Performance Kuo Y
191 - 195	Soft Cleaning by in Vacuo Ultraviolet-Radiation Combined with Molecular-Hydrogen Gas Before Molecular-Beam Epitaxial Layer Growth Lippert G, Thieme HJ, Osten HJ
195 - 201	Hydrogen in Porous Silicon - Vibrational Analysis of Sihx Species Ogata Y, Niki H, Sakka T, Iwasaki M
202 - 206	Effect of Stress in the Deposited Silicon-Nitride Films on Boron-Diffusion of Silicon Osada K, Zaitsu Y, Matsumoto S, Yoshida M, Arai E, Abe T
206 - 211	Electrical Characterization and Surface-Analysis of Dry Etch-Induced Damage on Si After Etching in on ECR Source Sung KT, Pang SW, Cole MW, Pearce N
211 - 216	Sensitive Light-Scattering as a Semiquantitative Method for Studying Photoresist Stripping Rotondaro AL, Meuris M, Schmidt HF, Heyns MM, Claeys C, Hellemans L, Snauwaert J
216 - 226	Postchemical-Mechanical Planarization Cleanup Process for Interlayer Dielectric Films Roy SR, Ali I, Shinn G, Furusawa N, Shah R, Peterman S, Witt K, Eastman S, Kumar P
226 - 231	Experimental-Study of Diffusion and Interface Segregation of P in an LPCVD Si-Carbon Emitter Structure Theunissen MJ, Martens MC, Clegg JB, Zalm PT, Vandenhoudt DE
232 - 236	Silicon-Carbide Wafer Bonding Tong QY, Gosele U, Yuan C, Steckl AJ, Reiche M
237 - 243	Selective Etching of Phosphosilicate Gloss Th Low-Pressure Vapor HF Watanabe H, Ohnishi S, Honma I, Kitajima H, Ono H, Wilhelm RJ, Sophie AJ
244 - 248	Chemical-Vapor-Deposition of (Ba,Sr)TiO3 Yoshida M, Yamaguchi H, Sakuma T, Miyasaka Y, Lesaicherre PY, Ishitani A
249 - 254	Solid-State Hydrogen Sensors Using Palladium-Nickel Alloys - Effect of Alloy Composition on Sensor Response Hughes RC, Schubert WT, Buss RJ
254 - 259	Effects of Cu on CdTe/CdS Heterojunction Solar-Cells with Au/Cu Contacts Chou HC, Rohatgi A, Thomas EW, Kamra S, Bhat AK
259 - 266	A Gas-Phase and Surface Kinetics Model for Silicon Epitaxial-Growth with Sih2Cl2 in an Rtcvd Reactor Hierlemann M, Kersch A, Werner C, Schafer H
267 - 272	Influences of Interfacial Misfit Stress on Modulated Microstructures of InGaAsP/InP Heterostructures Lee JW, Kim TI, Tsakalakos T
273 - 282	SiO2/Si Interface Structures and Reliability Characteristics Hasegawa E, Ishitani A, Akimoto K, Tsukiji M, Ohta N
282 - 285	Ionic Contamination in Metal-Oxide-Semiconductor Al/SiO2/3C-SiC Capacitors Raynaud C, Autran JL, Briot JB, Balland B, Becourt N, Jaussaud C
285 - 289	Boron Incorporation in Epitaxial Silicon Using Si2H6 and B2H6 in an Ultrahigh-Vacuum Rapid Thermal Chemical-Vapor-Deposition Reactor Sanganeria MK, Violette KE, Ozturk MC, Harris G, Maher DM
290 - 297	Single-Walled Tubes and Encapsulation of Nanocrystals into Carbon Clusters Seraphin S
298 - 302	Effect of SiO2 Surface-Treatment on the Solid-Phase Crystallization of Amorphous-Silicon Films Shimizu T, Ishihara S
303 - 311	Low-Temperature Diffusion of Alkali-Earth Cations in Thin, Vitreous SiO2-Films Williams CK, Hamaker RW, Ganesan SG, Kuehn RT, Swartzel KR, Osullivan J
312 - 319	Residue-Free Reactive Ion Etching of Silicon-Carbide in Fluorinated Plasmas .2. 6H-SiC Yih PH, Steckl AJ
L11 - L13	Surface-Reaction of Fluoroalkyl-Functional Silanes on SnO2 Tada H
L14 - L16	Anodic Passivation of P-InP(100) in (NH4)(2)S-X Solution Gao LJ, Bardwell JA, Lu ZH, Graham MJ, Norton PR
L16 - L18	A Novel-Approach to Combine Scanning Electrochemical Microscopy and Scanning Photoelectrochemical Microscopy Casillas N, James P, Smyrl WH
L19 - L21	X-Ray Diffuse-Scattering for the in-Situ Study of Electrochemically Induced Pitting on Metal-Surfaces Melendres CA, Feng YP, Lee DD, Sinha SK