Journal of the Electrochemical Society

Journal of the Electrochemical Society, Vol.143, No.4 Entire volume, number list

ISSN: 0013-4651 (Print)

In this Issue (60 articles)

L71 - L72	A New Successive System for Hydrogenation of Styrene Using a 2-Compartment Cell Separated by a Pd Sheet Electrode Iwakura C, Abe T, Inoue H
L73 - L75	Electrochemical Deposition of Pd, Ti, and Ge for Applications in GaAs Technology Schussler M, Statzner T, Lin CI, Krozer V, Horn J, Hartnagel HL
L75 - L77	Morphology Evolution of Zinc Iron Binary-Alloys Electrodeposited with Copper Additive Kondo K, Murakami T, Shinohara K
L78 - L80	High-Aspect-Ratio Microtunnel Technique to Empirically Model Electroless Deposition Desilva M, Shachamdiamand Y, Soave R, Kim HS
L80 - L82	Conductivity and Electrochemical Stability of Electrolytes Containing Organic-Solvent Mixtures with Lithium Tris(Trifluoromethanesulfonyl)Methide Walker CW, Cox JD, Salomon M
L83 - L85	Determination of Improved Selectivity Coefficients of Polymer Membrane Ion-Selective Electrodes by Conditioning with a Discriminated Ion Bakker E
L86 - L88	Thermal-Stability of Concentrated V(V) Electrolytes in the Vanadium Redox Cell Skyllaskazacos W, Menictas C, Kazacos M
L89 - L91	Electrolysis of Water in CuO/ZnO Heterocontact Humidity Sensor Yoo DJ, Park SJ
L92 - L94	Ohmic Resistance of the Electrode-Electrolyte Interface in Au/YSZ Oxygen Electrodes Kenjo T, Nakagawa T
1157 - 1160	Kinetics of Oxidation Processes on Lead Electrode in H2SO4 .3. To Study the Growth of the PbO Layer by Linear Sweep Voltammetry Guo YL, Hua SN, Xu HW, Yang YZ
1161 - 1168	Oxidation and Steam Deforming of CH4 on Ni and Fe Anodes Under Low Humidity Conditions in Solid Oxide Fuel-Cells Horita T, Sakai N, Kawada T, Yokokawa H, Dokiya M
1168 - 1175	Optimization of the Composition of the Li-1-Zni1+zo2 Electrode Materials - Structural, Magnetic, and Electrochemical Studies Rougier A, Gravereau P, Delmas C
1175 - 1182	Atmospheric Corrosion of Aluminum in the Presence of Ammonium-Sulfate Particles Lobnig RE, Siconolfi DJ, Maisono J, Grundmeier G, Streckel H, Frankenthal RP, Stratmann M, Sinclair JD
1182 - 1200	XPS and STM Study of Passive Films Formed on Fe-22Cr(110) Single-Crystal Surfaces Maurice V, Yang WP, Marcus P
1201 - 1206	Au(III) in Borate Medium - Electrochemical-Behavior and Application to Electroplating Wang XP, Isaev N, Osteryoung JG
1206 - 1213	A Palladium Sulfide Catalyst for Electrolytic Plating Bladon JJ, Lamola A, Lytle FW, Sonnenberg W, Robinson JN, Philipose G
1214 - 1217	In-Situ Monitoring of Grouted Electrolytes Kahanda GL, Gu JY, Tomkiewicz M, Kruger AA
1218 - 1225	Oxygen Evolution on Co-Cu-Zn Ternary Spinel Oxide-Coated Electrodes in Alkaline-Solution - Integration of Statistical, Electrochemical, and Textural Approaches Lee YS, Hu CC, Wen TC
1225 - 1232	Thermal-Stability of Proton Conducting Acid Doped Polybenzimidazole in Simulated Fuel-Cell Environments Samms SR, Wasmus S, Savinell RF
1233 - 1239	Real-Time Mass-Spectrometric Study of the Methanal Crossover in a Direct Methanol Fuel-Cell Wang JT, Wasmus S, Savinell RF
1240 - 1248	Comparison of Hydrogen Electroadsorption from the Electrolyte with Hydrogen Adsorption from the Gas-Phase Jerkiewicz G, Zolfaghari A
1248 - 1253	Toward a Reliable Value for the Diffusion-Coefficient of Cupric Ion in Aqueous-Solution Quickenden TI, Xu QZ
1254 - 1259	Proton Conductivity of Nafion-117 as Measured by a 4-Electrode AC-Impedance Method Sone Y, Ekdunge P, Simonsson D
1260 - 1263	Electroosmotic Drag Coefficient of Water and Methanol in Polymer Electrolytes at Elevated-Temperatures Weng D, Wainright JS, Landau U, Savinell RF
1264 - 1268	Selective Oxidation of Propene Using an Electrochemical Membrane Reactor with CeO2-Based Solid-Electrolyte Hamakawa S, Hayakawa T, York AP, Tsunoda T, Yoon YS, Suzuki K, Shimizu M, Takehira K
1269 - 1276	Electrochemistry of Conductive Polymer .19. Oxidation of Aniline at Bore and Polyaniline-Modified Platinum-Electrodes Studied by Electrochemical Impedance Spectroscopy Johnson BJ, Park SM
1277 - 1282	Electrochemistry of Conductive Polymers .20. Early Stages of Aniline Polymerization Studied by Spectroelectrochemical and Rotating-Ring-Disk Electrode Techniques Johnson BJ, Park SM
1283 - 1287	Selective Oxidation of Thiols to Disulfides at Polymeric Cobalt Phthalocyanine Chemically-Modified Electrodes Qi XH, Baldwin RP
1287 - 1292	Variable Diffusivity in Intercalation Materials - A Theoretical Approach Paxton B, Newman J
1292 - 1297	Study of the Poly(Oxymethylene Oligo-(Oxyethylene)) Lithium Metal Interface - Comparison of Linear, Cross-Linked, and Alkylated Electrolyte Films Sloop SE, Lerner MM
1297 - 1300	Synthesis of Lich(So2Cf3)(2) and Ionic-Conductivity of Polyether Salt Complexes Holcomb NR, Nixon PG, Gard GL, Nafshun RL, Lerner MM
1300 - 1305	Cementation of Copper on Aluminum in Alkaline-Solutions Djokic SS
1305 - 1313	Charge and Discharge Characteristics of Thermochargeable Galvanic Cells with on (Fe(CN)(6))(4-)/(Fe(CN)(6))(3-) Redox Couple Hirai T, Shindo K, Ogata T
1313 - 1318	On the Origin of Electrochemical Oscillations at Silicon Electrodes Lehmann V
1319 - 1325	The Etching of InP by Acidic Iodine Solutions - A Kinetic and Electrochemical Study Vermeir IE, Gomes WP
1326 - 1334	Reliability Evaluation of Manufacturing Processes for Bipolar and MOS Devices on Silicon-on-Diamond Materials Edholm B, Soderbarg A, Bengtsson S
1334 - 1338	Effects of an External Electric-Field from a Substrate on Conductance of SnO2 Thin-Films Kunishima YN, Miyayama M, Yanagida H
1339 - 1347	Etching Kinetics of Silicon Dioxide in Aqueous Fluoride Solutions - A Surface Complexation Model Osseoasare K
1347 - 1354	Contact Etching Process Characterization by Using Angular X-Ray Photoelectron-Spectroscopy Technique Peignon MC, Clenet F, Turban G
1355 - 1361	The Effect of Gas-Phase Additives C2H4, C2H6, and C2H2 on SiH4/O-2 Chemical-Vapor-Deposition Takahashi T, Hagiwara K, Egashira Y, Kamiyama H
1362 - 1371	Modeling and Analysis of a New Multiwafer Hot-Wall Phosphorus Doping Reactor Roy SR, Hajisheikh A
1372 - 1375	Surface Characteristics of (100)Silicon Anisotropically Etched in Aqueous KOH Vu QB, Stricker DA, Zavracky PM
1375 - 1383	Simulations of a Feedback-Control Scheme for an Inductively-Coupled Plasma Source for Etching Applications Yamada N, Ventzek PL, Sakai Y, Tagashira H, Kitamori K
1383 - 1386	Electrochromic Properties of Cobalt Oxide Thin-Films Prepared by Chemical-Vapor-Deposition Maruyama T, Arai S
1386 - 1389	Instability of Baceo3 in H2O-Containing Atmospheres Tanner CW, Virkar AV
1390 - 1394	Surface Modification of Porous Silicon by Aluminum Isopropoxide and Its Impact on Electroluminescence Zhang LB, Coffer JL, Xu DX, Pinizzotto RF
1394 - 1398	Multiple Source Quantum-Well Model of Porous Silicon Light-Emission Zhang SL, Chen Y, Jia L, Li JJ, Huang FM, Zhu T, Wang X, Liu ZF, Cai SM, Wong SP, Wilson IH
1399 - 1405	Interpretation of Carrier Recombination Lifetime and Diffusion Length Measurements in Silicon Bullis WM, Huff HR
1406 - 1409	The Mechanisms of Iron Gettering in Silicon by Boron Ion-Implantation Benton JL, Stolk PA, Eaglesham DJ, Jacobson DC, Cheng JY, Poate JM, Myers SM, Haynes TE
1409 - 1414	Stress Reduction in Anodically Banded Silicon and Borosilicate Glass by Thermal-Treatment Harz M, Bruckner W
1414 - 1421	Gap Fill and Film Reflow Capability of Subatmospheric Chemical-Vapor-Deposited Borophosphosilicate Glass Robles S, Russell K, Galiano M, Siva V, Kithcart V, Nguyen BC
1422 - 1426	Characterization of Na+-Sensitive Electrolyte Oxide Semiconductor Structures Obtained by Ion-Implantation Baccar ZM, Jaffrezicrenault N, Krafft JM, Martelet C, Jaffrezic H, Marest G, Plantier A
1426 - 1434	Thermal Nitridation of SiO2-Films in Ammonia - The Role of Hydrogen Baumvol IJ, Stedile FC, Ganem JJ, Trimaille I, Rigo S
1434 - 1442	Oxide-Growth Enhancement on Highly N-Type Doped Silicon Under Steam Oxidation Biermann E, Berger HH, Linke P, Muller B
1443 - 1451	Room-Temperature Deposition of Silicon Dioxide Films by Ion-Assisted Plasma-Enhanced Chemical-Vapor-Deposition Lee JH, Kim DS, Lee YH
1451 - 1458	Effects of RF Power on Plasma Phase Reactions and Film Structure in Deposition of A-C-H by Styrene Argon Discharge Lee JH, Kim DS, Lee YH, Farouk B
1459 - 1464	Ultrathin Silicon-Nitride Films Fabricated by Single-Wafer Processing Using an Sih2Cl2-NH3-H-2 System and in-Situ H-2 Cleaning Kobayashi K, Inaba Y, Ogata T, Katayama T, Watanabe H, Matsui Y, Hirayama M
1464 - 1469	Investigation of Polyimide Residue Due to Reactive Ion Etching in O-2 Tsang YL, Miller C, Lii T
1469 - 1471	Non-Photosensitive, Vertically Redundant 2-Channel A-Si-H Thin-Film-Transistor Kuo Y
1472 - 1484	Galvanic Corrosion of Zinc and Its Alloys Zhang XG