화학공학소재연구정보센터

Journal of the Electrochemical Society

Journal of the Electrochemical Society, Vol.144, No.4 Entire volume, number list
ISSN: 0013-4651 (Print) 

In this Issue (73 articles)

L47 - L51 Effects of Adding Copper(II) Salt to Organosulfur Cathodes for Rechargeable Lithium Batteries
Oyama N, Pope JM, Sotomura T
L52 - L53 The Defect Structure Model in Nonstoichiometric Limn2O4-Delta
Hosoya M, Ikuta H, Uchida T, Wakihara M
L54 - L57 Minority-Carrier Lifetime Measurement in Epitaxial Silicon Layers
Hara T, Tamura F, Kitamura T
L58 - L61 Effect of Benzotriazole on the Hydrogen Absorption by Iron
Abdelhamid MH, Ateya BG, Pickering HW
L61 - L64 Poly(3,4-Ethylenedioxythiophene) as Electrode Material in Electrochemical Capacitors
Carlberg JC, Inganas O
L64 - L67 Cathodic Behavior of Alkali Manganese Oxides from Permanganate
Chen RJ, Whittingham MS
L67 - L70 Ionic Liquid-Polymer Gel Electrolytes
Fuller J, Breda AC, Carlin RT
L70 - L72 Cyclic Voltammetry Studies of Light-Emitting Electrochemical-Cells
Greenwald Y, Hide F, Gao J, Wudl F, Heeger AJ
L73 - L75 A Quantitative Method for Evaluating the Hydrophilicity of Sulfonated Polypropylene Mesh Sheets
Tada H, Shimoda K
L75 - L78 Selective Doping of Chemically Sensitive Layers on a Multisensing Chip
Domansky K, Li J, Janata J
L78 - L81 Ion-Implantation and Annealing Conditions for Delamination of Silicon Layers by Hydrogen-Ion Implantation
Hara T, Kakizaki Y, Kihana T, Oshima S, Kitamura T, Kajiyama K, Yoneda T, Sekine K, Inoue M
L81 - L84 In-Situ Electrochemical Atomic-Force Microscope Study on Graphite-Electrodes
Hirasawa KA, Sato T, Asahina H, Yamaguchi S, Mori S
L84 - L86 Nonaqueous Electrolytes for Electrochemical Capacitors - Imidazolium Cations and Inorganic Fluorides with Organic Carbonates
Mcewen AB, Mcdevitt SF, Koch VR
L87 - L90 A Novel Way of Measuring Local Electrochemical Impedance Using a Single Vibrating Probe
Bayet E, Huet F, Keddam M, Ogle K, Takenouti H
L90 - L92 Improvement of Charge-Discharge Cycling Efficiency of Li by Low-Temperature Precycling of Li
Ishikawa M, Takaki Y, Morita M, Matsuda Y
L92 - L94 A Graphical Aid to Evaluation of Carbon-Based Li-Ion Electrodes
Whitehead AH, Perkins M, Owen JR
1151 - 1158 Electrochemical Intercalation of Lithium into Lilanb2O7 Perovskite
Bohnke C, Bohnke O, Fourquet JL
1159 - 1165 The Role of SO2 as an Additive to Organic Li-Ion Battery Electrolytes
Eineli Y, Thomas SR, Koch VR
1165 - 1173 Coupled Proton and Electron-Transfer - Adsorbed Anthraquinone-2-Carboxylic Acid Monolayers
Forster RJ
1174 - 1179 Characterization of Irreversible-Processes at the Li/Poly(bis(2,3-di-(2-Methoxyethoxy)Propoxy)Phosphazene) Interface on Charge Cycling
Gao L, Macdonald DD
1179 - 1184 Electrochemical Properties of Low-Temperature Crystallized Licoo2
Garcia B, Farcy J, Pereiraramos JP, Baffier N
1185 - 1188 Enhancement of Electrochemical Performance of Disulfide Using Polyvinylpyridine Film
Naoi K, Iwamizu Y, Mori M, Naruoka Y
1188 - 1194 Phospho-Olivines as Positive-Electrode Materials for Rechargeable Lithium Batteries
Padhi AK, Nanjundaswamy KS, Goodenough JB
1195 - 1201 Study of Irreversible Capacities for Li Insertion in Hard and Graphitic Carbons
Xing WB, Dahn JR
1202 - 1207 Deposition of Conducting Polyaniline Patterns with the Scanning Electrochemical Microscope
Zhou JF, Wipf DO
1208 - 1215 Localized Electrochemical Impedance Spectroscopy for Studying Pitting Corrosion on Stainless-Steels
Annergren I, Thierry D, Zou F
1215 - 1221 Chemical Modification of an Alkanethiol Self-Assembled Layer to Prevent Corrosion of Copper
Haneda R, Nishihara H, Aramaki K
1222 - 1231 Oxidation-Kinetics of Calcium-Doped Palladium Powders
Jain S, Kodas TT, Hampdensmith M
1231 - 1243 X-Ray Photoelectron Spectroscopic Examinations of Electrochemically Formed Passive Layers on Ni-Cr Alloys
Jabs T, Borthen P, Strehblow HH
1244 - 1252 Influence of Electrolyte Layer Thickness and pH on the Initial-Stage of the Atmospheric Corrosion of Iron
Nishikata A, Ichihara Y, Hayashi Y, Tsuru T
1252 - 1260 Corrosion of Carbon-Steels in CO2-Saturated Brine a Surface-Enhanced Raman-Spectroscopic
Oblonsky LJ, Devine TM
1261 - 1267 Determination of Oxygen Nonstoichiometry and Diffusivity in Mixed Conducting Oxides by Oxygen Coulometric Titration .1. Chemical Diffusion in La0.8Sr0.2Coo3-Delta
Lankhorst MH, Bouwmeester HJ
1268 - 1273 Determination of Oxygen Nonstoichiometry and Diffusivity in Mixed Conducting Oxides by Oxygen Coulometric Titration .2. Oxygen Nonstoichiometry and Defect Model for La0.8Sr0.2Coo3-Delta
Lankhorst MH, Bouwmeester HJ
1273 - 1277 Determination of Chemical Diffusion-Coefficients in Metal Hydride Particles with a Microelectrode Technique
Nishina T, Ura H, Uchida I
1278 - 1280 Density and Viscosity Measurements of Zincate/KOH Solutions
Siu S, Evans JW
1281 - 1286 Electrochemical Reaction-Mechanisms at Pyrite in Acidic Perchlorate Solutions
Ahlberg E, Broo AE
1286 - 1288 Impedance Measurements of a Platinum Cylindrical Porous-Electrode Replicated from Anodic Porous Alumina
Ohmori T, Kimura T, Masuda H
1289 - 1295 Rutherford Backscattering Spectroscopic Study of the Failure-Mechanism of (Ruo2+tio2)/Ti Thin-Film Electrodes in H2SO4 Solutions
Vallet CE, Tilak BV, Zuhr RA, Chen CP
1296 - 1301 Catalysis and Pore Initiation in the Anodic-Dissolution of Silicon in HF
Kooij ES, Vanmaekelbergh D
1302 - 1307 Temperature-Dependence of the Diffusion-Coefficient of Sulfuric-Acid in Water
Umino S, Newman J
1307 - 1310 Effects of Sol-Gel Coatings on the Localized Corrosion Behavior of 304-Stainless-Steel
Trzaskomapaulette PP, Nazeri A
1311 - 1317 Photoelectrochemical Study of Thin Anatase TiO2 Films Prepared by Metallorganic Chemical-Vapor-Deposition
Boschloo GK, Goossens A, Schoonman J
1317 - 1322 Steady-State and Limiting Current in Electroremediation of Soil
Dzenitis JM
1323 - 1331 A Study of Bipolar Spheroids in an Electrolytic Cell
Keh HJ, Li WJ
1332 - 1339 Anomalous Behavior of Internal Mobilities for Ag(I) and Tl(I) Ions in Molten Nitrates
Okada I, Chou PH
1340 - 1343 A 2-Dimensional Computer-Simulation of Electroless Copper Deposition
Shigematsu K, Kondo K, Hayakawa K, Irie M
1343 - 1353 Governing Equations for Transport in Porous-Electrodes
Devidts P, White RE
1353 - 1361 Oxide Film Formation on a Microcrystalline Al-Alloy in Sulfuric-Acid
Thomas SC, Birss VI
1362 - 1370 Preparation of Perovskite-Type La1-Xsrxmno3 Films by Vapor-Phase Processes and Their Electrochemical Properties
Ioroi T, Hara T, Uchimoto Y, Ogumi Z, Takehara Z
1371 - 1375 A Raman-Study of Diamond Film Growth on Co-Cemented Tungsten Carbide
Polini R, Traversa E, Marucci A, Mattei G, Marcheselli G
1376 - 1379 12.3-Percent Efficient Cuin1-Xgaxse2-Based Device from Electrodeposited Precursor
Bhattacharya RN, Wiesner H, Berens TA, Matson J, Keane J, Ramanathan K, Swartzlander A, Mason A, Noufi RN
1379 - 1389 Modeling of Plasma Etch Systems Using Ordinary Least-Squares, Recurrent Neural-Network, and Projection to Latent Structure Models
Bushman S, Edgar TF, Trachtenberg I
1390 - 1398 A Fundamental-Study on N-In0.53Ga0.47As and P-In0.53Ga0.47As in H2O2 Solution - Electrochemical-Behavior and Selective Etching vs InP
Theuwis A, Gomes WP
1399 - 1410 Deposition Uniformity, Particle Nucleation, and the Optimum Conditions for Chemical-Vapor-Deposition in Multiwafer Furnaces
Griffiths SK, Nilson RH
1411 - 1416 High-Temperature Reactive LAN Etching of Indium-Tin Oxide
Kuo Y
1417 - 1422 Inductively-Coupled Plasma Etch Damage in GaAs and InP Schottky Diodes
Lee JW, Abernathy CR, Pearton SJ, Ren F, Hobson WS, Shul RJ, Constantine C, Barratt C
1423 - 1429 Germanium Thin-Film Formation by Low-Pressure Chemical-Vapor-Deposition
Meng ZG, Jin ZH, Gururaj BA, Chu P, Kwok HS, Wong M
1430 - 1434 Dislocation Density Reduction in GaSb Films Grown on GaAs Substrates by Molecular-Beam Epitaxy
Qian W, Skowronski M, Kaspi R
1434 - 1439 Plasma Polymerization of Acetylene in a Box-Type Radio-Frequency Gas-Discharge Reactor Under Plug-Flow Condition
Uchida T, Vinogradov GK, Morita S
1439 - 1441 Diffusion Bonding of GaAs Wafers for Nonlinear Optics Applications
Zheng D, Gordon LA, Wu YS, Route RK, Fejer MM, Byer RL, Feigelson RS
1441 - 1446 Relationship of Processing Parameters to Photoluminescence Intensity and Mechanical Failure in Thick Porous Silicon Layers
Chang WK, Gleason KK
1447 - 1456 Method for Studying the Grown-in Defect Density Spectra in Czochralski Silicon-Wafers
Kissinger G, Graf D, Lambert U, Richter H
1456 - 1462 Oxidation of Si in 15 Mbar Isotopically Labeled O-2/H2O-Gas Mixtures at 750 to 1000-Degrees-C
Akermark T, Hultquist G
1463 - 1468 Deformation of Porous Silicon Lattice Caused by Absorption/Desorption Processes
Chelyadinsky AR, Dorofeev AM, Kazuchits NM, Lamonica S, Lazarouk SK, Maiello G, Masini G, Penina NM, Stelmakh VF, Bondarenko VP, Ferrari A
1468 - 1473 Influence of Nitrogen or Argon Anneals on the Properties of Wafers and Devices Separated by Implantation of Oxygen
Cristoloveanu S, Ionescu A, Wetteroth T, Shin H, Munteanu D, Gentil P, Hong S, Wilson SR
1474 - 1476 Epitaxial-Growth of Cubic SiC Films on Si Substrates by High-Vacuum Chemical-Vapor-Deposition Using 1,3-Disilabutane
Lee KW, Yu KS, Boo JH, Kim Y, Hatayama T, Kimoto T, Matsunami H
1477 - 1481 Water-Resistant Coating on Low-Temperature Amorphous-Silicon Nitride Films by a Thin-Layer of Amorphous-Silicon Hydrogen Alloy
Liao WS, Lee SC
1482 - 1487 Megasonic Excited Ozonized Water for the Cleaning of Silicon Surfaces
Ojima S, Kubo K, Kato M, Toda M, Ohmi T
1488 - 1495 Chemical Hysteresis on the Release and Uptake of Oxygen by SnO2-Doped In2O3 Powders
Otsukamatsuoyao S, Kozuka Z, Ono N
1495 - 1504 Modeling of Damage Accumulation During Ion-Implantation into Single-Crystalline Silicon
Posselt M, Schmidt B, Murthy CS, Feudel T, Suzuki K
1505 - 1513 Plasma-Enhanced Chemical-Vapor-Deposited Silicon Oxynitride Films for Optical Wave-Guide Bridges for Use in Mechanical Sensors
Storgaardlarsen T, Leistiko O
1514 - 1521 Simulation of Chemical Downstream Etch Systems - Correlation of the Effects of Operating-Conditions on Wafer Etch Rate and Uniformity
Vosen SR, Meeks E, Larson RS, Shon JW
1522 - 1528 Understanding of via-Etch-Induced Polymer Formation and Its Removal
Wang Y, Graham SW, Chan L, Loong ST