L47 - L51 |
Effects of Adding Copper(II) Salt to Organosulfur Cathodes for Rechargeable Lithium Batteries Oyama N, Pope JM, Sotomura T |
L52 - L53 |
The Defect Structure Model in Nonstoichiometric Limn2O4-Delta Hosoya M, Ikuta H, Uchida T, Wakihara M |
L54 - L57 |
Minority-Carrier Lifetime Measurement in Epitaxial Silicon Layers Hara T, Tamura F, Kitamura T |
L58 - L61 |
Effect of Benzotriazole on the Hydrogen Absorption by Iron Abdelhamid MH, Ateya BG, Pickering HW |
L61 - L64 |
Poly(3,4-Ethylenedioxythiophene) as Electrode Material in Electrochemical Capacitors Carlberg JC, Inganas O |
L64 - L67 |
Cathodic Behavior of Alkali Manganese Oxides from Permanganate Chen RJ, Whittingham MS |
L67 - L70 |
Ionic Liquid-Polymer Gel Electrolytes Fuller J, Breda AC, Carlin RT |
L70 - L72 |
Cyclic Voltammetry Studies of Light-Emitting Electrochemical-Cells Greenwald Y, Hide F, Gao J, Wudl F, Heeger AJ |
L73 - L75 |
A Quantitative Method for Evaluating the Hydrophilicity of Sulfonated Polypropylene Mesh Sheets Tada H, Shimoda K |
L75 - L78 |
Selective Doping of Chemically Sensitive Layers on a Multisensing Chip Domansky K, Li J, Janata J |
L78 - L81 |
Ion-Implantation and Annealing Conditions for Delamination of Silicon Layers by Hydrogen-Ion Implantation Hara T, Kakizaki Y, Kihana T, Oshima S, Kitamura T, Kajiyama K, Yoneda T, Sekine K, Inoue M |
L81 - L84 |
In-Situ Electrochemical Atomic-Force Microscope Study on Graphite-Electrodes Hirasawa KA, Sato T, Asahina H, Yamaguchi S, Mori S |
L84 - L86 |
Nonaqueous Electrolytes for Electrochemical Capacitors - Imidazolium Cations and Inorganic Fluorides with Organic Carbonates Mcewen AB, Mcdevitt SF, Koch VR |
L87 - L90 |
A Novel Way of Measuring Local Electrochemical Impedance Using a Single Vibrating Probe Bayet E, Huet F, Keddam M, Ogle K, Takenouti H |
L90 - L92 |
Improvement of Charge-Discharge Cycling Efficiency of Li by Low-Temperature Precycling of Li Ishikawa M, Takaki Y, Morita M, Matsuda Y |
L92 - L94 |
A Graphical Aid to Evaluation of Carbon-Based Li-Ion Electrodes Whitehead AH, Perkins M, Owen JR |
1151 - 1158 |
Electrochemical Intercalation of Lithium into Lilanb2O7 Perovskite Bohnke C, Bohnke O, Fourquet JL |
1159 - 1165 |
The Role of SO2 as an Additive to Organic Li-Ion Battery Electrolytes Eineli Y, Thomas SR, Koch VR |
1165 - 1173 |
Coupled Proton and Electron-Transfer - Adsorbed Anthraquinone-2-Carboxylic Acid Monolayers Forster RJ |
1174 - 1179 |
Characterization of Irreversible-Processes at the Li/Poly(bis(2,3-di-(2-Methoxyethoxy)Propoxy)Phosphazene) Interface on Charge Cycling Gao L, Macdonald DD |
1179 - 1184 |
Electrochemical Properties of Low-Temperature Crystallized Licoo2 Garcia B, Farcy J, Pereiraramos JP, Baffier N |
1185 - 1188 |
Enhancement of Electrochemical Performance of Disulfide Using Polyvinylpyridine Film Naoi K, Iwamizu Y, Mori M, Naruoka Y |
1188 - 1194 |
Phospho-Olivines as Positive-Electrode Materials for Rechargeable Lithium Batteries Padhi AK, Nanjundaswamy KS, Goodenough JB |
1195 - 1201 |
Study of Irreversible Capacities for Li Insertion in Hard and Graphitic Carbons Xing WB, Dahn JR |
1202 - 1207 |
Deposition of Conducting Polyaniline Patterns with the Scanning Electrochemical Microscope Zhou JF, Wipf DO |
1208 - 1215 |
Localized Electrochemical Impedance Spectroscopy for Studying Pitting Corrosion on Stainless-Steels Annergren I, Thierry D, Zou F |
1215 - 1221 |
Chemical Modification of an Alkanethiol Self-Assembled Layer to Prevent Corrosion of Copper Haneda R, Nishihara H, Aramaki K |
1222 - 1231 |
Oxidation-Kinetics of Calcium-Doped Palladium Powders Jain S, Kodas TT, Hampdensmith M |
1231 - 1243 |
X-Ray Photoelectron Spectroscopic Examinations of Electrochemically Formed Passive Layers on Ni-Cr Alloys Jabs T, Borthen P, Strehblow HH |
1244 - 1252 |
Influence of Electrolyte Layer Thickness and pH on the Initial-Stage of the Atmospheric Corrosion of Iron Nishikata A, Ichihara Y, Hayashi Y, Tsuru T |
1252 - 1260 |
Corrosion of Carbon-Steels in CO2-Saturated Brine a Surface-Enhanced Raman-Spectroscopic Oblonsky LJ, Devine TM |
1261 - 1267 |
Determination of Oxygen Nonstoichiometry and Diffusivity in Mixed Conducting Oxides by Oxygen Coulometric Titration .1. Chemical Diffusion in La0.8Sr0.2Coo3-Delta Lankhorst MH, Bouwmeester HJ |
1268 - 1273 |
Determination of Oxygen Nonstoichiometry and Diffusivity in Mixed Conducting Oxides by Oxygen Coulometric Titration .2. Oxygen Nonstoichiometry and Defect Model for La0.8Sr0.2Coo3-Delta Lankhorst MH, Bouwmeester HJ |
1273 - 1277 |
Determination of Chemical Diffusion-Coefficients in Metal Hydride Particles with a Microelectrode Technique Nishina T, Ura H, Uchida I |
1278 - 1280 |
Density and Viscosity Measurements of Zincate/KOH Solutions Siu S, Evans JW |
1281 - 1286 |
Electrochemical Reaction-Mechanisms at Pyrite in Acidic Perchlorate Solutions Ahlberg E, Broo AE |
1286 - 1288 |
Impedance Measurements of a Platinum Cylindrical Porous-Electrode Replicated from Anodic Porous Alumina Ohmori T, Kimura T, Masuda H |
1289 - 1295 |
Rutherford Backscattering Spectroscopic Study of the Failure-Mechanism of (Ruo2+tio2)/Ti Thin-Film Electrodes in H2SO4 Solutions Vallet CE, Tilak BV, Zuhr RA, Chen CP |
1296 - 1301 |
Catalysis and Pore Initiation in the Anodic-Dissolution of Silicon in HF Kooij ES, Vanmaekelbergh D |
1302 - 1307 |
Temperature-Dependence of the Diffusion-Coefficient of Sulfuric-Acid in Water Umino S, Newman J |
1307 - 1310 |
Effects of Sol-Gel Coatings on the Localized Corrosion Behavior of 304-Stainless-Steel Trzaskomapaulette PP, Nazeri A |
1311 - 1317 |
Photoelectrochemical Study of Thin Anatase TiO2 Films Prepared by Metallorganic Chemical-Vapor-Deposition Boschloo GK, Goossens A, Schoonman J |
1317 - 1322 |
Steady-State and Limiting Current in Electroremediation of Soil Dzenitis JM |
1323 - 1331 |
A Study of Bipolar Spheroids in an Electrolytic Cell Keh HJ, Li WJ |
1332 - 1339 |
Anomalous Behavior of Internal Mobilities for Ag(I) and Tl(I) Ions in Molten Nitrates Okada I, Chou PH |
1340 - 1343 |
A 2-Dimensional Computer-Simulation of Electroless Copper Deposition Shigematsu K, Kondo K, Hayakawa K, Irie M |
1343 - 1353 |
Governing Equations for Transport in Porous-Electrodes Devidts P, White RE |
1353 - 1361 |
Oxide Film Formation on a Microcrystalline Al-Alloy in Sulfuric-Acid Thomas SC, Birss VI |
1362 - 1370 |
Preparation of Perovskite-Type La1-Xsrxmno3 Films by Vapor-Phase Processes and Their Electrochemical Properties Ioroi T, Hara T, Uchimoto Y, Ogumi Z, Takehara Z |
1371 - 1375 |
A Raman-Study of Diamond Film Growth on Co-Cemented Tungsten Carbide Polini R, Traversa E, Marucci A, Mattei G, Marcheselli G |
1376 - 1379 |
12.3-Percent Efficient Cuin1-Xgaxse2-Based Device from Electrodeposited Precursor Bhattacharya RN, Wiesner H, Berens TA, Matson J, Keane J, Ramanathan K, Swartzlander A, Mason A, Noufi RN |
1379 - 1389 |
Modeling of Plasma Etch Systems Using Ordinary Least-Squares, Recurrent Neural-Network, and Projection to Latent Structure Models Bushman S, Edgar TF, Trachtenberg I |
1390 - 1398 |
A Fundamental-Study on N-In0.53Ga0.47As and P-In0.53Ga0.47As in H2O2 Solution - Electrochemical-Behavior and Selective Etching vs InP Theuwis A, Gomes WP |
1399 - 1410 |
Deposition Uniformity, Particle Nucleation, and the Optimum Conditions for Chemical-Vapor-Deposition in Multiwafer Furnaces Griffiths SK, Nilson RH |
1411 - 1416 |
High-Temperature Reactive LAN Etching of Indium-Tin Oxide Kuo Y |
1417 - 1422 |
Inductively-Coupled Plasma Etch Damage in GaAs and InP Schottky Diodes Lee JW, Abernathy CR, Pearton SJ, Ren F, Hobson WS, Shul RJ, Constantine C, Barratt C |
1423 - 1429 |
Germanium Thin-Film Formation by Low-Pressure Chemical-Vapor-Deposition Meng ZG, Jin ZH, Gururaj BA, Chu P, Kwok HS, Wong M |
1430 - 1434 |
Dislocation Density Reduction in GaSb Films Grown on GaAs Substrates by Molecular-Beam Epitaxy Qian W, Skowronski M, Kaspi R |
1434 - 1439 |
Plasma Polymerization of Acetylene in a Box-Type Radio-Frequency Gas-Discharge Reactor Under Plug-Flow Condition Uchida T, Vinogradov GK, Morita S |
1439 - 1441 |
Diffusion Bonding of GaAs Wafers for Nonlinear Optics Applications Zheng D, Gordon LA, Wu YS, Route RK, Fejer MM, Byer RL, Feigelson RS |
1441 - 1446 |
Relationship of Processing Parameters to Photoluminescence Intensity and Mechanical Failure in Thick Porous Silicon Layers Chang WK, Gleason KK |
1447 - 1456 |
Method for Studying the Grown-in Defect Density Spectra in Czochralski Silicon-Wafers Kissinger G, Graf D, Lambert U, Richter H |
1456 - 1462 |
Oxidation of Si in 15 Mbar Isotopically Labeled O-2/H2O-Gas Mixtures at 750 to 1000-Degrees-C Akermark T, Hultquist G |
1463 - 1468 |
Deformation of Porous Silicon Lattice Caused by Absorption/Desorption Processes Chelyadinsky AR, Dorofeev AM, Kazuchits NM, Lamonica S, Lazarouk SK, Maiello G, Masini G, Penina NM, Stelmakh VF, Bondarenko VP, Ferrari A |
1468 - 1473 |
Influence of Nitrogen or Argon Anneals on the Properties of Wafers and Devices Separated by Implantation of Oxygen Cristoloveanu S, Ionescu A, Wetteroth T, Shin H, Munteanu D, Gentil P, Hong S, Wilson SR |
1474 - 1476 |
Epitaxial-Growth of Cubic SiC Films on Si Substrates by High-Vacuum Chemical-Vapor-Deposition Using 1,3-Disilabutane Lee KW, Yu KS, Boo JH, Kim Y, Hatayama T, Kimoto T, Matsunami H |
1477 - 1481 |
Water-Resistant Coating on Low-Temperature Amorphous-Silicon Nitride Films by a Thin-Layer of Amorphous-Silicon Hydrogen Alloy Liao WS, Lee SC |
1482 - 1487 |
Megasonic Excited Ozonized Water for the Cleaning of Silicon Surfaces Ojima S, Kubo K, Kato M, Toda M, Ohmi T |
1488 - 1495 |
Chemical Hysteresis on the Release and Uptake of Oxygen by SnO2-Doped In2O3 Powders Otsukamatsuoyao S, Kozuka Z, Ono N |
1495 - 1504 |
Modeling of Damage Accumulation During Ion-Implantation into Single-Crystalline Silicon Posselt M, Schmidt B, Murthy CS, Feudel T, Suzuki K |
1505 - 1513 |
Plasma-Enhanced Chemical-Vapor-Deposited Silicon Oxynitride Films for Optical Wave-Guide Bridges for Use in Mechanical Sensors Storgaardlarsen T, Leistiko O |
1514 - 1521 |
Simulation of Chemical Downstream Etch Systems - Correlation of the Effects of Operating-Conditions on Wafer Etch Rate and Uniformity Vosen SR, Meeks E, Larson RS, Shon JW |
1522 - 1528 |
Understanding of via-Etch-Induced Polymer Formation and Its Removal Wang Y, Graham SW, Chan L, Loong ST |