Journal of the Electrochemical Society

Journal of the Electrochemical Society, Vol.141, No.5 Entire volume, number list

ISSN: 0013-4651 (Print)

In this Issue (60 articles)

L53 - L55	Effects of Na2Co3 Addition on the Gas-Sensing Characteristics of CuO/ZnO Heterocontact Jung SJ, Ohsawa H, Nakamura Y, Yanagida H, Hasumi K, Okada O
L56 - L58	Electroless Copper Plating Using ZnO Thin-Film Coated on a Glass Substrate Yoshiki H, Alexandruk V, Hashimoto K, Fujishima A
L58 - L60	Poisoning and Activation of the Gold Cathode During Electroreduction of CO2 Kedzierzawski P, Augustynski J
1095 - 1099	Cuins2 with Lamellar Morphology .1. Efficient Photoanodes in Acidic Polyiodide Medium Cattarin S, Dietz N, Lewerenz HJ
1100 - 1104	Cuins2 with Lamellar Morphology .2. Photoelectrochemical Behavior of Heterogeneous Material Cattarin S, Guerriero P, Razzini G, Lewerenz HJ
1105 - 1108	Charge Discharge Characteristics of Carbon-Fiber with Graphite Structure in Organic Electrolytes Containing Lithium Trifluoromethanesulfate and Lithium Hexafluorophosphate Ishikawa M, Morita M, Asao M, Matsuda Y
1109 - 1113	Formation of a Bilayer by Electrochemical Oxidation of 1,3-Dimethoxybenzene Martinez Y, Ortiz R, Marquez OP, Marquez J, Perdomo G, Otero TF
1114 - 1117	Effect of Temperature and Evaluation of Thermodynamic Parameters for the Polarographic-Behavior of 3-Methyl-4-(2’-Substituted Benzeneazo)-2-Isoxazolin-5-Ones Ramana PV, Satyanarayana DN, Ravindranath LK
1118 - 1126	Measurement of Interfacial Re-Equilibration During Hydrogen Bubble Coalescence Egan EW, Tobias CW
1126 - 1131	A Microellipsometric Study of the Passive Film Formation on Al-Ta Alloys .1. Solid-Solution Alloys Streinz CC, Kruger J, Moran PJ
1132 - 1137	A Microellipsometric Study of the Passive Film Formation on Al-Ta Alloys .2. The Role of Al3Ta Precipitates in Breakdown Streinz CC, Moran PJ, Wagner JW, Kruger J
1138 - 1142	Pulsed Electroreduction of CO2 on Copper Electrodes .2. Nogami G, Itagaki H, Shiratsuchi R
1142 - 1146	Alkaline-Pretreated Aluminum Electrodes as pH Sensors Zhou TA, Ottova A, Tien HT
1147 - 1157	A Transfer-Function Approach for a Generalized Electrochemical Impedance Spectroscopy Gabrielli C, Tribollet B
1157 - 1161	Electroluminescence and Chemiluminescence of Porous Silicon in Nonaqueous Solution Meulenkamp EA, Cleij TJ, Kelly JJ
1161 - 1166	Study of the Oxidation of N-InP with Low Carrier Concentrations in the Negative Potential Region Quinlan KP, Rai AK, Wittberg TN
1166 - 1173	Use of in-Situ Atomic-Force Microscopy to Image Copper Electrodeposits on Platinum Rynders RM, Alkire RC
1174 - 1178	Simultaneous Synthesis of Ozone and Hydrogen-Peroxide in a Proton-Exchange-Membrane Electrochemical Reactor Tatapudi P, Fenton JM
1178 - 1182	An Investigation of Spinel-Related and Orthorhombic Limno2 Cathodes for Rechargeable Lithium Batteries Gummow RJ, Thackeray MM
1183 - 1190	Negative Apparent Electrochemical Enthalpy of Activation - The Reduction of Bromate at the Dropping Mercury-Electrode in Alkaline-Solutions Kirowaeisner E, Schwarz M, Rosenblum M, Gileadi E
1191 - 1198	Gas Electrode-Reactions in Molten-Carbonate Media .5. Electrochemical Analysis of the Oxygen Reduction-Mechanism at a Fully Immersed Gold Electrode Nishina T, Uchida I, Selman JR
1199 - 1205	The Influence of Co Content on the Corrosion-Resistance of Sputter-Deposited TbFeCo Thin-Films in Aqueous Environments Akao N, Kato T, Sasaki T, Sugimoto K
1206 - 1212	The Role of Induced Convection in Branched Electrodeposit Morphology Selection Barkey DP, Watt D, Liu Z, Raber S
1212 - 1220	The Influence of Oxide on the Electrodeposition of Niobium from Alkali Fluoride Melts Christensen E, Wang XD, Vonbarner JH, Ostfold T, Bjerrum NJ
1220 - 1224	Use of Underpotential Deposition of Zinc to Mitigate Hydrogen Absorption into Monel K500 Zheng G, Popov BN, White RE
1225 - 1231	Influence of Physicochemical Properties of Alkaline-Solutions and Temperature on the Hydrogen Evolution Reaction on Porous Lanthanum-Phosphate-Bonded Nickel Electrodes Dumont H, Los P, Brossard L, Menard H
1231 - 1236	Open-Circuit Photovoltage and Charge Recombination at Semiconductor Liquid Interfaces Mao D, Kim KJ, Frank AJ
1236 - 1241	Theory of Thermocells - Transported Entropies, and Heat of Transfer in Sulfate Mixtures Grimstvedt A, Ratkje SK, Forland T
1243 - 1245	Preparation of Ultrafine RuO2-SnO2 Binary Oxide Particles by a Sol-Gel Process Ito M, Murakami Y, Kaji H, Ohkawauchi H, Yahikozawa K, Takasu Y
1246 - 1251	Ultrathin Tantalum Oxide Capacitor Process Using Oxygen-Plasma Annealing Kamiyama S, Suzuki H, Watanabe H, Sakai A, Kimura H, Mizuki J
1252 - 1254	The Synthesis and Particle Growth-Mechanism of Bright Green Phosphor YAG-Tb Ohno K, Abe T
1255 - 1260	Cracking and Spalling of Oxide Scale from 304 Stainless-Steel at High-Temperatures Zhang YF, Shores DA
1261 - 1267	Dependence of the Kinetics of Electrochemical Vapor-Deposition of CeO2 on Oxygen Partial-Pressure Tanner CW, Virkar AV
1268 - 1273	Precise Determination of the Chemical Diffusion-Coefficient of Calcium-Doped Lanthanum Chromites by Means of Electrical-Conductivity Relaxation Yasuda I, Hikita T
1274 - 1277	Photoelectrochemical Etching of InAs Harris D, Kohl PA, Winnick J
1278 - 1284	Metal Fluoride Thin-Films Prepared by Atomic Layer Deposition Ylilammi M, Rantaaho T
1284 - 1290	Oxygen Incorporation During Low-Temperature Chemical-Vapor-Deposition Growth of Epitaxial Silicon Films Schwartz PV, Sturm JC
1291 - 1298	In-Situ Scanning-Tunneling-Microscopy Studies of the Formation and Reduction of a Gold Oxide Monolayer on Au(111) Vitus CM, Davenport AJ
1299 - 1303	In-Situ Observation System for Silicon-Wafer Transient Deformation During Insertion Withdrawal into from Horizontal Furnaces Itsumi M, Kai J
1304 - 1308	Contamination Determination for Silicon-Carbide Cantilever Forks in-Diffusion Furnaces Itsumi M
1309 - 1312	Electrical-Properties of Thin Anodic Oxides Formed on Silicon in Aqueous Nh4Oh Solutions Landheer D, Bardwell JA, Clark KB
1313 - 1320	Prediction of Ion Energy and Angular-Distributions in Single and Dual-Frequency Plasmas Myers FR, Ramaswami M, Cale TS
1320 - 1325	Electrical Characteristics of Zinc-Sulfide Thin-Films Deposited by Various Methods Orent T
1325 - 1333	Anodic Oxide-Films as a Gate Dielectric for a Thin-Film-Transistor Ozawa K, Miyazaki K, Majima T
1334 - 1338	The Formation of Boron-Doped Polycrystalline Si with Extremely Low Resistivities at Low-Temperatures Shiozawa J, Kasai Y, Mikata Y, Yamabe K
1339 - 1346	Synchronously Excited Discrete Chemical-Vapor-Deposition of Ta2O5 Tanimoto S, Shibata N, Kuroiwa K, Tarui Y
1347 - 1350	The C49 to C54 Phase-Transformation in TiSi2 Thin-Films Mann RW, Clevenger LA
1351 - 1356	Thermal-Stability Limits of Thin TiSi2 - Effect on Submicron Line Resistance and Shallow Junction Leakage Georgiou GE, Abiko H, Baiocchi FA, Ha NT, Nakahara S
1357 - 1361	Dependence of Photovoltages of Spray-Deposited Indium Tin Oxide Silicon-Oxide Silicon Junction Solar-Cells on Spray Solvents Ishida T, Kouno H, Kobayashi H, Nakato Y
1362 - 1364	Accurate Evaluation Techniques of Interstitial Oxygen Concentrations in Medium-Resistivity Si Crystals Kitagawara Y, Tamatsuka M, Takenaka T
1365 - 1369	Nucleation of in-Situ Phosphorus-Doped Amorphous-Silicon Films Deposited by Pyrolysis of Si2H6 and PH3 Kobayashi T, Koguchi M, Iijima S, Ohkura M, Wada Y
1370 - 1374	X-Ray Reflectivity Measurement of an Interface Layer Between a Low-Temperature Silicon Epitaxial Layer and HF-Treated Silicon Substrate Miyauchi A, Usami K, Suzuki T
1375 - 1377	An Absorbing Layer Approach to Reducing Reflections in Multilayer Metal Lithographic Processes Pearce CW, Marshall GA, Roman RJ
1378 - 1381	Shallow N+ Junctions in Silicon by Arsenic Gas-Phase Doping Ransom CM, Jackson TN, Degelormo JF, Zeller C, Kotecki DE, Graimann C, Sadana DK, Benedict J
1381 - 1386	Fluorine-Enhanced Boron Migration into Oxide from Underlying Silicon Sato Y, Kawashima I
1387 - 1391	Online Inference of Plasma Etch Uniformity Using in-Situ Ellipsometry Stefani J, Butler SW
1392 - 1397	Nucleation and Crystallization Characteristics of Phosphorus-Doped Amorphous-Silicon Slit Nano-Wire Wada Y, Kobayashi T, Kure T, Yoshimura T, Sudou Y, Gotou Y, Kondo S
1398 - 1401	Improvement of the Gate Oxide Integrity by Modifying Crystal Pulling and Its Impact on Device Failures Winkler R, Sano M
1402 - 1403	Electrochemical Noise-Analysis of Iron Exposed to NaCl Solutions of Different Corrosivity Eden DA
1403 - 1404	Electrochemical Noise-Analysis of Iron Exposed to NaCl Solutions of Different Corrosivity Mansfeld F, Xiao H