2001 - 2005 |
Lithium-manganese-oxide thin-film cathodes prepared by plasma-enhanced chemical vapor deposition Liu P, Zhang JG, Turner JA, Tracy CE, Benson DK |
2006 - 2010 |
Solid oxide fuel cells with doped lanthanum gallate electrolyte and LaSrCoO3 cathode, and Ni-samaria-doped ceria cermet anode Maric R, Ohara S, Fukui T, Yoshida H, Nishimura M, Inagaki T, Miura K |
2011 - 2014 |
Electrochemical lithiation of carbon prepared from pyrolysis of graphite oxide Matsuo Y, Sugie Y |
2015 - 2023 |
Effect of carbon additives on the electrochemical properties of AB(5) graphite composite electrodes prepared by mechanical milling Aymard L, Lenain C, Courvoisier L, Salver-Disma F, Tarascon JM |
2024 - 2028 |
Transport properties of a high molecular weight poly(propylene oxide)-LiCF3SO3 system Doeff MM, Georen P, Qiao J, Kerr J, De Jonghe LC |
2029 - 2033 |
The organic-inorganic polyaniline/V2O5 system - Application as a high-capacity hybrid cathode for rechargeable lithium batteries Lira-Cantu M, Gomez-Romero P |
2034 - 2037 |
Polarized-cell measurements on yttria-stabilized zirconia using an anodically blocked electrode Bronin DI, Kuzin BL, Nafe H, Aldinger F |
2038 - 2044 |
Stability of BaCeO3-based proton conductors in water-containing atmospheres Bhide SV, Virkar AV |
2045 - 2048 |
Large-surface-area boron phosphide liquid junction solar cells Schroten E, Goossens A, Schoonman J |
2049 - 2053 |
Thermodynamics of water vapor uptake in perfluorosulfonic acid membranes Futerko P, Hsing IM |
2054 - 2058 |
Electronically conducting proton exchange polymers as catalyst supports for proton exchange membrane fuel cells -Electrocatalysis of oxygen reduction, hydrogen oxidation, and methanol oxidation Lefebvre MC, Qi ZG, Pickup PG |
2059 - 2067 |
The structure of Ni(OH)(2): From the ideal material to the electrochemically active one Tessier C, Haumesser PH, Bernard P, Delmas C |
2068 - 2077 |
Accelerating rate calorimetry study on the thermal stability of lithium intercalated graphite in electrolyte I. Experimental Richard MN, Dahn JR |
2078 - 2084 |
Accelerating rate calorimetry study on the thermal stability of lithium intercalated graphite in electrolyte II. Modeling the results and predicting differential scanning calorimeter curves Richard MN, Dahn JR |
2085 - 2091 |
Gd(1-x)A(x)Mn(1-y)Co(y)O(3-delta) (A = Sr, Ca) as a cathode for solid-oxide fuel cells Tu HY, Phillipps MB, Takeda Y, Ichikawa T, Imanishi N, Sammes NM, Yamamoto O |
2092 - 2096 |
Influence of crystalline structure and sulfur inclusion on corrosion properties of electrodeposited CoNiFe soft magnetic films Osaka T, Takai M, Sogawa Y, Momma T, Ohashi K, Saito M, Yamada K |
2097 - 2102 |
Passivity of iron in alkaline solutions studied by in situ XANES and a laser reflection technique Schmuki P, Buchler M, Virtanen S, Isaacs HS, Ryan MP, Bohni H |
2103 - 2106 |
The limited role of surface defects as nucleation sites for Cu2O on Cu(001) Yang JC, Yeadon M, Kolasa B, Gibson JM |
2107 - 2112 |
Effects of hydrogen on semiconductivity of passive films and corrosion behavior of 310 stainless steel Yang MZ, Luo JL, Yang Q, Qiao LJ, Qin ZQ, Norton PR |
2113 - 2116 |
A pyrosol technique to deposit highly transparent, low-resistance SnO2 : F thin films from dimethyltin dichloride Omura K, Veluchamy P, Tsuji M, Nishio T, Murozono M |
2117 - 2122 |
Adhesion of electroless deposited Cu on ZnO-coated glass substrates: The effect of the ZnO surface morphology Sun RD, Tryk DA, Hashimoto K, Fujishima A |
2123 - 2130 |
Electrodeposition of indium onto vitreous carbon from acid chloride solutions Munoz AG, Saidman SB, Bessone JB |
2131 - 2138 |
Hydrogen impurities in chemical bath deposited CdS Weber M, Krauser J, Weidinger A, Bruns J, Fischer CH, Bohne W, Rohrich J, Scheer R |
2139 - 2145 |
The effects of processing parameters in the chemical vapor deposition of cobalt from cobalt tricarbonyl nitrosyl Ivanova AR, Nuesca G, Chen XM, Goldberg C, Kaloyeros AE, Arkles B, Sullivan JJ |
2146 - 2155 |
Anodic oxidation of formaldehyde on gold studied by electrochemical impedance spectroscopy: An equivalent circuit approach ten Kortenaar MV, Tessont C, Kolar ZI, van der Weijde H |
2156 - 2162 |
Growth mode of copper films electrodeposited on silicon from sulfate and pyrophosphate solutions Cerisier M, Attenborough K, Fransaer J, Van Haesendonck C, Celis JP |
2163 - 2168 |
Parametric study of NiFe and NiFeCo high density plasma etching using CO/NH3 Jung KB, Hong J, Cho H, Onishi S, Johnson D, Park YD, Childress JR, Pearton SJ |
2169 - 2174 |
SnO2(Sb) electrodes: Morphological changes due to polarizations in the HER and OER potential regions studied by in situ STM and ex situ AFM imaging Longo C, Abadal G, Sanz F, Sumodjo PTA |
2175 - 2179 |
Electrochemical incineration of glucose as a model organic substrate I. Role of the electrode material Bonfatti F, Ferro S, Lavezzo F, Malacarne M, Lodi G, De Battisti A |
2180 - 2183 |
Topological analysis of the electron localization function: A help for understanding the complex structure of cryolitic melts Joubert L, Picard G, Silvi B, Fuster F |
2184 - 2187 |
Tritium conductivity and isotope effect in proton-conducting perovskites Mukundan R, Brosha EL, Birdsell SA, Costello AL, Garzon FH, Willms RS |
2188 - 2193 |
Electrochemical enhancement of carbon monoxide oxidation over yttria-stabilized zirconia supported platinum catalysts I. Effect of catalyst morphology on kinetic behavior Emery DA, Luke RJC, Middleton PH, Metcalfe IS |
2194 - 2198 |
Electrochemical enhancement of carbon monoxide oxidation over yttria-stabilized zirconia supported platinum catalysts II. Effect of catalyst morphology on catalyst work function Emery DA, Middleton PH, Metcalfe IS |
2199 - 2208 |
A mathematical model for the radially dependent impedance of a rotating disk electrode Durbha M, Orazem ME, Tribollet B |
2209 - 2215 |
Thermal, electrochemical, and spectroscopic characterizations of hyperbranched polymer electrolyte Wang ZX, Ikeda M, Hirata N, Kubo M, Itoh T, Yamamoto O |
2216 - 2218 |
The leakage current effect of thin gate oxides (2.4-2.7 nm) with in situ native oxide desorption Lai JM, Chieng WH, Lin BC, Chin A, Tsai C |
2219 - 2224 |
Characterization of chemical vapor deposited amorphous fluorocarbons for low dielectric constant interlayer dielectrics Banerjee I, Harker M, Wong L, Coon PA, Gleason KK |
2225 - 2228 |
Structural rearrangement of SiO2 films during their growth and annealing Revesz AG |
2229 - 2234 |
Remote plasma-assisted deposition of gate quality oxides without the use of a preoxidation step Sharma R, Fretwell JL, Ngai T, Banerjee S |
2235 - 2238 |
Study of surface treatment of silicon wafer using small angle incident X-ray photoelectron spectroscopy Mayusumi M, Imai M, Takahashi J, Kawada K, Ohmi T |
2239 - 2244 |
Effect of heavy boron doping on oxide precipitate growth in Czochralski silicon Ono T, Asayama E, Horie H, Hourai M, Sueoka K, Tsuya H, Rozgonyi GA |
2245 - 2253 |
Calibrated contamination spiking method for silicon wafers in the 10(10)-10(12) atom/cm(2) range Holzl R, Range KJ, Fabry L, Huber D |
2254 - 2257 |
Pathway to depositing device-quality 50 degrees C silicon nitride in a high-density plasma system Farber DG, Bae S, Okandan M, Reber DM, Kuzma T, Fonash SJ |
2258 - 2260 |
Effects of copper contamination in silicon on thin oxide breakdown Ramappa DA, Henley WB |
2261 - 2269 |
Reduction of dichlorosiliane-based tungsten silicide resistivity by amorphization and its applicability as an electrode Byun JS, Lee BH, Park JS, Sohn DK, Hong J, Cho WJ, Choi SJ, Kim JJ |
2270 - 2275 |
The influence of static and rotating magnetic fields on heat and mass transfer in silicon floating zones Croll A, Dold P, Kaiser T, Szofran FR, Benz KW |
2276 - 2283 |
Estimation of the number of interstitial atoms injected in silicon during thin oxide formation Skarlatos D, Omri M, Claverie A, Tsoukalas D |
2284 - 2288 |
Interaction of a polyglycidol-based nonionic surfactant with silicon in hydrofluoric acid solutions Haworth PD, Kovach MJ, Sperline RP, Raghavan S |
2289 - 2293 |
Morphology and integration of rough polycrystalline silicon films for DRAM storage cell applications Banerjee A, Crenshaw DL, Wise RL, Khamankar RB, Pas MF |
2294 - 2299 |
Application of selective liquid-phase deposition to fabricate contact holes without plasma damage Yeh CF, Liu CH, Su JL |
2300 - 2312 |
Modeling microdefect formation in Czochralski silicon Sinno T, Brown RA |
2313 - 2317 |
Gas-phase desorption of diphenylamine from porous silicon Sweryda-Krawiec B, Coffer JL, Rho YG, Pinizzotto RF |
2318 - 2321 |
Hydrogen plasma removal of post-RIE residue for backend processing Somashekhar A, Ying H, Smith PB, Aldrich DB, Nemanich RJ |
2322 - 2327 |
N+P junction leakage current caused by oxygen precipitation defects and its temperature dependence Uchiyama H, Matsumoto K, Mchedlidze T, Nisimura M, Yamabe K |
2328 - 2332 |
Effects of pH values on the kinetics of liquid-phase chemical-enhanced oxidation of GaAs Wang HH, Wu JY, Wang YH, Houng MP |
2333 - 2336 |
Chemical mechanical polishing of polyarylether low dielectric constant layers by manganese oxide slurry Hara T, Tomisawa T, Kurosu T, Doy TK |
2337 - 2343 |
Quality of selective silicon epitaxial films deposited using disilane and chlorine O'Neil PA, Ozturk MC, Batchelor AD, Xu MM, Maher DM |
2344 - 2352 |
Effects of oxygen during selective silicon epitaxial growth using disilane and chlorine O'Neil PA, Ozturk MC, Batchelor AD, Xu MM, Maher DM |
2353 - 2356 |
Effect of co-doping on the photoluminescence behavior of Zn2SiO4 : Mn phosphors Sohn KS, Cho BH, Chang HJ, Park HD |
2357 - 2359 |
Impedance spectroscopic study of beta-Ga2O3/O-2 interaction Kiss G, Perczel IV, Fleischer M, Reti F, Meixner H, Giber J |
2360 - 2364 |
Oxygen role in the electrochemical response of a gas sensor using ideally polarizable electrodes Pupier C, Pijolat C, Marchand JC, Lalauze R |
2365 - 2369 |
Electrochromic reaction of InN thin films Asai N, Inoue Y, Sugimura H, Takai O |