Journal of Vacuum Science & Technology A

Journal of Vacuum Science & Technology A, Vol.28, No.1 Entire volume, number list

ISSN: 0734-2101 (Print)

In this Issue (25 articles)

1 - 5	Effects of dopant ion and Mn valence state in the La(1-x)A(x)MnO(3) (A=Sr, Ba) colossal magnetoresistance films Choi SG, Wang SJ, Park HH, Hong M, Kwon KH
6 - 10	Study of Ni-2-Mn-Ga phase formation by magnetron sputtering film deposition at low temperature onto Si substrates and LaNiO3/Pb(Ti,Zr)O-3 buffer Figueiras F, Rauwel E, Amaral VS, Vyshatko N, Kholkin AL, Soyer C, Remiens D, Shvartsman VV, Borisov P, Kleemann W
11 - 15	Etching characteristics and mechanism of indium tin oxide films in an inductively coupled HBr/Ar plasma Kwon KH, Efremov A, Ham YH, Min NK, Lee HW, Hong MP, Kim K
16 - 19	Effects of Al doping and annealing on chemical states and band diagram of Y2O3/Si gate stacks studied by photoemission and x-ray absorption spectroscopy Toyoda S, Okabayashi J, Komatsu M, Oshima M, Lee DI, Sun SY, Sun Y, Pianetta PA, Kukuruznyak D, Chikyow T
20 - 26	In situ x-ray diffraction study of Ni-Yb interlayer and alloy systems on Si(100) Knaepen W, Demeulemeester J, Jordan-Sweet J, Vantomme A, Detavernier C, Van Meirhaeghe RL, Lavoie C
27 - 32	Effect of methane addition on ultrananocrystalline diamond formation: Morphology changes and induced stress Ramos SC, Azevedo AF, Baldan MR, Ferreira NG
33 - 40	Microstructure and temperature coefficient of resistance of thin cermet resistor films deposited from CrSi2-Cr-SiC targets by S-gun magnetron Felmetsger VV
41 - 47	Flexible indium zinc oxide/Ag/indium zinc oxide multilayer electrode grown on polyethersulfone substrate by cost-efficient roll-to-roll sputtering for flexible organic photovoltaics Park YS, Kim HK
48 - 53	Influence of annealing and Ag doping on structural and optical properties of indium tin oxide thin films Cao CB, Xiao L, Song XP, Sun ZQ
54 - 60	Nanocrystalline cobalt-based films with high thermal stability from a single molecule Henderson LB, Rivers JH, Bost DE, Jones RA, Ekerdt JG
61 - 64	Effect of anion-to-cation supplying ratio on the surface morphology of AlN films grown on ZnO substrates at low temperature Im I, Jung M, Koo J, Lee H, Park J, Minegishi T, Park S, Fujii K, Yao T, Kil G, Hanada T, Chang J
65 - 68	Highly selective etching of silicon nitride to physical-vapor-deposited a-C mask in dual-frequency capacitively coupled CH2F2/H-2 plasmas Kim JS, Kwon BS, Heo W, Jung CR, Park JS, Shon JW, Lee NE
69 - 76	Microstructure and chemical wet etching characteristics of AlN films deposited by ac reactive magnetron sputtering Tanner SM, Felmetsger VV
77 - 87	Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes Mackus AJM, Heil SBS, Langereis E, Knoops HCM, van de Sanden MCM, Kessels WMM
88 - 93	Influence of oxygen partial pressure on microstructure and discharge properties of Mg-Zr-O protective films deposited by magnetron sputtering Wang JF, Wu HY, Song ZX, Li YH, Xu KW, Liu CL
94 - 98	Irregular Au profile on the SiO2 surface and at the SiO2/Si interface and the oxidation kinetics of thermally oxidized Au-contaminated n-Si (001) surfaces Shimizu H, Shimada S, Nagase S, Muta S, Ikeda M
99 - 107	Multilayer high reflectance coating on polyethylene terephthalate film consisting of Ag/SiO2/TiO2 layers that are not quarter-wave thickness Koike K, Shimada K, Fukuda S
108 - 111	High power impulse magnetron sputtering using a rotating cylindrical magnetron Leroy WP, Mahieu S, Depla D, Ehiasarian AP
112 - 118	In situ plasma diagnostics study of a commercial high-power hollow cathode magnetron deposition tool Meng L, Raju R, Flauta R, Shin H, Ruzic DN, Hayden DB
119 - 126	Molecular thin film chemical modifications under vacuum ultraviolet irradiation Nghiem MP, Tondu T, Roussel JF, Faye D
127 - 134	Synthesis, characterization, and photoactivity of InTaO4 and In0.9Ni0.1TaO4 thin films prepared by electron evaporation Rico VJ, Frutos F, Yubero F, Espinos JP, Gonzales-Elipe AR
135 - 138	Crystallinity and resistivity of ZnO thin films with indium implantation and postannealing Matsuda T, Furuta M, Hiramatsu T, Furuta H, Hirao T
139 - 146	"SensArray" voltage sensor analysis in an inductively coupled plasma Titus MJ, Hsu CC, Graves DB
147 - 151	Influences of sulfur segregation to permeability in Pd-D-2 permeation system Gao JS, Hioki T, Takahashi N, Motohiro T
152 - 158	Position of segregated Al atoms and the work function: Experimental low energy electron diffraction intensity analysis and first-principles calculation of the (root 3x root 3)R30 degrees superlattice phase on the (111) surface of a Cu-9 at. % Al alloy Yoshitake M, Karas I, Houfek J, Madeswaran S, Song W, Matolin V