Journal of Vacuum Science & Technology A

Journal of Vacuum Science & Technology A, Vol.24, No.2 Entire volume, number list

ISSN: 0734-2101 (Print)

In this Issue (33 articles)

L1 - L3	Co-ITO granular magnetoresistance films fabricated by precipitation of magnetic nanoparticles from amorphous oxide Ekawati W, Shi J, Nakamura Y, Nittono O
L4 - L6	Transparent conductive Cd3TeO6 thin films with perovskite structure Tetsuka H, Shan YJ, Tezuka K, Imoto H, Wasa K
179 - 189	Raman spectroscopy study of the influence of processing conditions on the structure of polycrystalline diamond films Ramamurti R, Sharlov V, Singh RN, Mamedov S, Boolchand P
190 - 194	Phase transformations of sputtered ZrV2 films after annealing and hydrogenation Shi LQ, Xu SL
195 - 201	Stress anisotropy and stress gradient in magnetron sputtered films with different deposition geometries Zhao ZB, Yalisove SM, Bilello JC
202 - 205	Optical emission from the aggregated state in poly [2-methoxy-5-(2'-ethyl-hexyloxy)-p-phenylene vinylenel Kong F, Wu XL, Yuan RK, Yang CZ, Siu GG, Chu PK
206 - 211	Structural and optical characteristics of tantalum oxide grown by pulsed Nd : YAG laser oxidation Atanassova E, Aygun G, Turan R, Babeva T
212 - 217	Experimental and numerical evaluations of adhesion strength and stress in TiN films deposited on ti-implanted aluminum Xu M, Liu YM, Li LH, Cai X, Chen QL, Chu PK
218 - 222	c-axis inclined ZnO films for shear-wave transducers deposited by reactive sputtering using an additional blind Link M, Schreiter M, Weber J, Gabl R, Pitzer D, Primig R, Wersing W, Assouar MB, Elmazria O
223 - 228	Effects of deposition conditions on gas-barrier performance of SiOxNy thin films formed via ion-beam-assisted vapor deposition Kobayashi T, Nakano Y, Ogawa M, Hashimoto R, Kamikawa S, Itoh Y
229 - 234	Speed-controlled particle injection into a low-pressure system Kim JH, Fissan H, Asbach C, Yook SJ, Pui DYH
235 - 245	Texture of Ru columns grown by oblique angle sputter deposition Morrow P, Tang F, Karabacak T, Wang PI, Ye DX, Wang GC, Lu TM
246 - 249	Investigation of hexagonal microtube ZnO on silicon by capacitance-voltage measurements Sun YS, Liu N, Zhou X, Deng H, Gao H, Wu HJ, Li YR
250 - 260	Quantitative analysis of CN/TiCN/TiN multilayers and their thermal stability by Auger electron spectroscopy and Rutherford backscattering spectrometry depth profiles Prieto P, Morant C, Climent-Font A, Munoz A, Elizalde E, Sanz JM
261 - 263	Laser deposition and dielectric properties of cubic pyrochlore bismuth zinc niobate thin films Jiang SW, Jiang B, Liu XZ, Li YR
264 - 268	Structural defects in an epitaxial ZnO/(0112) r-plane sapphire studied. by high-resolution electron microscopy and computer simulation Lim SH
269 - 274	Inert, pulsed, ultrahigh-vacuum-compatible doser for study of hydrazine decomposition on a model Ir/Al2O3/NiAl(110) catalyst Fan CY, Wu TP, Anderson SL
275 - 279	High-precision determination of lattice constants and structural characterization of InN thin films Wu MF, Zhou SQ, Vantomme A, Huang Y, Wang H, Yang H
280 - 285	Low-temperature electron cyclotron resonance plasma-enhanced chemical-vapor deposition silicon dioxide as gate insulator for polycrystalline silicon thin-film transistors Maiolo L, Pecora A, Fortunato G, Young ND
286 - 290	Structure of surface reaction layer of poly-Si etched by fluorocarbon plasma Kurihara K, Egami A, Nakamura M
291 - 295	Plasma enhanced chemical vapor deposition of silicon oxide films with divinyldimethylsilane and tetravinylsilane Park SG, Rhee SW
296 - 304	Attenuated total reflection infrared spectroscopy for studying adsorbates on planar model catalysts: CO adsorption on silica supported Rh nanoparticles Leewis CM, Kessels WMM, de Sanden MCMV, Van de Sanden MCM, Niemantsverdriet JW
305 - 308	Magnetic anisotropy of (Ga,Mn)As films grown on Si (001) substrates Sato S, Jinbo Y, Uchitomi N
309 - 316	Radio frequency dual magnetron sputtering deposition and characterization of nanocomposite Al2O3-ZrO2 thin films Trinh DH, Hogberg H, Andersson JM, Collin M, Reineck I, Helmersson U, Hultman L
317 - 323	Crystallization and (Al,Ti)-oxide growth in annealed TiO2-Al2O3 multilayers Omari MA, Sorbello RS, Aita CR
324 - 327	Stress-induced wrinkling of sputtered SiO2 films on polymethylmethacrylate Serrano JR, Xu QQ, Cahill DG
328 - 333	Influence of process parameters on the properties of the tantalum oxynitride thin films deposited by pulsing reactive gas sputtering Banakh O, Heulin T, Schmid PE, Le Dreo H, Tkalcec I, Levy F, Steinmann PA
334 - 339	Improved durability of dielectric coatings for large-area applications on glass via ion beam pretreatment of the substrate West GT, Kelly PJ
340 - 349	Effects of nitrogen content on microstructure and oxidation behaviors of Ti-B-N nanocomposite thin films Lu YH, Shen YG, Zhou ZF, Li KY
350 - 361	Feature scale model of Si etching in SF6/O-2/HBr plasma and comparison with experiments Belen RJ, Gomez S, Kiehlbauch M, Aydil ES
362 - 368	Secondary ion mass spectrometry depth profiling of amorphous polymer multilayers using O-2(+) and Cs+ ion bombardment with a magnetic sector instrument Harton SE, Stevie FA, Ade H
369 - 374	Electrical and physical properties of room temperature deposited, mixed TiO2/SiO2 oxides Busani T, Devine RAB, Yu XK, Seo HW
375 - 381	Systematic studies of SiGe/Si islands nucleated via separate in situ or ex situ Ga+ focused ion beam-guided growth techniques Vandervelde TE, Atha S, Hull R, Pernell TL, Bean JC