385 - 389 |
Analysis of unstable species in cyclo-C4F8 plasma by ion attachment mass spectrometry Nakamura M, Hirano Y, Shiokawa Y, Takayanagi M, Nakata M |
390 - 395 |
Characterization of facing-target reactive sputtered polycrystalline Fe3O4 films Shen JJ, Mi WB, Li ZQ, Wu P, Jiang EY, Bai HL |
396 - 407 |
Electron inelastic mean free path and dielectric properties of a-boron, a-carbon, and their nitrides as determined by quantitative analysis of reflection electron energy loss spectroscopy Prieto P, Quiros C, Elizalde E, Sanz JM |
408 - 412 |
Effects of Pt addition on the formation of Co-ITO granular magneto resistance films by a two-step method Ekawati W, Shi J, Nakamura Y, Nittono O |
413 - 417 |
Electron cyclotron resonance plasma assisted pulsed laser deposition for compound host film synthesis and in situ doping Lu YF, Sun J, Yu D, Shi LQ, Dong ZB, Wu JD |
418 - 423 |
Deposition of hafnium. oxide from Hf t-butoxide and nitric oxide Zhang Z, Xia B, Gladfelter WL, Campbell SA |
424 - 430 |
Plasma etching of benzocyclobutene in CF4/O-2 and SF6/O-2 plasmas Kim GS, Steinbruchel C |
431 - 436 |
Study of temperature influence on electron beam induced deposition Li W, Joy DC |
437 - 443 |
Selective etching of high-k HfO2 films over Si in hydrogen-added fluorocarbon (CF4/Ar/H-2 and C4F8/Ar/H-2) plasmas Takahashi K, Ono K |
444 - 449 |
Characterization of the NiFe sputter etch process in a rf plasma Kropewnicki TJ, Paterson AM, Panagopoulos T, Holland JP |
450 - 458 |
Computational analysis of solid-vapor equilibria for ZnS and SrS phosphor synthesis conditions Wiedemeier H |
459 - 466 |
Electrical property improvements of yttrium oxide-based metal-insulator-metal capacitors Durand C, Vallee C, Dubourdieu C, Kahn M, Derivaz M, Blonkowski S, Jalabert D, Hollinger P, Fang Q, Boyd IW |
467 - 473 |
Vacuum science considerations for rapid reactor recovery with extremely low oxygen in low temperature low pressure chemical vapor deposition of Si1-xGex and Si1-x-yGexCy films Enicks D, Oleszek G |
474 - 485 |
Thin film reaction of transition metals with germanium Gaudet S, Detavernier C, Kellock AJ, Desjardins P, Lavoie C |
486 - 496 |
Attenuation of hydrogen radicals traveling under flowing gas conditions through tubes of different materials Grubbs RK, George SM |
497 - 504 |
Surfactant-assisted growth of CdS thin films for photovoltaic applications Perkins CL, Hasoon FS |
505 - 511 |
Characteristics and diagnostics of an ultrahigh vacuum compatible laser ablation source for crossed molecular beam experiments Gu XB, Guo Y, Kawamura E, Kaiser RI |
512 - 516 |
Effect of multipactor discharge on Alcator C-Mod ion cyclotron range of frequency heating Graves TP, Wukitch SJ, LaBombard B, Hutchinson IH |
517 - 520 |
Arsenic doping for synthesis of nanocrystalline p-type ZnO thin films Xu N, Xu YL, Li L, Shen YQ, Zhang TW, Wu JD, Sun J, Ying ZF |
521 - 528 |
Low-temperature sputtering of crystalline TiO2 films Musil J, Herman D, Sicha J |
529 - 536 |
Conductance measurement of a conical tube and calculation of the pressure distribution Mercier B |
537 - 541 |
Mechanical properties of Cu-Al-O thin films prepared by plasma-enhanced chemical vapor deposition Chen W, Gong H, Zeng KY |
542 - 549 |
Detecting free radicals during the hot wire chemical vapor deposition of amorphous silicon carbide films using single-source precursors Zaharias GA, Duan HL, Bent SF |
550 - 553 |
Atmospheric pressure plasma analysis by modulated molecular beam mass spectrometry Gonzalvo YA, Whitmore TD, Rees JA, Seymour DL, Stoffels E |
554 - 583 |
Hard multilayer coatings containing TiN and/or ZrN: A review and recent progress in their nanoscale characterization Ziebert C, Ulrich S |
586 - 586 |
Papers from the 12th Canadian Semiconductor Technology Conference -16-19 August 2005 - The Fairmont Chateau Laurier Hotel Ottawa, Canada -Preface Bardwell J, Py C |
587 - 590 |
Growth and characterization of GaAsSb metamorphic samples on an InP substrate Mohammedy FM, Hulko O, Robinson BJ, Thompson DA, Deen MJ, Simmons JG |
591 - 594 |
Investigation of the optical properties of InGaAs(N):(Sb) quantum wells grown by metal organic vapor phase epitaxy Chen WC, Su YK, Chuang RW, Hsu SH |
595 - 599 |
Energetic ion bombarded Fe/Al multilayers Al-Busaidy MS, Crapper MD |
600 - 605 |
Compositional effect on the dielectric properties of high-k titanium silicate thin films deposited by means of a cosputtering process Brassard D, Sarkar DK, El Khakani MA, Ouellet L |
606 - 611 |
Growth of CdTe/Si(100) thin films by pulsed laser deposition for photonic applications Neretina S, Hughes RA, Sochinskii NV, Weber M, Lynn KG, Wojcik J, Pearson GN, Preston JS, Mascher P |
612 - 617 |
Thermochromic vanadium dioxide smart coatings grown on Kapton substrates by reactive pulsed laser deposition Soltani M, Chaker M, Haddad E, Kruzelesky RV |
618 - 623 |
High-performance n-channel 13.56 MHz plasma-enhanced chemical vapor deposition nanocrystalline silicon thin-film transistors Lee CH, Sazonov A, Nathan A |
624 - 628 |
Self-heating and the temperature dependence of the dc characteristics of GaN heterostructure field effect transistors McAlister SP, Bardwell JA, Haffouz S, Tang H |
629 - 633 |
Characterization and modeling of AlGaN/GaN heterostructure field effect transistors for low noise amplifiers Knox SH, Rogers JWM, Chyurlia PNA, Tarr NG, Bardwell JA, Tang H, Haffouz S |
634 - 636 |
Improvement of electrical and optical properties of p-GaN Ohmic metals under ultraviolet light irradiation annealing processes Chae SW, Yoon SK, Kwak JS, Park YH, Kim TG |
637 - 640 |
Nitride-based ultraviolet metal-semiconductor-metal photodetectors with low-temperature GaN cap layers and Ir/Pt contact electrodes Chang SJ, Yu CL, Chen CH, Chang PC, Huang KC |
641 - 644 |
Visible-blind ultraviolet imagers consisting of 8X8 AlGaN p-i-n photodiode arrays Kim KC, Sung YM, Lee IH, Lee CR, Kim MD, Park Y, Kim TG |
645 - 648 |
Molecular model T6 : C-60 bulk-heterojunction solar cells Alem S, Pandey AK, Unni KNN, Nunzi JM, Blanchard P |
649 - 653 |
Charge localization in polymeric metal-oxide-semiconductor capacitors Marinov O, Deen MJ, Iniguez B, Ong B |
654 - 656 |
Hole mobility and electroluminescence properties of a dithiophene indenofluorene Py C, Gorjanc TC, Hadizad T, Zhang J, Wang ZY |
657 - 662 |
Photolithographically defined polythiophene organic thin-film transistors Li FM, Vygranenko Y, Koul S, Nathan A |
663 - 667 |
Probing the composition of Ge dots and Si/Si1-xGex island superlattices Baribeau JM, Wu X, Lockwood DJ |
668 - 672 |
Organic monolayers detected by single reflection attenuated total reflection infrared spectroscopy Rowell NL, Tay L, Lockwood DJ, Baribeau JM, Bardwell JA, Boukherroub R |
673 - 677 |
Dynamic electrostatic force-gradient microscopy employing mechanoelectric cross modulation Weng Z, Kaminski T, Bridges GE, Thomson DJ |
678 - 681 |
Characteristics of remote plasma atomic layer-deposited HfO2 films on O-2 and N-2 plasma-pretreated Si substrates Choi J, Kim S, Kim J, Kang H, Jeon H, Bae C |
682 - 685 |
Annealing temperature effect on the performance of nonvolatile HfO2Si-oxide-nitride-oxide-silicon-type flash memory Lin YH, Chien CH, Chang CY, Lei TF |
686 - 689 |
Time resolved electroluminescence measurements on GaAs and GaN devices Hulse JE, Sarault K, Rowell NL, Simard-Normandin M, Bardwell JA |
690 - 693 |
Performance and potential of germanium on insulator field-effect transistors Yu DS, Kao HL, Chin A, McAlister SP |
694 - 699 |
Microstructure investigations of indium tin oxide films cosputtered with zinc oxide at room temperature Liu DS, Lin CH, Tsai FC, Wu CC |
700 - 703 |
Rapid thermal annealing of InAs/GaAs quantum dots with a low-temperature-grown InGaP cap layer Jiang WH, Thompson DA, Hul'ko O, Robinson BJ, Mascher P |
704 - 707 |
Observation of resonant tunneling through a self-assembled InAs quantum dot layer Aslan B, Liu HC, Gupta JA, Wasilewski ZR, Aers GC, Raymond S, Buchanan M |
708 - 712 |
Switching-speed calculations for Schott ky-barrier carbon nanotube field-effect transistors John DL, Pulfrey DL |
713 - 717 |
Photoluminescence in thesilicon-oxygen system Meldrum A, Hryciw A, MacDonald AN, Blois C, Marsh K, Wang J, Li Q |
718 - 722 |
Fabrication of out-of-plane micromirrors in silicon-on-insulator planar waveguides Lamontagne B, Cheben P, Post E, Janz S, Xu DX, Delage A |
723 - 727 |
Formation of nanoscale columnar structures in silicon by a maskless reactive ion etching process Gharghi M, Sivoththaman S |
728 - 731 |
Inductively coupled plasma etching of Si1-xGex in CF4/Ar and Cl-2/Ar discharges Wu SL, Lee CH, Chang SJ, Lin YM |
732 - 736 |
Direct evidence of "spring softening" nonlinearity in micromachined mechanical resonator using optical beam deflection technique Zhao JH, Bridges GE, Thomson DJ |
737 - 741 |
Microelectrode arrays for two-dimensional polar movement of microparticles in water Belisle A, Brown M, Hubbard T, Kujath M |
742 - 746 |
Fabricating multilevel SU-8 structures in a single photolithographic step using colored masking patterns Taff J, Kashte Y, Spinella-Marno V, Paranjape M |
747 - 751 |
In situ monitoring of protein adsorption on functionalized porous Si surfaces Tay L, Rowell NL, Lockwood DJ, Boukherroub R |
752 - 757 |
Ultrawideband radar imaging system for biomedical applications Jafari HM, Liu W, Hranilovic S, Deen MJ |
758 - 762 |
Practical approach to gradient direction sensor method in very large scale integration thermomechanical stress analysis Lakhsasi A, Bougataya M, Massicotte D |
763 - 769 |
Very low-voltage operation capability of complementary metal-oxide-semiconductor ring oscillators and logic gates Deen MJ, Naseh S, Marinov O, Kazemeini MH |
770 - 773 |
Low noise signal-to-noise ratio enhancing readout circuit for current-mediated active pixel sensors Ottaviani T, Karim KS, Nathan A, Rowlands JA |
774 - 777 |
Terahertz emission properties of arsenic and oxygen ion-implanted GaAs based photoconductive pulsed sources Salem B, Morris D, Salissou Y, Aimez V, Charlebois S, Chicoine M, Schiettekatte F |
778 - 782 |
Terahertz quantum cascade lasers: Fabrication, characterization, and doping effect Ban D, Wachter M, Liu HC, Wasilewski ZR, Buchanan M, Aers GC |
783 - 786 |
Silicon-on-insulator waveguide photodetector with self-ion-implantation-engineered-enhanced infrared response Knights AP, Bradley JDB, Gou SH, Jessop PE |
787 - 790 |
Gain spectra of 1.3 mu m GalnNAs laser diodes Zhang X, Gupta JA, Barrios PJ, Pakulski G, Wu X, Delage A |
791 - 796 |
Modified single missing air-hole defects in InAs/InP quantum dot membrane photonic crystal microcavities Dalacu D, Frederick S, Lapointe J, Poole PJ, Aers GC, Williams RL |
797 - 801 |
Measurements of TiOx stress induced on InP/InGaAs/InGaAsP quantum well heterostructures Francois A, Aimez V, Beauvais J, Barba D |
802 - 806 |
Microelectromechanical system based variable optical attenuator by vertically bending waveguides Zhang GH, Jessop PE |
807 - 811 |
Electrical isolation of electrodes with submicron separation in a digital optical switch Ng S, Abdalla S, Syrett B, Barrios P, McKinnon WR, Delage A, Golub I, Janz S, Lapointe J |
812 - 816 |
Fabrication of lithographically defined optical coupling facets for silicon-on-insulator waveguides by inductively coupled plasma etching Yap KP, Lamontagne B, Delage A, Janz S, Bogdanov A, Picard M, Post E, Chow-Chong P, Malloy M, Roth D, Marshall P, Liu KY, Syrett B |
817 - 820 |
H-induced effects in luminescent silicon nanostructures obtained from plasma enhanced chemical vapor deposition grown SiyO1-y : H(y > 1/3) thin films annealed in (Ar+5%H-2) Comedi D, Zalloum OHY, Irving EA, Wojcik J, Mascher P |
821 - 826 |
Near-unity ideality factor diodes using nanocrystalline Si/multicrystalline Si heterojunctions for photovoltaic application Farrokh-Baroughi M, Lee CH, Sivoththaman S |
827 - 830 |
Characterization of microwave photonic band-gap structures with bandpass filter applications Wu JH, Shih I, Qiu SN, Qiu CX |
831 - 834 |
Temperature effects in complementary metal-oxide semiconductor microwave distributed amplifiers Ranuarez JC, Deen MJ, Chen CH |
835 - 840 |
Parasitics-aware layout design of a low-power fully integrated complementary metal-oxide semiconductor power amplifier Abdelsayed SM, Deen MJ, Nikolova NK |
841 - 845 |
On-chip inductors incorporating porous-Si and intrinsic-amorphous-Si films for rf integrated circuits Chang S, Sivoththaman S |
846 - 849 |
High dynamic range pixel architecture for advanced diagnostic medical x-ray imaging applications Izadi MH, Karim KS |
850 - 853 |
High dynamic range active pixel sensor arrays for digital x-ray imaging using a-Si : H Lai J, Nathan A, Rowlands J |
854 - 859 |
Single photon counter for digital x-ray mammography tomosynthesis Goldan AH, Karim KS, Rowlands JA |
860 - 865 |
Evaluation of complementary metal-oxide semiconductor based photodetectors for low-level light detection Ardeshirpour Y, Deen MJ, Shirani S |
866 - 868 |
Low leakage a-Si : H thin film transistors deposited on glass substrates using hot-wire chemical vapor deposition Taghibakhsh F, Karim KS, Madan A |
869 - 874 |
Nanoscale channel and small area amorphous silicon vertical thin film transistor Chan I, Fathololoumi S, Nathan A |
875 - 878 |
Stable a-Si : H circuits based on short-term stress stability of amorphous silicon thin film transistors Chaji GR, Safavian N, Nathan A |
879 - 882 |
Signal and noise modeling and analysis of complementary metal-oxide semiconductor active pixel sensors Faramarzpour N, Deen MJ, Shirani S |
883 - 887 |
Temperature characterization of a-Si : H thin-film transistor for analog circuit design using analog hardware description language modeling Ng C, Nathan A |
888 - 891 |
Numerical study on the scaling of a-Si : H thin film transistors Fathololoumi S, Chan I, Moradi M, Nathan A |