Journal of Vacuum Science & Technology A

Journal of Vacuum Science & Technology A, Vol.13, No.4 Entire volume, number list

ISSN: 0734-2101 (Print)

In this Issue (74 articles)

1819 - 1825	Adsorption and Decomposition of Diethylsilane and Diethylgermane on Si(100) - Surface-Reactions for an Atomic Layer Epitaxial Approach to Column-IV Epitaxy Kellerman BK, Mahajan A, Russell NM, Ekerdt JG, Banerjee SK, Tasch AF, Campion A, White JM, Bonser DJ
1826 - 1830	Matrix Effect of Bombardment-Induced Gibbsian Segregation on Cu Depletion at a Cuxni100-X Subsurface Zheng LP, Li RS, Xia XQ, Li MQ, Li MY
1831 - 1836	GaN Patterned Film Synthesis - Carbon Depletion by Hydrogen-Atoms Produced from NH3 Activated by Electron-Impact Hubner A, Lucas SR, Partlow WD, Choyke WJ, Schaefer JA, Yates JT
1837 - 1846	Sulfur Layer Formation on GaAs(100) by Thermal and Photochemical H2S Dissociation Nooney MG, Liberman V, Martin RM
1847 - 1852	Importance of the Surface Oxide Layer in the Reduction of Outgassing from Stainless-Steels Ishikawa Y, Yoshimura T
1853 - 1860	H2O Adsorption-Kinetics on Si(111)7X7 and Si(111)7X7 Modified by Laser Annealing Wise ML, Okada LA, Sneh O, George SM
1861 - 1866	Molecular-Dynamics Simulations of Fluorine Molecules Interacting with a Si(100)(2X1) Surface at 1000 K Schoolcraft TA, Diehl AM, Steel AB, Garrison BJ
1867 - 1871	Thermal-Stimulated and Electron-Stimulated Chemistry of a Cyclotriphosphazene Lubricant on a Magnetic Disk with a Hard Carbon Overcoat Lin JL, Yates JT
1872 - 1878	Modeling of Water Outgassing from Metal-Surfaces .3.) Li MX, Dylla HF
1879 - 1884	Synchrotron-Radiation-Induced Reactions of a Condensed Layer of Silicon Alkoxide on Si Kinashi K, Niwano M, Sawahata JI, Shimoshikiryo F, Miyamoto N
1885 - 1892	Photodecomposition of Poly(Methylmethacrylate) Thin-Films by Monochromatic Soft-X-Ray Radiation Tinone MC, Tanaka K, Ueno N
1893 - 1900	X-Ray Photoelectron-Spectroscopy and Transmission Electron-Microscopy Studies of the NiAl/Al2O3 Interfacial Chemical Compatibility Silvain JF, Bihr JC, Alnot M, Lambert J, Ehrhardt JJ
1901 - 1906	Optical-Emission Study of Reaction-Mechanisms in the Deposition of Nitrogen-Containing Amorphous Hydrogenated Carbon-Films Durrant SF, Rangel EC, Demoraes MA
1907 - 1912	A Study of the Interaction Between Thermally Deposited Aluminum Films and Fluoropolymer Substrates Du YZ, Gardella JA
1913 - 1916	Surface Dielectric Function of CdTe(110) Obtained by Polarized Surface Differential Reflectivity Data Cricenti A, Felici AC
1917 - 1923	Characterization of Substrate-Temperature and Damage in Diamond Growth Plasmas by Multichannel Spectroellipsometry Wakagi M, Hong BG, Nguyen HV, Collins RW, Drawl W, Messier R
1924 - 1929	Formation of Secondary Phases in Evaporated Cuins2 Thin-Films - A Surface Analytical Study Scheer R, Lewerenz HJ
1930 - 1934	In-Situ Diagnostic for Etch Uniformity Buie MJ, Pender JT, Soniker J, Brake ML, Elta M
1935 - 1940	Mass-Spectrometric Studies of Remote Helium Plasma Dissociation of Silane Jasinski JM
1941 - 1944	In-Situ Production of Very-Low-Density Microporous Polymeric Foams Falconer JW, Nazarov W, Horsfield CJ
1945 - 1958	Excimer-Laser Ablation Mass-Spectrometry of Inorganic Solids - Chemical, Matrix, and Sampling Effects on Polyatomic Ion Yields Gibson JK
1959 - 1966	Quantitative-Analysis of Borophosphosilicate Glass-Films on Silicon Using Infrared External Reflection-Absorption Spectroscopy Franke JE, Zhang LZ, Niemczyk TM, Haaland DM, Radigan KJ
1967 - 1969	Photoemission-Studies of K-Promoted Nitridation and Oxidation of the InP(100) Surface Using Synchrotron-Radiation Zhao TX, Ji H, Liang Q, Wang XP, Xu PS, Lu ED, Wu JX, Hsu CC
1970 - 1976	Competitive Halogenation of Silicon Surfaces in HBr/Cl-2 Plasmas Studied Ray Photoelectron-Spectroscopy and in-Situ, Real-Time, Pulsed Laser-Induced Thermal-Desorption Cheng CC, Guinn KV, Herman IP, Donnelly VM
1977 - 1983	Morphology Study of the Thermal-Oxidation of Rough Silicon Surfaces Liu Q, Spanos L, Zhao C, Irene EA
1984 - 1989	Measurements of Reflected Electron-Energy-Loss Spectrometry and X-Ray Photoelectron-Spectroscopy Spectra for Derivations of the Energy-Loss Function and Source Function for Au 4F Photoelectrons Yoshikawa H, Irokawa Y, Shimizu R
1990 - 1993	Surface Type Conversion of CuInSe2 with H2S Plasma Exposure - A Photoemission Investigation Nelson AJ, Frigo SP, Rosenberg R
1994 - 1998	N-15 Hydrogen Depth Profiling Measurements of Candidate Superconducting Supercollider Beam Pipe Materials Ruckman MW, Strongin M, Lanford WA, Turner WC
1999 - 2004	Study of Ion Mixing During Auger Depth Profiling of Ge-Si Multilayer System .2. Low Ion Energy (0.2-2 keV) Range Menyhard M, Barna A, Biersack JP, Jarrendahl K, Sundgren JE
2005 - 2012	Methods to Enhance Absorption Signals in Infrared Reflectance Spectroscopy - A Comparison Using Optical Simulations Katiyar M, Abelson JR
2013 - 2017	Local-Density of States Analysis by Auger-Electron Spectroscopy Zhou HJ, Wang YQ, Ho W
2018 - 2022	Boron-Nitride Thin-Film Deposition from Solid Borane Ammonia Using an Electron-Cyclotron-Resonance Microwave Plasma Source Eddy CR, Sartwell BD
2023 - 2029	Remote Plasma and Ultraviolet-Ozone Modification of Polystyrene Callen BW, Ridge ML, Lahooti S, Neumann AW, Sodhi RN
2030 - 2034	Compositionally Gradient (Ti1-xAlx)N Coatings Made by Plasma-Enhanced Chemical-Vapor-Deposition Lee SH, Lee JJ
2035 - 2043	Electron Cyclotron-Resonance Plasma Reactor for SiO2 Etching - Process Diagnostics, End-Point Detection, and Surface Characterization Wan ZM, Liu J, Lamb HH
2044 - 2050	Generation and Behavior of Particulates in a Radio-Frequency Excited CH4 Plasma Yeon CK, Whang KW
2051 - 2057	Negative-Ions in a Ccl2F2 Radio-Frequency Discharge Stoffels E, Stoffels WW, Vender D, Kroesen GM, Dehoog FJ
2058 - 2066	The Chemistry of a Ccl2F2 Radio-Frequency Discharge Stoffels WW, Stoffels E, Haverlag M, Kroesen GM, Dehoog FJ
2067 - 2073	Effect of Wall Charging on an Oxygen Plasma Created in a Helicon Diffusion Reactor Used for Silica Deposition Charles C, Boswell RW
2074 - 2085	Characterization of a Slot Antenna Microwave Plasma Source for Hydrogen Plasma Cleaning Korzec D, Werner F, Brockhaus A, Engemann J, Schneider TP, Nemanich RJ
2086 - 2092	Magnetically Confined Inductively-Coupled Plasma-Etching Reactor Lai C, Brunmeier B, Woods RC
2093 - 2098	Online Studies of Plasma Surface Interactions Between a Radio-Frequency Plasma-Jet and 3 W/O Boron-Doped Graphite Samples Avni R, Erin J, Morvan D, Mabillerouger I, Amouroux J, Winter J, Nickel H
2099 - 2104	Control of Radio-Frequency-Plasma Process to Improve the Reproducibility of Silicon Oxynitride Thin-Film Preparation Diatezua DM, Thiry PA, Caudano R
2105 - 2109	Electron-Cyclotron-Resonance Plasma Generation Using a Planar Ring-Cusp Magnetic-Field and a Reentrant Coaxial Cavity Yasui T, Tahara H, Yoshikawa T
2110 - 2122	Formation of C-N Thin-Films by Ion-Beam Deposition Boyd KJ, Marton D, Todorov SS, Albayati AH, Kulik J, Zuhr RA, Rabalais JW
2123 - 2127	Effect of Residual-Gas on Cu Film Deposition by Partially-Ionized Beam Koh SK, Jin ZG, Lee JY, Jung HJ, Kim KH, Choi DJ
2128 - 2132	Cluster Beam Deposition - Optimization of the Cluster Beam Source Gatz P, Hagena OF
2133 - 2137	Structuring of Various Materials Using Cluster Ions Henkes PR, Krevet B
2138 - 2141	Simple Method for Fe+ Ion Production in a Microwave Ion-Source Matsuo T, Miyake K
2142 - 2145	Effect of Ni on Graphite Thin-Film Formation from Organic Materials by Chemical-Vapor-Deposition Yudasaka M, Kikuchi R, Matsui T, Tasaka K, Ohki Y, Yoshimura S, Ota E
2146 - 2150	Etching of InP Surface Oxide with Atomic-Hydrogen Produced by Electron-Cyclotron-Resonance Hofstra PG, Robinson BJ, Thompson DA, Mcmaster SA
2151 - 2156	Magnetic-Field in 2-Dimensional Magnetrons Murphy MJ, Cameron DC
2157 - 2160	Ferromagnetic-Resonance in Ni Films Biased DC Sputter-Deposited on MgO(001) Maruyama H, Qiu H, Nakai H, Hashimoto M
2161 - 2169	Monte-Carlo Calculations of Gas Rarefaction in a Magnetron Sputtering Discharge Turner GM
2170 - 2176	Preparation of Al-Ni Alloy-Films by Alternate Sputter-Deposition Ho JK, Lin KL
2177 - 2182	Characterization and Analysis of ZnO-Al Deposited by Reactive Magnetron Sputtering Zafar S, Ferekides CS, Morel DL
2183 - 2188	Flux Distributions and Deposition Profiles from Hexagonal Collimators During Sputter-Deposition Lin Z, Cale TS
2189 - 2193	Microstructural and Morphological Effects on the Tribological Properties of Electron Enhanced Magnetron-Sputtered Hard Coatings Schneider JM, Voevodin AA, Rebholz C, Matthews A
2194 - 2198	Magnetic-Properties of Ion-Beam Sputter-Deposited NiFe Ultrathin Films Ueno M, Tanoue S
2199 - 2209	Role of Oxygen Partial-Pressure on the Properties of Doped Silicon Oxycarbide Microcrystalline Layers Produced by Spatial Separation Techniques Martins R, Vieira M, Ferreira I, Fortunato E
2210 - 2213	Structures of Fe/TiC Multilayers Prepared by Ion-Beam Sputtering at Room-Temperature Liu CH, Li WZ, Li HD, Li YH
2214 - 2220	Crystallization of Pb(Zr,Ti)O-3 Films Prepared by Radio-Frequency Magnetron Sputtering with a Stoichiometric Oxide Target Basit NA, Kim HK
2221 - 2227	Influence of Angular-Distribution on the Deposition Rate of Species Sputtered from a Multicomponent Target in Different Configurations - Applications to Mixed-Valence Copper Oxides Lecoeur P, Mercey B, Murray H
2228 - 2232	Creation of Extreme High-Vacuum with a Turbomolecular Pumping System - A Baking Approach Cho BL, Lee ST, Chung SM
2233 - 2240	Unstable Arc Operation and Cathode Spot Motion in a Magnetically Filtered Vacuum-Arc Deposition System Zhitomirsky VN, Boxman RL, Goldsmith S
2241 - 2254	Model of an 80 K Liner Vacuum-System for the 4.2 K Cold Bore of the Superconducting Super Collider 20 TeV Proton Collider Turner WC
2255 - 2260	Spherical-Aberration Correction of Electrostatic Lenses Using Spherical Meshes Kato M, Sekine T
2261 - 2265	Spectroscopic Studies of a Solenoid Filtered Vacuum-Arc Wang ZH, Mckenzie DR, Martin PJ, Netterfield RP
2266 - 2270	Instability of the Spatial Electron Current Distribution in Hot Cathode Ionization Gauges as a Source of Sensitivity Changes Jousten K, Rohl P
2271 - 2274	The Dependence of the Characteristics of a Rotating-Disk Vacuum Gauge on Disk Sizes and Rotor Speed Chew AD, Chambers A, Pert GJ, Troup AP
2275 - 2277	Hydrogen in Thin-Films of Cuins2 Solar-Cell Material Dzionk C, Hessler S, Lewerenz HJ, Mahnke HE, Metzner H, Steiger J
2278 - 2280	Photoelectron-Spectroscopy of Shallow Core Levels Using He II(40.8 eV) Excitation Comedi D, Zanatta AR, Alvarez F, Chambouleyron I
2281 - 2284	Removing Sulfur from Gold Using Ultraviolet Ozone Cleaning Worley CG, Linton RW
2285 - 2287	Quantitative Spectral Measurement of Air Leaks into Plasma Reactors Barna GG