Journal of Vacuum Science & Technology A

Journal of Vacuum Science & Technology A, Vol.22, No.4 Entire volume, number list

ISSN: 0734-2101 (Print)

In this Issue (146 articles)

1087 - 1092	Deposition of preferred-orientation ZnO films on the ceramic substrates and its application for surface acoustic wave filters Chu SY, Chen TY, Water W
1093 - 1100	Reactive etching of platinum-manganese using a pulse-timo-modulated chlorine plasma and a H-2 plasma post-etch corrosion treatment Kumagai S, Shiraiwa T, Samukawa S
1101 - 1104	Interfacial reaction effect on the ohmic properties of a Pt/Pd/Au contact on p-type GaN Kim HK, Adesida I, Seong TY
1105 - 1109	Growth of diamond film on single crystal lithium niobate for surface acoustic wave devices Jagannadham K, Lance MJ, Watkins TR
1110 - 1114	Anisotropic infrared optical properties of GaN and sapphire Yu G, Rowell NL, Lockwood DJ
1115 - 1119	Study of the optical properties of SiOxNy thin films by effective medium theories Tan X, Wojcik J, Mascher P
1120 - 1123	Pretreatment technique forsurface improvement of Ru films in Ru-metalorganic chemical vapor deposition Han H, Kim JJ, Yoon DY
1124 - 1128	Plasma-assisted growth of bilayer silicon-containing coatings for hardness and corrosion resistance Xiao ZG, Mantei TD
1129 - 1133	Interfacial analysis using time-of-flight medium energy backscattering Geil RD, Rogers BR, Song Z, Weller RA
1134 - 1138	Thickness uniformity of large-area double-sided thin films simultaneously deposited with biaxial substrate rotation Tao BW, Deng XW, Zhang Y, Li YR
1139 - 1145	Effect of low substrate, deposition temperature on the optical and electrical properties of Al2O3 doped ZnO films fabricated by ion beam sputter deposition Seong JW, Kim KH, Beag YW, Koh SK, Yoon KH
1146 - 1151	Properties of high-k/ultrahigh purity silicon nitride stacks Shi X, Shriver M, Zhang Z, Higman T, Campbell SA
1152 - 1157	Spectroscopic-ellipsometry characterization of the interface layer of PbZr0.40Ti0.60O3/LaNiO3/Pt multilayer thin films Hu ZG, Huang ZM, Wu YN, Wang GS, Meng XJ, Shi FW, Chu JH
1158 - 1165	Amorphous fluorocarbon polymer (a-C : F) films obtained by plasma enhanced chemical vapor deposition from perfluoro-octane (C8F18) vapor. II. Dielectric and insulating properties Biloiu C, Biloiu IA, Sakai Y, Sugawara H, Ohta A
1166 - 1168	Etching yield Of SiO2 irradiated by F+, CFx+ (x=1,2,3) ion with energies from 250 to 2000 eV Karahashi K, Yanai K, Ishikawa K, Tsuboi H, Kurihara K, Nakamura M
1169 - 1174	Theoretical study on deposition temperature during arc ion plating Huang MD, Lee YP, Dong C, Wen LS
1175 - 1181	Atomic layer deposition of hafnium oxide and hafnium silicate thin films using liquid precursors and ozone Senzaki Y, Park S, Chatham H, Bartholomew L, Nieveen W
1182 - 1187	Characteristics of rapid-thermal-annealed LiCoO2 cathode film for an all-solid-state thin film microbattery Kim HK, Yoon YS
1188 - 1190	Epitaxial Si/Si(001) thin films obtained by solid phase crystallization Kim HJ, Jeon SH, Jeon TY, Noh DY
1191 - 1194	Electrical characterization of B-10 doped diamond irradiated with low thermal neutron fluence Reed ML, Reed MJ, Jagannadham K, Verghese K, Bedair SM, El-Masry N, Butler JE
1195 - 1199	Internal structure of TiAlN/VN coating deposited on sharp edges by ion-assisted physical vapor deposition Macak EB, Rodenburg JM
1200 - 1207	Microstructure of plasma-deposited SiO2/TiO2 optical films Larouche S, Szymanowski H, Klemberg-Sapieha JE, Martinu L, Gujrathi SC
1208 - 1217	Microstructure and mechanical properties of Ir-Ta coatings on nickel-base single-crystal superalloy TMS-75 Kuppusami P, Murakami H, Ohmura T
1218 - 1222	Experiments and theoretical explanation of droplet elimination phenomenon in pulsed-bias arc deposition Lin GQ, Zhao YH, Guo HM, Wang DZ, Dong C, Huang RF, Wen LS
1223 - 1228	Incorporation of fluorine in hydrogenated silicon carbide films deposited by pulsed glow discharge Jacobsohn LG, Afanasyev-Charkin IV, Cooke DW, Schulze RK, Averitt RD, Nastasi M
1229 - 1234	Stoichiometry dependence of hardness, elastic properties, and oxidation resistance in TiN/SiNx nanocomposites deposited by a hybrid process Haug FJ, Schwaller P, Wloka J, Patscheider J, Karimi A, Tobler M
1235 - 1241	Effects of oxygen contents on the electrical and optical properties of indium molybdenum oxide films fabricated by high density plasma-evaporation Sun SY, Huang JL, Lii DF
1242 - 1259	Integrated feature scale modeling of plasma processing of porous and solids SiO2. I. Fluorocarbon etching Sankaran A, Kushner MJ
1260 - 1274	Integrated feature scale modeling of plasma processing of porous and solid SiO2. II. Residual fluorocarbon polymer stripping and barrier layer deposition Sankaran A, Kushner MJ
1275 - 1284	Room temperature synthesis of porous SiO2 thin films by plasma enhanced chemical vapor deposition Barranco A, Cotrino J, Yubero F, Espinos JP, Gonzalez-Elipe AR
1285 - 1289	Atomic layer deposition of hafnium silicate films using hafnium tetrachloride and tetra-n-butyl orthosilicate Kim WK, Rhee SW, Lee NI, Lee JH, Kang HK
1290 - 1292	Growth condition dependence of structure and surface morphology of GaN films on (III)GaAs substrates prepared by reactive sputtering Guo QX, Lu WJ, Zhang D, Tanaka T, Nishio M, Ogawa H
1295 - 1295	An international journal devoted vaccum, surfaces, and films - Preface Lucovsky G
1297 - 1300	Improved adhesion of amorphous carbon thin films on glass by plasma treatment Takeda S, Suzuki S
1301 - 1308	Spectroscopic characterization of high k dielectrics: Applications to interface electronic structure and stability against chemical phase separation Krug C, Lucovsky G
1309 - 1314	Wettability control of a polymer surface through 126 nm vacuum ultraviolet light irradiation Hozumi A, Shirahata N, Nakanishi Y, Asakura S, Fuwa A
1315 - 1318	Effect of thickness on ferroelectric properties of Bi3.25La0.75Ti3O12 thin films on Pt/Ti/SiO2/Si substrates Kim KT, Song SH, Kim CI
1319 - 1325	Optical, structural, and electrical characteristics of high dielectric constant zirconium oxide thin films deposited by spray pyrolysis Aguilar-Frutis M, Reyna-Garcia G, Garcia-Hipolito M, Guzman-Mendoza J, Falcony C
1326 - 1330	Surface analysis of oxygen free electrolytic-copper X-band accelerating structures and possible correlation to radio frequency breakdown events Harvey SE, Le Pimpec F, Kirby RE, Marcelja F, Adamson K, Garwin EL
1331 - 1336	Valence band x-ray photoelectron spectroscopic studies of phosphorus oxides and phosphates Gaskell KJ, Smith MM, Sherwood PMA
1337 - 1341	Observation of bulk HfO2 defects by spectroscopic ellipsometry Takeuchi H, Ha D, King TJ
1342 - 1346	Characteristics of high-k gate dielectric formed by the oxidation of sputtered Hf/Zr/Hf thin films on the Si substrate Kim HD, Roh Y, Lee JE, Kang HB, Yang CW, Lee NE
1347 - 1350	Effects of annealing of HfSixOy/HfO2 high-k gate oxides temperature on the characteristics Kim HD, Roh Y, Lee Y, Lee JE, Jung D, Lee NE
1351 - 1355	Cubic inclusions in 4H-SIC studied with ballistic electron-emission microscopy Ding Y, Park KB, Pelz JP, Palle KC, Mikhov MK, Skromme BJ
1356 - 1360	Displacive phase transition in SrTiO3 thin films grown on Si(001) Aguirre-Tostado FS, Herrera-Gomez A, Woicik JC, Droopad R, Yu Z, Schlom DG, Karapetrova J, Zschack P, Pianetta P
1361 - 1370	Self-aligned silicides for ohmic contacts in complementary metal-oxide-semiconductor technology: TiSi2, CoSi2 and NiSi Zhang SL, Smith U
1371 - 1374	Magnetization dynamics and magnetotransport in epitaxial nanostructures Lukaszew RA, Pearson D, Zhang Z, Zambano A
1375 - 1378	Arrays of magnetoresistive sensors for nondestructive testing Nazarov AV, da Silva FCS, Pappas DP
1379 - 1382	Texture orientation of glancing angle deposited copper nanowire arrays Alouach H, Mankey GJ
1383 - 1387	Fabrication and characterization of a capacitive micromachined shunt switch Firebaugh SL, Charles HK, Edwards RL, Keeney AC, Wilderson SF
1388 - 1396	Investigation of nanotribological and nanomechanical properties of the digital micromirror device by atomic force microscopy Liu HW, Bhushan B
1397 - 1405	Nanoscale fatigue and fracture toughness measurements of multilayered thin film structures for digital micromirror devices Wei GH, Bhushan B, Jacobs SJ
1406 - 1409	Hydrogen pressure dependence of trench corner rounding during hydrogen annealing Kuribayashi H, Shimizu R, Sodoh K, Iwasaki H
1410 - 1414	Development of a continuous generation/supply system of highly concentrated ozone gas for low-temperature oxidation process Ichimura S, Nonaka H, Morikawa Y, Noyori T, Nishiguchi T, Kekura M
1415 - 1419	Power supply with arc handling for high peak power magnetron sputtering Christie DJ, Tomasel F, Sproul WD, Carter DC
1420 - 1424	Measurement of energy flux at the substrate in a magnetron sputter system using an integrated sensor Ekpe SD, Dew SK
1425 - 1427	Exploration of the chemical bonding forms of alkoxy-type organic monolayers directly attached to silicon Saito N, Lee SH, Maeda N, Ohta R, Sugimura H, Takai O
1428 - 1432	Photochemical reaction of organosilane self-assembled monolayer as studied by scanning probe microscopy Sugimura H, Saito N, Ishida Y, Ikeda I, Hayashi K, Takai O
1433 - 1438	Self-organizing processes in connection with metastable nanocluster states Rieth M, Schommers W
1439 - 1443	Simultaneous dynamic stiffness and extension profiles of single titin molecules: Nanomechanical evidence for unfolding intermediates Forbes JG, Wang K
1444 - 1449	Microelectromechanical system device for calibration of atomic force microscope cantilever spring constants, between 0.01 and 4 N/m Cumpson PJ, Hedley J, Clifford CA, Chen XY, Allen S
1450 - 1454	Adsorption of oxidizing gases on multiwalled carbon nanotubes Valentini L, Lozzi L, Picozzi S, Cantalini C, Santucci S, Kenny JM
1455 - 1460	Field emission device with back gated structure Mammana VP, Jaeger D, Shenderova O, McGuire GE
1461 - 1465	Growth behavior and interfacial reaction between carbon nanotubes and Si substrate Hsu CM, Lai HJ, Kuo CT
1466 - 1470	Ozone adsorption on carbon nanotubes: Ab initio calculations and experiments Picozzi S, Santucci S, Lozzi L, Cantalini C, Baratto C, Sberveglieri G, Armentano I, Kenny JM, Valentini L, Delley B
1471 - 1476	Iron-carbide cluster thermal dynamics for catalyzed carbon nanotube growth Ding F, Bolton K, Rosen A
1477 - 1481	Au/CuPc interface: Photoemission investigation Lozzi L, Santucci S, La Rosa S
1482 - 1487	Interaction between metals and organic semiconductors studied by Raman spectroscopy Zahn DRT, Salvan G, Paez BA, Scholz R
1488 - 1492	Contact potential difference measurements of doped organic molecular thin films Chan C, Gao WY, Kahn A
1493 - 1499	Use of reactive gases with broad-beam radio frequency ion sources for industrial applications Schneider S, Jolly TW, Kohlstedt H, Waser R
1500 - 1505	Direct trim etching process of Si/SiO2 gate stacks using 193 nm ArF patterns Tan KM, Yoo WJ, Ma HHH, Li F, Chan L
1506 - 1512	50 nm gate electrode patterning using a neutral-beam etching system Noda S, Nishimori H, Ida T, Arikado T, Ichiki K, Ozaki T, Samukawa S
1513 - 1518	Mechanisms of silicon nitride etching by electron cyclotron resonance plasmas using SF6- and NF3-based gas mixtures Reyes-Betanzo C, Moshkalyov SA, Ramos ACS, Swart JW
1519 - 1523	Etching properties of lead-zirconate-titanate thin films in Cl-2/Ar and BCl3/Ar gas chemistries Koo SM, Kim DP, Kim KT, Song SH, Kim C
1524 - 1529	Modeling of the target surface modification by reactive ion implantation during magnetron sputtering Depla D, Chen ZY, Bogaerts A, Ignatova V, De Gryse R, Gijbels R
1530 - 1535	Effect of plasma flux, composition on the nitriding rate of stainless steel Muratore C, Walton SG, Leonhardt D, Fernsler RF, Blackwell DD, Meger RA
1536 - 1539	Correlation between volume fraction of clusters incorporated into a-Si : H films and hydrogen content associated with Si-H-2 bonds in the films Koga K, Kaguchi N, Shiratani M, Watanabe Y
1540 - 1545	Metallic tin reactive sputtering in a mixture Ar-O-2: Comparison between an amplified and a classical magnetron discharge Snyders R, Gouttebaron R, Dauchot JP, Hecq M
1546 - 1551	Selective plasma-induced deposition of fluorocarbon films on metal surfaces for actuation in microfluidics Bayiati P, Tserepi A, Gogolides E, Misiakos K
1552 - 1558	Investigation of etching properties of HfO based high-K dielectrics using inductively coupled plasma Chen JH, Yoo WJ, Tan ZYL, Wang YQ, Chan DSH
1559 - 1563	Selective etching process of SrBi2Ta2O9 and CeO2 for self-aligned ferroelectric gate structure Shim SII, Kwon YS, Kim SII, Kim YT
1564 - 1571	Intercomparison of silicon dioxide thickness measurements made by multiple techniques: The route to accuracy Seah MP
1572 - 1578	Thickness and composition of ultrathin SiO2 layers on Si van der Marel C, Verheijen MA, Tamminga Y, Pijnenburg RHW, Tombros N, Cubaynes F
1579 - 1586	Multivariate statistical analysis for x-ray photoelectron spectroscopy spectral imaging: Effect of image acquisition time Peebles DE, Ohlhausen JA, Kotula PG, Hutton S, Blomfield C
1587 - 1590	Effect of substrate temperature on crystal orientation and residual stress in radio frequency sputtered gallium-nitride films Kusaka K, Hanabusa T, Tominaga K, Yamauchi N
1591 - 1595	Textured growth of cubic gallium nitride thin films on Si(100) substrates by sputter deposition Kim JH, Holloway PH
1596 - 1599	Real time optical characterization of gas flow dynamics in high-pressure chemical vapor deposition Woods V, Born H, Strassburg M, Dietz N
1600 - 1605	Morphological evolution of III-V semiconductors and SiO2 during low energy electron enhanced dry etching Lee SH, Ho RM, Goorsky MS, Gillis HP, Margolese DI, Demine MA, Anz SJ
1606 - 1609	Electronic and optical properties of GaAsN/GaAs quantum wells: A tight-binding study Shtinkov N, Turcotte S, Beaudry JN, Desjardins P, Masut RA
1610 - 1614	Functional profile coatings and film stress Liu C, Conley R, Macrander AT
1615 - 1619	Photoinduced decomposition of alkyl monolayers using 172 nm vacuum ultraviolet light Shirahata N, Oda K, Asakura S, Fuwa A, Yokogawa Y, Kameyama T, Hozumi A
1620 - 1624	Reaction intermediates in high temperature catalytic water formation studied with cavity ringdown spectroscopy Hemdal S, Johansson A, Forsth M, Andersson M, Rosen A
1625 - 1630	Photoemission study of the translational energy induced oxidation processes on Cu(111) Moritani K, Okada M, Sato S, Goto S, Kasai T, Yoshigoe A, Teraoka Y
1631 - 1635	Organic molecules on zirconium surfaces Stojilovic N, Ramsier RD
1636 - 1639	Preparation and characterization of magnetron sputtered, ultra-thin Cr0.63Mo0.37 films on MgO Meyvantsson I, Olafsson S, Johnsen K, Gudmundsson JT
1640 - 1646	Fourier transform infrared study of methanol, water, and acetic acid on MgO(100) Foster M, Passno D, Rudberg J
1647 - 1651	Laser-etched silicon pillars and their porosification Mills D, Kolasinski KW
1652 - 1658	Ethanol reactions over Au-Rh/CeO2 catalysts. Total decomposition and H-2 formation Sheng PY, Idriss H
1659 - 1666	Coupling reactions of trifluoroethyl iodide on GaAs(100) Singh NK, Kemp NT, Paris N, Balan V
1667 - 1670	Scanning tunneling microscopy studies of oxide growth and etching on Si(5512) Skrobiszewski JL, Moore JC, Dickinson JW, Baski AA
1671 - 1674	Buckling of Si and Ge(111)2x1 surfaces Nie S, Feenstra RM, Lee JY, Kang MH
1675 - 1681	Studies of the electronic structure at the Fe3O4-NiO interface Wang HQ, Gao WW, Altman EI, Henrich VE
1682 - 1689	Surface phase transitions and related surface defect structures upon reduction of epitaxial WO3(100) thin films: A scanning tunneling microscopy study Li M, Altman EI, Posadas A, Ahn CH
1690 - 1696	Surface composition and structure of Co3O4(110) and the effect of impurity segregation Petitto SC, Langell MA
1697 - 1704	Reactive-environment, hollow cathode sputtering: Basic characteristics and application to Al2O3, doped ZnO, and In2O3 : MO Delahoy AE, Guo SY, Paduraru C, Belkind A
1705 - 1710	Transparent conducting amorphous Zn-Sn-O films deposited by simultaneous dc sputtering Moriga T, Hayashi Y, Kondo K, Nishimura Y, Murai K, Nakabayashi I, Fukumoto H, Tominaga K
1711 - 1715	Highly transparent and conductive ZnO : Al thin films prepared by vacuum arc plasma evaporation Miyata T, Minamino Y, Ida S, Minami T
1716 - 1722	Ultrahigh barrier coating deposition on polycarbonate substrates Schaepkens M, Kim TW, Erlat AG, Yan M, Flanagan KW, Heller CM, McConnelee PA
1723 - 1725	Stretchable wavy metal interconnects Jones J, Lacour SP, Wagner S, Suo ZG
1726 - 1729	Properties of indium zinc oxide thin films on heat withstanding plastic substrate Hara H, Hanada T, Shiro T, Yatabe T
1730 - 1733	Anneal behavior of reactively sputtered HfN films Lannon J, Pace C, Goodwin S, Solomon S, Bryant P
1734 - 1738	Spatially regulated growth of metal oxide thin film onto alkyl monolayer template from aqueous solution containing metal fluoride Shirahata N, Yokogawa Y, Kameyama T, Hozumi A
1739 - 1742	Characteristics of Pt/Bi3.25La0.75Ti3O12/ZrO2/Si structures using ZrO2 as buffer layers for ferroelectric-gate field-effect transistors Lee JM, Kim KT, Kim CI
1743 - 1745	Ferroelectric properties of lanthanide-doped Pb(Zr-0.6,Ti-0.4)O-3 thin films prepared by using a sol-gel method Son YH, Kim KT, Kim CI
1746 - 1750	Luminescence behavior of Li-doped Gd2O3 : Eu3+ thin film phosphors grown by pulsed laser ablation Yi SS, Bae JS, Seo HJ, Jeong JH, Holloway PH
1751 - 1756	Luminescent characteristics of Se-doped ZnGa2O4 : Mn thin film phosphors grown by pulsed laser ablation Jeong JH, Bae JS, Choi BC, Yi SS, Holloway PH
1757 - 1762	Low resistivity polycrystalline ZnO : Al thin films prepared by pulsed laser deposition Tanaka H, Ihara K, Miyata T, Sato H, Minami T
1763 - 1766	Analysis and modeling of low pressure chemical vapor deposition of phosphorus-doped polysilicon in commercial scale reactor Shimizu R, Ogino M, Sugiyama M, Shimogaki Y
1767 - 1772	Study of rough growth fronts of evaporated polycrystalline gold films Munuera C, Aznarez JA, Rodriguez-Canas E, Oliva AI, Aguilar M, Sacedon JL
1773 - 1777	Anisotropic growth of chromium films during sputter deposition on substrates in planetary motion Janssen GCAM, Alkemade PFA, Sivel VGM, Grachev SY, Kamminga JD
1778 - 1784	Physical self-assembly and the nucleation of three-dimensional nanostructures by oblique angle deposition Karabacak T, Wang GC, Lu TM
1785 - 1787	X-ray elastic constants of chromium nitride films deposited by arc-ion plating Hanabusa T, Miyagi K, Kusaka K
1788 - 1792	Preparation of ternary alloy libraries for high-throughput screening of material properties by means of thick film deposition and interdiffusion: Benefits and limitations Rar A, Specht ED, George EP, Santella ML, Pharr GM
1793 - 1798	Electron cyclotron resonance plasma sputtering growth of textured films of c-axis-oriented LiNbO3 on Si(100) and Si(111) surfaces Akazawa H, Shimada M
1799 - 1803	Effect of purge pressure on desorbing water removal rate Hinkle LD
1804 - 1809	Analysis of closed loop control and sensor for a reactive sputtering drum coater George MA, Craves EA, Shehab R, Knox K
1810 - 1815	Theoretical and experimental evaluation of the windowless interface for the TRASCO-ADS project Michelato P, Bari E, Monaco L, Sertore D, Bonucci A, Giannantonio R, Urbano M, Viale L, Turroni P, Cinotti L
1816 - 1819	Calibration apparatus for precise barometers and vacuum gauges Woo SY, Choi IM, Lee YJ, Hong SS, Chung KH
1820 - 1827	Pumping characteristics of metal films in a vacuum glass vessel: Experimental and theoretical issues Bonucci A, Giannantonio R, Carretti C, Longoni G, Caterino AL, Urbano M
1828 - 1835	Multidimensional flow modeling of the compression test of a Gaede pump stage in the viscous regime Giors S, Subba F
1836 - 1841	Spatially defined immobilization of biomolecules on microstructured polymer substrate Hozumi A, Saito T, Shirahata N, Yokogawa Y, Kameyama T
1842 - 1846	Photoexcited electrodeposition of Cu structures on p-Si(001) Scheck C, Liu YK, Evans P, Schad R, Bowers A, Zangari G, Williams JR, Issacs-Smith TF
1847 - 1851	Sub-100 nm radius of curvature wide-band gap III-nitride vacuum microelectronic field emitter structures created by inductively coupled plasma etching Shah PB, Nichols BM, Derenge MD, Jones KA
1852 - 1856	Electroless copper deposition as a seed layer on TiSiN barrier Ee YC, Chen Z, Xu S, Chan L, See KH, Law SB
1857 - 1861	Deposition and field-emission characterization of electrically conductive nitrogen-doped diamond-like amorphous carbon films Kinoshita H, Ikuta R, Murakami S
1862 - 1867	Efficient electrical spin injection in GaAs: A comparison between AlOx and Schottky injectors Van Dorpe P, Van Roy W, Motsny VF, Borghs G, De Boeck J
1868 - 1872	Correlated structural and magnetization reversal studies on epitaxial Ni films grown with molecular beam epitaxy and with sputtering Zhang ZD, Lukaszew RA, Cionca C, Pan X, Clarke R, Yeadon M, Zambano A, Walko D, Dufresne E, te Velthius S
1873 - 1878	Stacked polymer patterns imprinted using a soft inkpad Kong YP, Tan L, Pang SW, Yee AF
1879 - 1884	Local oxidation of metal and metal nitride films Farkas N, Tokash JC, Zhang G, Evans EA, Ramsier RD, Dagata JA
1885 - 1891	Large magnetic field effects in organic light emitting diodes based on tris(8-hydroxyquinoline aluminum) (Alq(3))/IN,N'-Di(naphthalen-1-yl)-N,N' diphenyl-benzidine (NPB) bilayers Davis AH, Bussmann K
1892 - 1895	Polymeric aperture masks for high performance organic integrated circuits Muyres DV, Baude PF, Theiss S, Haase M, Kelley TW, Fleming P
1896 - 1902	Simulation of SiO2 and Si feature etching for microelectronics and microelectromechanical systems fabrication: A combined simulator coupling modules of surface etching, local flux calculation, and profile evolution Kokkoris G, Tserepi A, Boudouvis AG, Gogolides E
1903 - 1907	Anisotropic deposition of Cu in trenches by H-assisted plasma chemical vapor deposition Takenaka K, Kita M, Kinoshita T, Koga K, Shiratani M, Watanabe Y
1908 - 1911	Effect of Mn composition on characterization of Zn1-xMnxSe epilayers Yu YM, Kim DJ, Lee KJ, Choi YD, Byungsung O, Lee KS
1912 - 1916	Self-organized template formation for quantum dot ordering Notzel R, Mano T, Wolter JH
1917 - 1925	Self-assembled organic thin films on electroplated copper for prevention of corrosion Tan YS, Srinivasan MP, Pehkonen SO, Chooi SYM