Journal of Vacuum Science & Technology A

Journal of Vacuum Science & Technology A, Vol.23, No.4 Entire volume, number list

ISSN: 0734-2101 (Print)

In this Issue (128 articles)

L5 - L8	Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry Heil SBS, Langereis E, Kemmeren A, Roozeboom F, de Sanden MCMV, Kessels WMM
581 - 588	In situ examination of tin oxide atomic layer deposition using quartz crystal microbalance and Fourier transform infrared techniques Du X, Du Y, George SM
589 - 592	Characterization of nitrogen distribution in HfO2 with low energy secondary ion mass spectrometry Jiang ZX, Kim K, Lerma J, Sieloff D, Luo TY, Yang JY, Triyoso D, Tseng H, Tobin P, Ramani N
593 - 598	Microstructure and nanohardness properties of Zr-Al-N and Zr-Cr-N thin films Lamni R, Sanjines R, Parlinska-Wojtan M, Karimi A, Levy F
599 - 604	Inhibition of excess interface Si atom generation in 700 degrees C-grown pyrolytic-gas passivated ultrathin silicon oxide films Yamada H
605 - 608	Enlargement of grain in poly-Si by adding Au in Ni-mediated crystallization of amorphous Si using a SiNx cap layer Kim KH, Oh JH, Kim EH, Jang J, Kang JY, Oh KH
609 - 612	Sb-induced reconstruction of the Si(112) surface Cho ES, Kim MK, Hur H, Park JW, Baik JY, Kim NH, Park CY, An KS
613 - 616	Adsorption and reactions of tetrabutoxysilane (TBOS) on Si(100) Lee NY, Yong KJ, Jeong HS, Kim CM
617 - 620	Clean wurtzite InN surfaces prepared with atomic hydrogen Piper LFJ, Veal TD, Walker M, Mahboob I, McConville CF, Lu H, Schaff WJ
621 - 627	Microstructural evolution of AIN coatings synthesized by unbalanced magnetron sputtering Wang CC, Lu CJ, Shiao MH, Shieu FS
628 - 630	Study on strain and piezoelectric polarization of AlN thin films grown on Si Deng YZ, Kong YC, Zheng YD, Zhou CH, Xi DJ, Chen P, Gu SL, Shen B, Zhang R, Han P, Jiang R, Shi Y
631 - 633	Chromium diboride thin films by low temperature chemical vapor deposition Jayaraman S, Klein EJ, Yang Y, Kim DY, Girolami GS, Abelson JR
634 - 642	Studies of film deposition in fluorocarbon plasmas employing a small gap structure Zheng L, Ling L, Hua XF, Oehrlein GS, Hudson EA
643 - 650	Control of dissociation by varying oxygen pressure in noble gas admixtures for plasma processing Taylor KJ, Tynan GR
651 - 657	Dual radio-frequency discharges: Effective frequency concept and effective frequency transition Kim HC, Lee JK
658 - 662	Effect of plating current density and annealing on impurities in electroplated Cu film Liu CW, Wang YL, Tsai MS, Feng HP, Chang SC, Hwang GJ
663 - 665	Study of optical recording bits by scanning surface potential microscopy Chen SH, Lin CW, Lin WC, Tsai DP
666 - 670	Surface modification of silicon-containing fluorocarbon films prepared by plasma-enhanced chemical vapor deposition Jin YY, Desta Y, Goettert J, Lee GS, Ajmera PK
671 - 675	High-energy ions and atoms sputtered and reflected from a magnetron source for deposition of magnetic thin films Matsui H, Toyoda H, Sugai H
676 - 680	Apparatus for laminar-turbulent transition in gases Hinkle LD, Muriel A
681 - 686	Mechanical behavior and oxidation resistance of Cr(Al)N coatings Sanchez-Lopez JC, Martinez-Martinez D, Lopez-Cartes C, Fernandez A, Brizuela M, Garcia-Luis A, Onate JI
687 - 692	ICP etching of III-nitride based laser structure with Cl-2-Ar plasma assisted by Si coverplate material Zhirnov E, Stepanov S, Gott A, Wang WN, Shreter YG, Tarkhin DV, Bochkareva NI
693 - 698	Structural modifications and corrosion behavior of martensitic stainless steel nitrided by plasma immersion ion implantation Figueroa CA, Alvarez F, Zhang Z, Collins GA, Short KT
699 - 704	Oxygen ion energy distribution: Role of ionization, resonant, and nonresonant charge-exchange collisions Babaeva NY, Lee JK, Shon JW, Hudson EA
705 - 712	Electronic and optical properties of Ta1-xZrxN films: Experimental and ab initio studies Aouadi SM, Bohnhoff A, Amriou T, Haasch RT, Williams M, Hilfiker JN
713 - 719	Contribution of bottom-emitted radicals to the deposition of a film on the SiO2 sidewall during CHF3 plasma etching Lee GR, Min JH, Lee JK, Kang SK, Moon SH
720 - 721	Comment on "Plasma etching of high dielectric constant materials on silicon in halogen plasma chemistries" by L. Sha and J.P. Chang [J. Vac. Sci. Technol. A 22, 88 (2004)] Stafford L, Margot J
722 - 724	Design for a kinematic, variable flux microcapillary array molecular beam doser Fisher GL, Meserole CA
725 - 726	Pressure compensation for a radiation-induced current caused in a vacuum gauge cable in the SPring-8 storage ring Magome T, Saeki H
729 - 729	Papers from the 51st International Symposium of AVS - Preface Lucovsky G
731 - 736	Assembly of hydrothermally synthesized tin oxide nanocrystals Shirahata N, Hozumi A, Asakura S, Fuwa A, Sakka Y
737 - 740	Chemical mechanical planarization characteristics of WO3 thin film for gas sensing Seo YJ, Kim NH, Chang EG, Park J, Ko PJ, Lee WS
741 - 745	Algorithm for automatic x-ray photoelectron spectroscopy data processing and x-ray photoelectron spectroscopy imaging Tougaard S
746 - 750	Maximum likelihood principal component analysis of time-of-flight secondary ion mass spectrometry spectral images Keenan MR
751 - 754	Deposition of lipid bilayers on OH-density-controlled silicon dioxide surfaces Tero R, Urisu T, Okawara H, Nagayama K
755 - 760	In situ formation of bioactive titanium coating using reactive plasma spraying Inagaki M, Yokogawa Y, Kameyama T
761 - 763	Photoacoustic analysis of bone osteogenesis to different doses of laser irradiation Mejia PAL, Perez JLJ, Orea AC, Castrejon HV, Butron HL, Lira MM
764 - 767	TiN/Ta2O5/PE-SiN/TiN metal-insulator-metal capacitor for radio frequency and mixed signal integrated circuit applications Chung YS, Kim KS, Ryu YS, Lee D, Hwang SB, Shin CS, Park SK, Lee JG
768 - 772	Structural and optical properties of erbium-doped Ba0.7Sr0.3TiO3 thin films Kuo SY, Hsieh WF
773 - 776	Comparison of forming gas effects on the ferroelectric properties between more-oriented and less-oriented Pb(Zr0.52Ti0.48)O-3 thin films Lee ES, Chung HW, Lim SH, Lee SY
777 - 780	Effect of Mn composition of characterization of Zn1-xMnxS epilayers Yu YM, Kim DJ, Eom SH, Choi YD, Kim TH, O B
781 - 784	Low-temperature studies of magnetic phases of the interfacial layers for Co/Ge(100) and Co/Ge(111) films Tsay JS, Su CW, Hwang CH, Yao YD
785 - 789	Growth and characterization of epitaxial FexPt100-x films on MgO(111) Mani P, Krishnamurthy VV, Maat S, Kellock AJ, Robertson JL, Mankey GJ
790 - 795	Structure and magnetism of ultrathin Co film grown on Pt(100) Pan MH, He K, Zhang LJ, Jia JF, Xue QK, Kim W, Qiu ZQ
796 - 803	Magnetic response of nanostructured systems: A ferromagnetic resonance investigation Lindner J, Wiedwald U, Baberschke K, Farle M
804 - 810	Nanotribological characterization of fluoropolymer thin films for biomedical micro/nanoelectromechanical system applications Lee KK, Bhushan B, Hansford D
811 - 819	Microfabrication and nanomechanical characterization of polymer microelectromechanical system for biological applications Wei GH, Bhushan B, Ferrell N, Hansford D
820 - 823	Piezoelectric and dielectric properties of Pb(Zr,Ti)O-3-Pb(Mn,W,Sb,Nb)O-3 with Ag2O addition Chung HW, Lim SH, Lee ES, Kim GH, Lee SY
824 - 829	Process integration for through-silicon vias Spiesshoefer S, Rahman Z, Vangara G, Polamreddy S, Burkett S, Schaper L
830 - 835	Durability studies of micro/nanoelectromechanical systems materials, coatings and lubricants at high sliding velocities (up to 10 mm/s) using a modified atomic force microscope Tambe NS, Bhushan B
836 - 840	Tribological and wear studies of coatings fabricated by atomic layer deposition and by successive ionic layer adsorption and reaction for microelectromechanical devices Nistorica C, Liu JF, Gory I, Skidmore GD, Mantiziba FM, Gnade BE, Kim J
841 - 845	Frequency-tuning for control of parametrically resonant mass sensors Zhang WH, Turner KL
846 - 850	SPM oxidation and parallel writing on zirconium nitride thin films Farkas N, Comer JR, Zhang G, Evans EA, Ramsier RD, Dagata JA
851 - 855	Fabrication of NiSi2 nanocrystals embedded in SiO2 with memory effect by oxidation of the amorphous Si/Ni/SiO2 structure Yeh PH, Wu HH, Yu CH, Chen LJ, Liu PT, Hsu CH, Chang TC
856 - 861	Optical properties of porous nanostructured Y2O3: Eu thin films Hrudey PCP, Taschuk M, Tsui YY, Fedosejevs R, Brett MJ
862 - 868	Investigation of the interfacial reaction between,metal and fluorine-contained polyimides Yang CY, Chen JS, Hsu SLC
869 - 874	X-ray photoemission spectroscopy and Fourier transform infrared studies of dye molecule doped conducting polymer films Kato H, Takemura S, Nishikawa O, Taniguchi M
875 - 879	Organic polymer thin films deposited on silicon and copper by plasma-enhanced chemical vapor deposition method and characterization of their electrochemical and optical properties Bae IS, Cho SH, Park ZT, Kim JG, Boo JH
880 - 885	Study of the room temperature molecular memory observed from a nanowell device Gergel N, Majumdar N, Keyvanfar K, Swami N, Harriott LR, Bean JC, Pattanaik G, Zangari G, Yao Y, Tour JM
886 - 889	Photoresist stripping after low-k dielectric layer patterning using axial magnetic field assisted reactive ion etching Song HY, Kim CW, Park SG, Yang JK, Lee CW
890 - 893	Dry etching of (Pb,Sr)TiO3 thin films using inductively coupled plasma Kim GH, Kim JS, Kim KT, Kim DP, Kim CI
894 - 897	Dry etching of (Ba,Sr)TiO3 thin films using an inductively coupled plasma Kim GH, Kim KT, Kim CI
898 - 904	Investigation of process window during dry etching of ZnO thin films by CH4-H-2-Ar inductively coupled plasma Na SW, Shin MH, Chung YM, Han JG, Lee NE
905 - 910	Characterization of a modified Bosch-type process for silicon mold fabrication Jo SB, Lee MW, Lee SG, Lee EH, Park SG, O BH
911 - 916	Evaluation of silicon oxide cleaning using F-2/Ar remote plasma processing Kang SC, Hwang JY, Lee NE, Joo KS, Bae GH
917 - 921	Electron heating in capacitively coupled discharges and reactive gases Franz G, Klick M
922 - 926	Measurements and consequences of nonuniform radio frequency plasma potential due to surface asymmetry in large area radio frequency capacitive reactors Sansonnens L, Strahm B, Derendinger L, Howling AA, Hollenstein C, Ellert C, Schmitt JPM
927 - 932	Uniformity study in large-area showerhead reactors Sobbia R, Sansonnens L, Bondkowski J
933 - 937	Characterization of the cold atmospheric plasma hybrid source Bardos L, Barankova H
938 - 946	Quantitative control of etching reactions on various SiOCH materials Tatsumi T, Urata K, Nagahata K, Saitoh T, Nogami Y, Shinohara K
947 - 952	Inductively coupled plasma etching of poly-SiC in SF6 chemistries Kuah SH, Wood PC
953 - 958	Study on self-aligned contact oxide etching using C5F8/O-2/Ar and C5F8/O-2/Ar/CH2F2 plasma Kim S, Choi D, Hong T, Park T, Kim D, Song Y, Kim C
959 - 963	Hot hollow cathode diffuse arc deposition of chromium nitride films Barankova H, Bardos L, Gustavsson LE
964 - 970	Investigation of etching properties of metal nitride/high-k gate stacks using inductively coupled plasma Hwang WS, Chen JH, Yoo WJ, Bliznetsov V
971 - 977	Transparent hybrid inorganic/organic barrier coatings for plastic organic light-emitting diode substrates Kim TW, Yan M, Erlat G, McConnelee PA, Pellow M, Deluca J, Feist TP, Duggal AR, Schaepkens M
978 - 981	Blue photoluminescence of Si nanocrystallites embedded in silicon oxide Kim GH, Kim JH, Jeon KA, Lee SY
982 - 985	Realization of Mg((x=0.15))Zn((1-x=0.85))O-based metal-semiconductor-metal UV detector on quartz and sapphire Hullavarad SS, Dhar S, Varughese B, Takeuchi I, Venkatesan T, Vispute RD
986 - 990	Stress reduction in sputter deposited films using nanostructured compliant layers by high working-gas pressures Karabacak T, Senkevich JJ, Wang GC, Lu TM
991 - 997	Electrochemical characterization of plasma polymer coatings in corrosion protection of aluminum alloys Chan YF, Yu QS
998 - 1005	Growth and characterization of nanocrystalline zirconium nitride-inconel structures Aouadi SM, Maeruf T, Sodergren M, Mihut DM, Rohde SL, Xu J, Mishra SR
1006 - 1009	Oxidation behavior of titanium nitride films Chen HY, Lu FH
1010 - 1012	Characterizations of the surfaces of shocked-Bi-Pb-Sr-Ca-Cu-O particles for a magnetic sensor Kezuka H, Yamagata K, Itoh M, Suzuki T, Kikuchi M, Atou T, Kawasaki M, Fukuoka K
1013 - 1017	Temperature programmed desorption study of C6H12/Zr(0001) Stojilovic N, Tokash JC, McGinnis SP, Ramsier RD
1018 - 1021	Plasma-based ion implantation sterilization technique and ion energy estimation Tanaka T, Watanabe S, Shibahara K, Yokoyama S, Takagi T
1022 - 1028	Selective detection of Cr(VI) using a microcantilever electrode coated with a self-assembled monolayer Tian F, Boiadjiev VI, Pinnaduwage LA, Brown GM, Thundat T
1029 - 1033	Site-selective electroless plating on amino-terminated diamond substrate patterned by 126 nm vacuum ultraviolet light lithography Hozumi A, Asakura S, Fuwa A, Shirahata N
1034 - 1045	Nanotribological effects of hair care products and environment on human hair using atomic force microscopy LaTorre C, Bhushan B
1046 - 1050	Magnetocrystalline anisotropy in glancing angle deposited Permalloy nanowire arrays Alouach H, Fujiwara H, Mankey GJ
1051 - 1054	Reactivity of NO over K-deposited Pd(111) and surface structure of the catalyst Nakamura I, Hamada H, Fujitani T
1055 - 1060	Epitaxial iron oxide growth on a stepped Pt(91111) surface Ketteler G, Ranke W
1061 - 1066	Deconvolution of the Co3O4(110) Fuchs-Kliewer phonon spectrum Marsh EM, Petitto SC, Harbison GS, Wulser KW, Langell MA
1067 - 1071	Spontaneous growth of Ag and Pb nanopucks on electronic patterns of 2D Pb quantum islands Chiu YP, Lin HY, Fu TY, Chang CS, Tsong TT
1072 - 1077	Origin of the interface dipole at interfaces between undoped organic semiconductors and metals Knupfer M, Paasch G
1078 - 1084	Carbon monoxide reaction with UO2(111) single crystal surfaces: A theoretical and experimental study Senanayake SD, Soon A, Kohlmeyer A, Sohnel T, Idriss H
1085 - 1089	Vibrationally promoted emission of electrons from low work function surfaces: Oxygen and Cs surface coverage dependence White JD, Chen J, Matsiev D, Auerbach DJ, Wodtke AM
1090 - 1099	Current research and development topics on gas cluster ion-beam processes Yamada I, Toyoda N
1100 - 1106	Chlorination of hydrogen-terminated silicon(111) surfaces Rivillon S, Chabal YJ, Webb LJ, Michalak DJ, Lewis NS, Halls MD, Raghavachari K
1107 - 1113	Effects of surface chemistry on ALD Ta3N5 barrier formation on low-k dielectrics Liu J, Bao J, Scharnberg M, Kim WC, Ho PS, Laxman R
1114 - 1119	Tailored stoichiometries of silicon carbonitride thin films prepared by combined radio frequency magnetron sputtering and ion beam synthesis Bruns M, Geckle U, Trouillet V, Rudolphi M, Baumann H
1120 - 1123	Photoluminescence behavior of Eu3+ activated Sr2SiO4 thin-film phosphors grown by pulsed-laser deposition Jeong JH, Moon BK, Bae JS, Yi SS, Kim JH, Park HL
1124 - 1127	Luminescence characteristics of Eu-doped GdVO4 thin films grown by pulsed-laser deposition Yi SS, Bae JS, Shim KS, Moon BK, Jeong JH, Chung ST, Kim JH
1128 - 1132	Preparation of transparent and conductive multicomponent Zn-In-Sn oxide thin films by vacuum arc plasma evaporation Minami T, Tsukada S, Minamino Y, Miyata T
1133 - 1136	Removal characteristics of hillock on SnO2 thin film by chemical mechanical polishing process Seo YJ, Kim NH, Chang EG, Park J, Choi GW, Lee WS
1137 - 1140	Fabrication of a Cu nanodot array based on electroless plating employing a diblock copolymer nanotemplate Asakura S, Hozumi A, Fuwa A
1141 - 1145	Growth of strained Si on high-quality relaxed Si1-xGex with an intermediate Si1-yCy layer Lee SW, Chueh YL, Chen LJ, Chou LJ, Chen PS, Lee MH, Tsai MJ, Liu CW
1146 - 1151	Area-selective assembly of high crystalline tin-doped-indium-oxide particles onto monolayer template Shirahata N, Sakka Y, Uchikoshi T, Hozumi A
1152 - 1161	Comparison of the agglomeration behavior of thin metallic films on SiO2 Gadkari PR, Warren AP, Todi RM, Petrova RV, Coffey KR
1162 - 1166	Relationship between the microstructure and the discharge characteristics of MgO protecting layer in alternating current plasma display panels Park SY, Lee MJ, Kim HJ, Moon SH, Kim SG, Kim JK
1167 - 1172	Structural, electrical, and optical properties of transparent conductive In2O3-SnO2 films Sato Y, Tokumaru R, Nishimura E, Song PK, Shigesato Y, Utsumi K, Iigusa H
1173 - 1179	Optimization of process parameters to achieve high quality as-deposited indium-tin oxide films for display applications Gupta S, Ada E
1180 - 1186	Analysis on thermal properties of tin doped indium oxide films by picosecond thermoreflectance measurement Yagi T, Tamano K, Sato Y, Taketoshi N, Baba T, Shigesato Y
1187 - 1191	Influence of sputtering parameter on the optical and electrical properties of zinc-doped indium oxide thin films Pan HC, Shiao MH, Su CY, Hsiao CN
1192 - 1196	Effect of stress and density on the electrical and physical properties of MgO protecting layer for alternating current-plasma display panels Lee MJ, Park SY, Kim SG, Kim HJ, Moon SH, Kim JK
1197 - 1201	Study of molybdenum back contact layer to achieve adherent and efficient CIGS2 absorber thin-film solar cells Kadam AA, Dhere NG, Holloway P, Law E
1202 - 1207	Formation of chalcogen containing plasmas and their use in the synthesis of photovoltaic absorbers Kosaraju S, Repins I, Wolden CA
1208 - 1214	Thin-film photovoltaics Dherea NG, Dhere RG
1215 - 1220	Transparent and semitransparent conducting film deposition by reactive-environment, hollow cathode sputtering Delahoy AE, Guo SY
1221 - 1227	Real-time optical monitoring of ammonia flow and decomposition kinetics under high-pressure chemical vapor deposition conditions Dietz N, Strassburg M, Woods V
1228 - 1233	Optimal control on composition and optical properties of silicon oxynitride thin films Samano EC, Camacho J, Machorro R
1234 - 1237	Structural and mechanical properties of dendrimer-mediated thin films Xu FTT, Thaler SM, Barnard JA
1238 - 1243	Atomic layer deposition of nickel oxide films using Ni(dmamp)(2) and water Yang TS, Cho WT, Kim M, An KS, Chung TM, Kim CG, Kim Y
1244 - 1251	John Ambrose Fleming and the beginning of electronics Dylla HF, Corneliussen ST
1252 - 1259	Vacuum and the electron tube industry Redhead PA
1260 - 1266	Vacuum microelectronic devices and vacuum requirements Tyler T, Shenderova OA, McGuire GE
1267 - 1269	Real time quantitative diagnostic technique for measuring chemical vapor deposition precursors Yun JY, Chung KH, Moon DK
1270 - 1275	Overview of the Spallation Neutron Source vacuum systems Ladd P, Crandall J, Hechler M, Henderson S, Kersevan R, Murdoch G, Tang J
1276 - 1283	Micro- and nanoscale thermal phenomena in thin-film magnetic recording heads Ju YS
1284 - 1289	Characterization of polycrystalline AIN films using variable-angle spectroscopic ellipsometry Wang LP, Shim DS, Ma O, Rao VR, Ginsburg E, Talalyevsky A