Journal of Vacuum Science & Technology A

Journal of Vacuum Science & Technology A, Vol.12, No.6 Entire volume, number list

ISSN: 0734-2101 (Print)

In this Issue (43 articles)

2995 - 2998	Unique Hydride Chemistry on Silicon-PH3 Interaction with Si(100)-(2X1) Colaianni ML, Chen PJ, Yates JT
2999 - 3011	Spontaneous Etching of Si(100) by Xef2 - Test-Case for a New Beam Surface Experiment Vugts MJ, Joosten GJ, Vanoosterum A, Senhorst HA, Beijerinck HC
3012 - 3017	In-Situ Observations of Ge(001) and Ge/Si(001) Using Low-Energy Ion-Scattering Taferner WT, Freundlich A, Bensaoula A, Ignatiev A, Waters K, Eiperssmith K, Guehenneuc M, Schultz JA
3018 - 3022	CrSi2/Si(III) - Growth of Monotype Domains by Solid-Phase Epitaxy on a Vicinal Surface Rocher A, Oustry A, David MJ, Caumont M
3023 - 3032	Diffusion and Electrical-Activity of Indium in (Hg,Cd)Te Weck G, Wandel K
3033 - 3039	Interaction of Hydrogen with Chemical-Vapor-Deposition Diamond Surfaces - A Thermal-Desorption Study Chua LH, Jackman RB, Foord JS, Chalker PR, Johnston C, Romani S
3040 - 3047	Ga-CH3 Bond Scission by Atomic-H - The Depletion of Surface Carbon from a Gallium Alkyl Film on Silicon Dioxide Lucas SR, Partlow WD, Choyke WJ, Yates JT
3048 - 3053	Amorphous Nitrogenated Carbon-Films - Structural Modifications Induced by Thermal Annealing Freire FL, Achete CA, Mariotto G, Canteri R
3054 - 3061	Al Deposition on Fe - Formation of an Iron Aluminide Surface Alloy Schulze RK, Taylor TN, Paffett MT
3062 - 3067	Depth Profiling Analysis of Aluminum Oxidation During Film Deposition in a Conventional High-Vacuum System Kim J, Weimer JJ, Zukic M, Torr DG
3068 - 3073	Preparation of Highly Oriented Thin-Film of Nonlinear-Optical Material by Vacuum Deposition Inoue A, Okamoto M, Akagi Y, Koba M
3074 - 3081	Growth and Characterization of Cubic Boron-Nitride Thin-Films Kester DJ, Ailey KS, Lichtenwalner DJ, Davis RF
3082 - 3086	Composition Effects in Flash Evaporated Cuin(Sexte1-X)(2) Films Leon M, Diaz R, Rueda F
3087 - 3090	Plasma and Processing Effects of Electrode Spacing for Tungsten Etchback Using a Bipolar Electrostatic Wafer Clamp Marx WF, Ra YJ, Yang R, Chen CH
3091 - 3094	Damage and Contamination in Low-Temperature Electron-Cyclotron-Resonance Plasma-Etching Whang KW, Lee SH, Doh HH, Kim JS
3095 - 3101	Investigation of Selective SiO2-to-Si Etching in an Inductively-Coupled High-Density Plasma Using Fluorocarbon Gases Bell FH, Joubert O, Oehrlein GS, Zhang Y, Vender D
3102 - 3108	Measurements of Radical Densities in Radiofrequency Fluorocarbon Plasmas Using Infrared-Absorption Spectroscopy Haverlag M, Stoffels E, Stoffels WW, Kroesen GM, Dehoog FJ
3109 - 3114	Characterization of H- Extraction for a Multipole Ion-Source Located in the Tail of the Magnetic-Field Distribution - Type-III Oka Y, Ando A, Kaneko O, Takeiri Y, Tsumori K, Akiyama R, Kawamoto T
3115 - 3119	Spatial Distributions of Electron-Density and Temperature in Audio Frequency and Radio-Frequency Magnetron Glow-Discharges Fusselman SP, Yasuda HK, Javedani JB, Chiang J, Prelas MA
3120 - 3125	Fourier-Transform Infrared-Absorption Spectrometry Measurements of a CF4 Discharge in an Electron-Cyclotron-Resonance Reactor Goeckner MJ, Henderson MA, Meyer JA, Breun RA
3126 - 3130	Diagnostics and Control of Radiofrequency Glow-Discharge Mutsukura N, Fukasawa Y, Machi Y, Kubota T
3131 - 3136	Plasma Diagnostics of a Direct-Current Arcjet Diamond Reactor .1. Electrostatic-Probe Analysis Reeve SW, Weimer WA
3137 - 3145	Observations of Particle Layers Levitated in a Radiofrequency Sputtering Plasma Praburam G, Goree J
3146 - 3148	Corrosion Behavior of Sputtered Amorphous Magnetic Thin-Films, with and Without Protective Overlayers Wallace JL
3149 - 3151	Estimation of Indium-to-Germanium and Gallium-to-Germanium Sputtering Yield Ratios Using Cosputtering Deposition Comedi D, Fajardo F, Chambouleyron I, Tabacniks M
3152 - 3156	Erbium-Doped Indium Oxide-Films Prepared by Radio-Frequency Sputtering Kim HK, Li CC, Barrios PJ
3157 - 3164	Intrinsic Resputtering During Film Deposition Investigated by Monte-Carlo Simulation Bauer W, Betz G, Bangert H, Bergauer A, Eisenmengersittner C
3165 - 3168	Comparative-Study of Ni Ultrathin-Film Grown on Pt(110)-(1X1) and Pt(110)-(1X2) at 130-K Tsay JS, Fu TY, Tsai PS, Shern CS
3169 - 3175	Directed Sputter-Deposition of AlCu - Film Microstructure and Microchemistry Kim YW, Moser J, Petrov I, Greene JE, Rossnagel SM
3176 - 3179	Enhancement of the Deposition Rate of TiO2 Film in Radio-Frequency Reactive Sputtering Sekiguchi H, Kanzawa A, Imai T, Honda T
3180 - 3185	Characteristics of Polyimide Films Deposited by Ionized Cluster Beam Kim KW, Hong CE, Choi SC, Cho SJ, Whang CN, Shim TE, Lee DH
3186 - 3191	Outgassing Characteristics and Surface-Analysis of Pure Aluminum Plates Under Electron-Beam Irradiation Ohi T, Konno O
3192 - 3199	Computer-Simulation of the Ion-Beam Deposition of Binary Thin-Films - Carbon Nitride and Boron-Carbide Todorov SS, Marton D, Boyd KJ, Albayati AH, Rabalais JW
3200 - 3204	Existence of Structural Inhomogeneity in Ion-Beam-Modified Polyimide Films Xu XL, Xu D, Xu HL, Wang R, Zou SC, Du GD, Xia GQ
3205 - 3216	Influence of the Composition of the Altered Layer on the Ripple Formation Elst K, Vandervorst W
3217 - 3223	Experimental and Analytical Studies on Mechanical-Behavior of Knife-Edge-Type Metal-Seal Flange for Fusion Vacuum Sealing Kitamura K, Itoh K, Uchida T, Kondoh M, Obara K, Nakamura K, Murakami Y
3224 - 3227	Test-Results for a Sputter-Ion Pump with a New Cell Structure Suetsugu Y
3228 - 3232	Capillary Arrays with Variable Channel Density - An Improved Gas Injection System Scheinowitz DA, Werner K, Radelaar S
3233 - 3238	Performance of an Ionization Gauge with a Large-Angle Ion Deflector .1. Total Pressure Measurement in Extreme High-Vacuum Oshima C, Otuka A
3239 - 3241	Coupling of Radiofrequency Bias Power to Substrates Without Direct-Contact, for Application to Film Deposition with Substrate Transport Smith DL, Alimonda AS
3242 - 3244	Monte-Carlo Simulation of Ion-Transport Through Radio-Frequency Collisional Sheaths Ardehali M
3245 - 3247	Simple Source of Li Metal for Evaporators in Ultrahigh-Vacuum (UHV) Applications Esposto FJ, Griffiths K, Norton PR, Timsit RS
3248 - 3248	Optical-Emission Spectroscopy of Zinc-Sulfide Etch (Vol 10, Pg 3065, 1992) Orloff GJ