167 - 173 |
Depth Profiling of Dopants in Thin Gate Oxides in Complementary Metal-Oxide-Semiconductor Structures by Resonance Ionization Mass-Spectrometry Downey SW, Emerson AB, Georgiou GE, Bevk J, Kistler RC, Moriya N, Jacobson DC, Wise ML |
174 - 182 |
16-Megabit Dynamic Random-Access Memory Trench Depth Characterization Using 2-Dimensional Diffraction Analysis Hatab ZR, Mcneil JR, Naqvi SS |
183 - 191 |
Simulations of Trench-Filling Profiles Under Ionized Magnetron Sputter Metal-Deposition Hamaguchi S, Rossnagel SM |
192 - 197 |
Investigation of Silicon Transport in the Neutral Background of a Plasma Activated Reactive Evaporation System Higgins B, Durandet A, Boswell R |
198 - 202 |
Submicron Al Filled via Formation by High-Temperature Sputter-Deposition and via Electrical-Properties Nishimura H, Ogawa S, Yamada T |
203 - 208 |
Directional Deposition of Cu into Semiconductor Trench Structures Using Ionized Magnetron Sputtering Cheng PF, Rossnagel SM, Ruzic DN |
209 - 213 |
Grain-Growth in Copper-Films Exposed to Magnetically Enhanced Plasmas Naeem MD, Rossnagel SM, Rajan K |
214 - 226 |
Quantitative Chemical Topography of Polycrystalline Si Anisotropically Etched in Cl-2/O-2 High-Density Plasmas Guinn KV, Cheng CC, Donnelly VM |
227 - 234 |
Comparison of Damage and Si Oxidation-Kinetics Resulting from Electron-Cyclotron-Resonance and Distributed Electron-Cyclotron-Resonance Plasma Processing Hu YZ, Li M, Wang Y, Irene EA, Hugon MC, Varniere F, Jiang N, Froment M, Agius B |
235 - 241 |
Comparison of Etching Processes of Silicon and Germanium in SF6-O-2 Radiofrequency Plasma Campo A, Cardinaud C, Turban G |
242 - 246 |
Steady-State Damage Profiles Due to Reactive Ion Etching and Ion-Assisted Etching Davis RJ, Jha P |
247 - 252 |
Dry Photochemical Selective Etching of InGaAs/InAlAs in HBr Gas-Using a 172-nm Excimer Lamp Habibi S, Totsuka M, Tanaka J, Kinoshita T, Matsumoto S, Iida S |
253 - 257 |
In-Situ Monitoring of GaAs Etched with a Cl-2/Ar Discharge in an Electron-Cyclotron-Resonance Source Kahaian DJ, Thomas S, Pang SW |
258 - 267 |
Real-Time in-Situ Monitoring of Surfaces During Glow-Discharge Processing - NH3 and H-2 Plasma Passivation of GaAs Aydil ES, Zhou ZH, Gottscho RA, Chabal YJ |
268 - 272 |
Fabrication of All-Optical Quantum-Well Bistable Microresonators by Reactive Ion Etching Rivera T, Izrael A, Azoulay R, Kuszelewicz R, Bresse JF, Oudar JL, Ladan FR |
273 - 275 |
Characteristics of Delta-Doped InGaAs/GaAs Pseudomorphic Double-Quantum-Well High-Electron-Mobility Transistors Hsu RT, Kao MJ, Wang JS, Hsu WC |
276 - 280 |
Optimization of Interfaces in InGaAs/InP Heterostructures Grown by Gas-Source Molecular-Beam Epitaxy Mozume T, Kashima H, Hosomi K, Ouchi K, Sato H, Masuda H, Tanoue T, Ohbu I |
281 - 286 |
GaAs Growth on (111)B Substrates by Molecular-Beam Epitaxy - A Study of the First Stages of Growth on Ultraviolet-Ozone Prepared Surfaces Garcia BJ, Fontaine C, Yague AM |
287 - 289 |
Electron-Beam-Heated Solid Source for Carbon Doping in GaAs and AlGaAs Alloys Grown by Molecular-Beam Epitaxy Walker JF, Sorba L, Defranceschi S, Beltram F |
290 - 292 |
Reliable Substrate-Temperature Measurements for High-Temperature AlGaAs Molecular-Beam Epitaxy Growth Strite S, Kamp M, Meier HP |
293 - 296 |
Use of Ti in Ohmic Metal Contacts to P-GaAs Ren F, Abernathy CR, Pearton SJ, Lothian JR |
297 - 304 |
Ambient Scanning-Tunneling-Microscopy and Atomic-Force Microscopy on GaAs (110) Treated with (NH4)(2)S-X and Ses2 Solutions Nozaki S, Tamura S, Takahashi K |
305 - 307 |
Time-Resolved Luminescence Measurements on GaAs Homostructures Using Pulse Excitation of a Scanning Tunneling Microscope Stehle M, Bischoff M, Pagnia H, Horn J, Marx N, Weiss BL, Hartnagel HL |
308 - 317 |
Characterization of a Single-Layer Quantum-Wire Structure Grown Directly on a Submicron Grating Gustafsson A, Samuelson L, Hessman D, Malm JO, Vermeire G, Demeester P |
318 - 320 |
Postfabrication Resistance Trimming of a Superconducting Tunnel Junction Using a Focused Ion-Beam Barber ZH, Blamire MG, Dawes NJ |
321 - 326 |
Nanometer Metrology by Means of Backscattered Electrons Difabrizio E, Grella L, Gentili M, Baciocchi M, Mastrogiacomo L, Maggiora R |
327 - 330 |
Scanning-Tunneling-Microscopy Current-Voltage Characteristics of Carbon Nanotubes Rivera W, Perez JM, Ruoff RS, Lorents DC, Malhotra R, Lim S, Rho YG, Jacobs EG, Pinizzotto RF |
331 - 334 |
Fabrication of an Ultrasharp and High-Aspect-Ratio Microprobe with a Silicon-on-Insulator Wafer for Scanning Force Microscopy Itoh J, Tohma Y, Kanemaru S, Shimizu K |
335 - 337 |
Polycrystalline Tungsten and Iridium Probe Tip Preparation with a Ga+ Focused Ion-Beam Hopkins LC, Griffith JE, Harriott LR, Vasile MJ |
338 - 343 |
Electron-Emission Enhancement by Overcoating Molybdenum Field-Emitter Arrays with Titanium, Zirconium, and Hafnium Schwoebel PR, Spindt CA, Brodie I |
344 - 349 |
Effect of Tip Shape on Surface-Roughness Measurements from Atomic-Force Microscopy Images of Thin-Films Westra KL, Thomson DJ |
350 - 354 |
Scanning Force Microscope Technique for Adhesion Distribution Measurement Sasaki M, Hane K, Okuma S, Torii A |
355 - 360 |
Ultrasonic Atomization of the DNA Solution for Atomic-Force Microscopy Sasaki M, Okuma S, Miyata K, Hane K, Takeda Y |
361 - 365 |
Gold Nanocomposites Maya L, Allen WR, Glover AL, Mabon JC |
366 - 370 |
New Optics Design Methodology Using Diffraction Grating on Spherical Mirrors for Soft-X-Ray Projection Lithography Fukuda H, Terasawa T |
371 - 374 |
Coarse Guidelines in Designing Focused Ion-Beam Optics Ishitani T, Kawanami Y |
375 - 382 |
Synthesis of Focusing and Deflection Columns Szilagyi M, Mui PH |
383 - 386 |
Electron Trapping in Thin Oxide on GaAs and InP at 77 K Eftekhari G |
387 - 389 |
Ge Island Formation on Si(111) in Solid-Phase Epitaxy Studied by Medium-Energy Ion-Scattering Sumitomo K, Nishioka T, Ogino T |
390 - 393 |
Comparison of the Electrical Characteristics of Si Metal-Insulator-Semiconductor Tunnel-Diodes with Interfacial Layer Grown by Rapid Thermal-Oxidation of Si in O-2 and in N2O Eftekhari G |
394 - 395 |
Series Resistance of in-Plane-Gated Transistors and Quantum Point Contacts Devries DK, Wieck AD |
396 - 398 |
Gate Oxide Degradation During Polysilicon Etching in a Parallel-Plate Plasma-Type Etcher Lee DD, Kim JH, Shin KS, Park HS, Choi SH |
399 - 399 |
Coulomb Effects in Retarding-Field Lenses (Vol B12, Pg 3489, 1994) Brodie AD |
402 - 402 |
Papers from the 7th International Vacuum Microelectronics Conference - 4-7 July 1994, Grenoble, France - Preface Baptist R, Meyer R |
403 - 406 |
Calculations for an Experiment for Determining the Duration of Quantum Tunneling with a Laser-Illuminated Field Emitter Hagmann MJ |
407 - 409 |
Interferometry with Low-Energy Electrons Morin R, Degiovanni A |
410 - 413 |
Low-Energy-Electron Interference with Spindt-Type Microtips Py C, Baptist R |
414 - 417 |
Silicon Tips with Diamond Particles on Them - New Field Emitters Givargizov EI |
418 - 421 |
Field-Emission from Silicon Spikes with Diamond Coatings Zhirnov VV, Givargizov EI, Plekhanov PS |
422 - 426 |
Field-Emission Characteristics of Diamond-Coated Silicon Field Emitters Liu J, Zhirnov VV, Myers AF, Wojak GJ, Choi WB, Hren JJ, Wolter SD, Mcclure MT, Stoner BR, Glass JT |
427 - 430 |
Field-Emission from P-Type Polycrystalline Diamond Films Hong D, Aslam M |
431 - 434 |
Field-Emission from Ion-Milled Diamond Films on Si Asano T, Oobuchi Y, Katsumata S |
435 - 436 |
Field Emitter Arrays on Nanotube Carbon Structure Films Gulyaev YV, Chernozatonskii LA, Kosakovskaja ZJ, Sinitsyn NI, Torgashov GV, Zakharchenko YF |
437 - 440 |
Studies of Porous Silicon Field Emitters Boswell E, Seong TY, Wilshaw PR |
441 - 444 |
Enhancement in Emission Current from Dry-Processed N-Type Si Field Emitter Arrays After Tip Anodization Takai M, Yamashita M, Wille H, Yura S, Horibata S, Ototake M |
445 - 447 |
Photoemission of Microrelief Semiconductor Surfaces with Semitransparent Au Films Dmitruk NL, Litovchenko VG, Mamikin SV |
448 - 451 |
Effects of Potassium and Lithium Metal-Deposition on the Emission Characteristics of Spindt-Type Thin-Film Field-Emission Microcathode Arrays Talin AA, Felter TE, Devine DJ |
452 - 455 |
Application of the Focused Ion-Beam Technique to the Direct Fabrication of Vertical-Type Field Emitters Ishikawa J, Ohtake T, Gotoh Y, Tsuji H, Fukayama N, Inoue K, Nagamachi S, Yamakage Y, Ueda M, Maruno H, Asari M |
456 - 460 |
New Fabrication Method of Silicon Field Emitter Arrays Using Thermal-Oxidation Uh HS, Lee JD |
461 - 464 |
Electron-Beaming Induced Deposition for Fabrication of Vacuum Field Emitter Devices Weber M, Rudolph M, Kretz J, Koops HW |
465 - 468 |
Fabrication of Lateral-Type Thin-Film Edge Field Emitters by Focused Ion-Beam Technique Gotoh Y, Ohtake T, Fujita N, Inoue K, Tsuji H, Ishikawa J |
469 - 473 |
Fabrication and Analysis of a Silicon Tip Avalanche Cathode Jo SH, Lee JD, Kwon SJ |
474 - 477 |
Field-Emission from Microtip Test Arrays Using Resistor Stabilization Levine JD, Meyer R, Baptist R, Felter TE, Talin AA |
478 - 481 |
Collimated Sputter-Deposition, a Novel Method for Large-Area Deposition of Spindt Type Field-Emission Tips Vanveen GN, Theunissen B, Vandeheuvel K, Horne R, Burgmans AL |
482 - 486 |
Flat-Panel Display Prototype Using Low-Voltage Carbon Field Emitters Tcherepanov AY, Chakhovskoi AG, Sharov VB |
487 - 490 |
Experimental-Study of Field-Emission Properties of the Spindt-Type Field Emitter Itoh S, Watanabe T, Ohtsu K, Taniguchi M, Uzawa S, Nishimura N |
491 - 493 |
Active Control of the Emission Current of Field Emitter Arrays Yokoo K, Arai M, Mori M, Bae JS, Ono S |
494 - 499 |
Emission Property and Current Fluctuation of Starlike Thin-Film Field Emitter Array with Self-Feedback Function Kaneko A, Sumita I, Kimura H, Matsuura J, Kondo Y |
500 - 504 |
Blue-Light Emission Observed in a Monolithic Thin-Film Edge Emission Vacuum Microelectronic Device Williams RT, Evatt SR, Legg JD, Weichold MH |
505 - 510 |
Simulation of Time-Dependent Quantum Transport in-Field Emission from Semiconductors - Complications Due to Scattering, Surface-Density, and Temperature Jensen KL |
511 - 515 |
Analytic Expressions for Emission Characteristics as a Function of Experimental Parameters in Sharp Field Emitter Devices Jensen KL, Zaidman EG |
516 - 521 |
Improved Fowler-Nordheim Equation for Field-Emission from Semiconductors Jensen KL |
522 - 525 |
Calculation of Local-Density of States at an Atomically Sharp Si Tip Huang ZH, Cutler PH, Miskovsky NM, Sullivan TE |
526 - 530 |
Calculation of Electron Field-Emission from Diamond Surfaces Huang ZH, Cutler PH, Miskovsky NM, Sullivan TE |
531 - 535 |
Electric Field-Potential Correlation Factors for Field-Emission Microtriodes Nicolaescu D |
536 - 539 |
Optimization of Quantum-Well Structures for Field-Emission Applications Litovchenko VG, Kryuchenko YV, Ilchenko LG |
540 - 544 |
Numerical-Analysis on Field-Emission for the Effects of the Gate Insulators Ahn HY, Lee CG, Lee JD |
545 - 548 |
Characterization of Field Emitter Structures by Means of Modeling Electron Trajectories in Vacuum Kopka P, Ermert H |
549 - 552 |
Studies into the Emission Uniformity of Large Silicon Field Emitter Arrays Cade NA, Johnston R, Miller AJ, Patel C |
553 - 557 |
Statistical-Analysis of Field Emitter Emissivity - Application to Flat Displays Levine JD |
558 - 565 |
Field-Emission in a Microwave Field Fursey GN |
566 - 570 |
External-Field Penetration Effect on Current-Field Characteristics of Metal Emitters Ilchenko LG, Kryuchenko YV |
571 - 575 |
Planar Lenses for Field-Emitter Arrays Tang CM, Swyden TA, Ting AC |
576 - 579 |
Silicon Field Emitter Arrays with Low Capacitance and Improved Transconductance for Microwave-Amplifier Applications Palmer D, Gray HF, Mancusi J, Temple D, Ball C, Shaw JL, Mcguire GE |
580 - 584 |
Minicolumn Silicon Field-Emitter Arrays Yadon LN, Temple D, Palmer WD, Ball CA, Mcguire GE, Tang CM, Swyden TA |
585 - 588 |
Processes of Microwave Generation and Amplification in Structures with Medium Electron Transit Angles Galdetskiy AV, Solntsev VA, Stepanchuk VV |
589 - 592 |
Electron-Gun with Field-Emission Array Cathodes for Vacuum Microwave Devices Golenitsky II, Sazonov VP, Chubun NN, Rumyantsev SA |
593 - 598 |
Distributed Microwave-Amplifier on Field Emitter Arrays with a Nonhomogeneous Energy Collector Gulyaev YV, Nefedov IS, Sinitsyn NI, Torgashov GV, Zakharchenko YF, Zhbanov AI |
599 - 602 |
Development of a Scanning Atom-Probe Nishikawa O, Kimoto M, Iwatsuki M, Ishikawa Y |
603 - 606 |
Field-Emission and Atom-Probe Field-Ion Microscope Studies of Palladium-Silicide-Coated Silicon Emitters King RA, Mackenzie RA, Smith GD, Cade NA |
607 - 610 |
Reduced Field-Emission of Niobium and Copper Cathodes Mahner E, Muller G, Piel H, Pupeter N |
611 - 615 |
Investigation of an Electron-Beam Microgun Using a Microtips Array Constancias C, Herve D, Accomo R, Molva E |
616 - 620 |
Silicon Cathodes with Array of Tips Used as Pulsed Photoemitters Aboubacar A, Chbihi A, Dupont M, Gardes J, Laguna M, Querrou M |
621 - 624 |
New-Type of Metal-Ion Source - Surface-Diffusion Li+ Ion-Source Medvedev VK, Suchorski Y, Block JH |
625 - 629 |
Pilot Experiments on Microstructured Liquid-Metal Ion and Electron Sources Mitterauer J |
637 - 637 |
Papers from the 14th North-American Conference on Molecular-Beam Epitaxy - Preface Fischer RJ |
639 - 641 |
Nonuniform Distribution of Strain in InGaAs/GaAs Quantum Wires Chen YP, Reed JD, Schaff WJ, Eastman LF |
642 - 645 |
Structural and Optical Behavior of Strained InAs Quantum Boxes Grown on Planar and Patterned GaAs (100) Substrates by Molecular-Beam Epitaxy Xie QH, Konkar A, Kalburge A, Ramachandran TR, Chen P, Cartland R, Madhukar A, Lin HT, Rich DH |
646 - 649 |
Surfactant Assisted Growth of 850-nm Light Modulators Cunningham JE, Goossen KW, Jan W, Williams MD |
650 - 652 |
Growth of GaxIn1-xAs Quantum-Wire Heterostructures by the Strain-Induced Lateral-Layer Ordering Process Chou ST, Hsieh KC, Cheng KY, Chou LJ |
653 - 656 |
Low-Temperature Growth of 850-nm Quantum-Well Modulators for Monolithic Integration to Very Large-Scale Integrated Electronics on GaAs Cunningham JE, Goossen KW, Jan WY, Walker JA, Pathak RN |
657 - 659 |
Modulated Reflectivity Spectroscopy of Electronic States Confined in Surface Quantum-Wells and Above Quantum Barriers Parks C, Ramdas AK, Melloch MR, Steblovsky G, Rammohan LR, Luo H |
660 - 663 |
Interface Characterization in an InP/InGaAs Resonant-Tunneling Diode by Scanning-Tunneling-Microscopy Skala SL, Wu W, Tucker JR, Lyding JW, Seabaugh A, Beam EA, Jovanovic D |
664 - 666 |
Selective-Area Epitaxy of Carbon-Doped (Al)GaAs by Chemical Beam Epitaxy Li NY, Dong HK, Hsin YM, Nakamura T, Asbeck PM, Tu CW |
667 - 669 |
Carbon-Doped InAlAs/InGaAs Heterojunction Bipolar-Transistors in Solid-Source Molecular-Beam Epitaxy Using Carbon Tetrabromide Hwang WY, Miller DL |
670 - 673 |
Surface-Morphology of Epitaxial CaF2/Si(111) and Its Influence on Subsequent GaAs Epitaxy Li WD, Thundat T, Anan T, Schowalter LJ |
674 - 677 |
Far-Infrared Photoconductive Magnetospectroscopy as a Tool for Studying Shallow Donor Concentration Profiles in Wide GaAs/AlGaAs Quantum-Wells Chai YH, Goodhue WD, Mueller ER, Waldman J |
678 - 680 |
Initial Results for InGaAs Films Grown on InGaAs Substrates Hoke WE, Lyman PS, Carter JR, Hendriks HT, Bonner WA, Lent B |
681 - 684 |
Measurement of AlxGa1-xAs Temperature-Dependent Optical-Constants by Spectroscopic Ellipsometry Kuo CH, Anand S, Fathollahnejad H, Ramamurti R, Droopad R, Maracas GN |
685 - 688 |
Consequences of DX Centers on the Charge-Distribution of Double-Quantum-Well, Delta-Modulation-Doped Heterostructures Young AP, Chen JH, Wieder HH |
689 - 691 |
Effect of Substrate Miscut on the Structural-Properties of InGaAs Linear Graded Buffer Layers Grown by Molecular-Beam Epitaxy on GaAs Eldredge JW, Matney KM, Goorsky MS, Chui HC, Harris JS |
692 - 695 |
In Segregation at the Growth Front of the GaAs/In0.30Ga0.70As (100) Heterojunction Williams MD, Chiu TH, Storz FG |
696 - 698 |
Much Improved Interfaces in GaAs/AlAs Quantum-Wells Grown on (411)A GaAs Substrates by Molecular-Beam Epitaxy Shimomura S, Shinohara K, Kitada T, Hiyamizu S, Tsuda Y, Sano N, Adachi A, Okamoto Y |
699 - 701 |
Growth of Inassb Quantum-Wells for Long-Wavelength (Similar-to-4 Mu-M) Lasers Turner GW, Choi HK, Le HQ |
702 - 705 |
AlGaAsSb/Ingasb Quantum-Well Heterostructures for P-Channel Field-Effect Transistors Klem JF, Lovejoy ML |
706 - 708 |
Molecular-Beam Epitaxy Growth and Characterization of High-Quality Gaassb Chen HC, Rane AB, Zhang DX, Murry SJ, Pei SS, Tao YK, Pearah PJ, Cheng KY |
709 - 710 |
Alassb/Inassb Heterojunction Diodes Grown on Si by Molecular-Beam Epitaxy Du Q, Wang WI |
711 - 715 |
High-Brightness II-VI Light-Emitting-Diodes Grown by Molecular-Beam Epitaxy on ZnSe Substrates Yu Z, Eason DB, Boney C, Ren J, Hughes WC, Rowland WH, Cook JW, Schetzina JF, Cantwell G, Harsch WC |
716 - 719 |
Growth of ZnSe Epilayers on Fe(001) Films by Migration-Enhanced Epitaxy and Self-Limiting Epitaxy Abad H, Jonker BT, Cotell CM, Krebs JJ |
720 - 723 |
Issues of II-VI Molecular-Beam Epitaxy Growth Toward a Long Lifetime Blue/Green Laser-Diode Grillo DC, Ringle MD, Hua GC, Han J, Gunshor RL, Hovinen M, Nurmikko AV |
724 - 727 |
Growth of Vertical-Cavity on Buried-Oxide Substrate by Gas-Source Si Molecular-Beam Epitaxy and Coupled-Mode Luminescence of Strained Si1-xGex/Si Quantum-Wells Fukatsu S, Nayak DK, Shiraki Y |
728 - 730 |
Effect of Si+ and Ge+ Ions on the Growth of Si1-xGex Films on Si(001) Using Potential-Enhanced Molecular-Beam Epitaxy Yun SJ, Lee SC, Lee JJ, Park SC |
731 - 732 |
Znmgsse/Znsse/Cdznse Strained-Quantum-Well Lasers Grown on (511)A Tao IW, Wang Y, Jurkovic M, Wang WI |
733 - 735 |
Solid Source Molecular-Beam Epitaxial-Growth of Ga0.5In0.5P Using a Valved, 3-Zone Phosphorus Source Hoke WE, Weir DG, Lemonias PJ, Hendriks HT, Jackson GS, Colombo P |
736 - 738 |
Molecular-Beam Epitaxial-Growth of GaxIn1-Xp-GaAs (X-Similar-to-0.5) Double-Heterojunction Laser-Diodes Using Solid Phosphorus and Arsenic Valved Cracking Cells Baillargeon JN, Cho AY |
739 - 741 |
Linear Motion Oven for Variable Incident Group-III Flux Jones CR, Beasley DL, Taylor EN, Evans KR, Solomon JS |
742 - 745 |
In-Situ Pyrometric Interferometry Monitoring and Control of III-V Layered Structures During Molecular-Beam Epitaxy Growth Liu X, Ranalli E, Sato DL, Li Y, Lee HP |
746 - 749 |
Molecular-Beam Epitaxy Growth of II-VI Light-Emitting Devices on GaAs Substrates Using Valved Sources for S and Se Johnson MA, Yu Z, Cook JW, Schetzina JF |
750 - 753 |
Operation and Device Applications of a Valved-Phosphorus Cracker in Solid-Source Molecular-Beam Epitaxy Chin TP, Chang JC, Woodall JM, Chen WL, Haddad GI, Parks C, Ramdas AK |
754 - 757 |
High-Resolution X-Ray-Diffraction Studies of AlGaP Grown by Gas-Source Molecular-Beam Epitaxy Bi WG, Deng F, Lau SS, Tu CW |
758 - 761 |
Low-Resistivity Vertical-Cavity Surface-Emitting Lasers Grown by Molecular-Beam Epitaxy Using Sinusoidal-Composition Grading in Mirrors and in-Situ Nonalloyed Ohmic Contacts Hong M, Vakhshoori D, Mannaerts JP, Hsieh YF |
762 - 764 |
Yellow (5735 Angstrom) Emission GaInP Multiple-Quantum-Well Lasers Grown by Gas-Source Molecular-Beam Epitaxy Chen AC, Moy AM, Cheng KY |
765 - 767 |
Molecular-Beam Epitaxy Growth of Multiple-Wavelength Mirrors and Applications for a Dual-Wavelength Resonant-Cavity Photodetector Srinivasan A, Murtaza S, Anselm K, Shih YC, Campbell JC, Streetman BG |
768 - 770 |
Novel GaAs Photodetector with Gain for Long-Wavelength Detection Harmon ES, Mcinturff DT, Melloch MR, Woodall JM |
771 - 773 |
GaAs and InP Selective Molecular-Beam Epitaxy Streit DC, Block TR, Han AC, Wojtowicz M, Umemoto DK, Kobayashi K, Oki AK, Liu PH, Lai R, Ng GI |
774 - 776 |
Graded-Channel InGaAs-InAlAs-InP High-Electron-Mobility Transistors Streit DC, Block TR, Wojtowicz M, Pascua D, Lai R, Ng GI, Liu PH, Tan KL |
777 - 781 |
Nondestructive Characterization of Pseudomorphic High-Electron-Mobility Transistor Structures Using X-Ray-Diffraction and Reflectivity Rogers TJ, Ballingall JM, Larsen M, Hall EL |
782 - 785 |
Molecular-Beam Epitaxial-Growth of High-Quality InSb for P-I-N Photodetectors Singh G, Michel E, Jelen C, Slivken S, Xu J, Bove P, Ferguson I, Razeghi M |
786 - 788 |
Ultrathin Nitride Layers Grown by Molecular-Beam Epitaxy and Their Effects on Interface States in Silicon Metal-Insulator-Semiconductor Field-Effect Transistors Fayfield RT, Chen J, Hagedorn MS, Higman TK, Moy AM, Cheng KY |
789 - 791 |
Approach to Obtain High-Quality GaN on Si and SiC-on-Silicon-on-Insulator Compliant Substrate by Molecular-Beam Epitaxy Yang Z, Guarin F, Tao IW, Wang WI, Iyer SS |
792 - 795 |
Influence of Substrate Electrical Bias on the Growth of GaN in Plasma-Assisted Epitaxy Beresford R, Ohtani A, Stevens KS, Kinniburgh M |
796 - 799 |
Growth and Characterization of GaN on Sapphire (0001) Using Plasma-Assisted Ionized Source Beam Epitaxy Kim K, Yoo MC, Shim KH, Verdeyen JT |