901 - 903 |
Microscopic investigation of the CdS buffer layer growth on Cu(In,Ga)Se-2 absorbers Sadewasser S, Bremsteller W, Plake T, Kaufmann CA, Pettenkofer C |
904 - 908 |
Statistical representation of intrinsic electronic tunneling characteristics through alkyl self-assembled monolayers in nanowell device structures Song H, Lee T, Choi NJ, Lee H |
909 - 913 |
Effect of substrate temperature on structural and electrical properties of liquid-delivery metal organic chemical vapor deposited indium oxide thin films on silicon Venkat S, Pammi N, Sahu BS, Seong NJ, Yoon SG |
914 - 917 |
Controllable fabrication of the micropore shape of two-dimensional photonic crystals using holographic lithography Hsieh ML, Lan YS |
918 - 926 |
Microelectromechanical system microhotplates for reliability testing of thin films and nanowires Aceros JC, McGruer NE, Adams GG |
927 - 933 |
Field emission for cantilever sensors Yang CK, le Febre AJ, Pandraud G, van der Drift E, French PJ |
934 - 938 |
Ion beam machining of Si layer deposited on Zerodur (R) substrate Kurashima Y, Tajima T, Miyamoto I, Ando M, Numata A |
939 - 944 |
Electron beam induced deposition of iron nanostructures Hochleitner G, Wanzenboeck HD, Bertagnolli E |
945 - 948 |
Resistivity and surface states density of n- and p-type silicon nanowires Vaurette F, Nys JP, Deresmes D, Grandidier B, Stievenard D |
949 - 955 |
Probe current, probe size, and the practical brightness for probe forming systems Bronsgeest MS, Barth JE, Swanson LW, Kruit P |
956 - 958 |
Influence of As-stabilized surface on the formation of InAs/GaAs quantum dots Tseng CC, Chou ST, Chen YH, Chung TH, Lin SY, Wu MC |
959 - 962 |
Stable room temperature deposited amorphous InGaZnO4 thin film transistors Lim W, Kim SH, Wang YL, Lee JW, Norton DP, Pearton SJ, Ren F, Kravchenko II |
963 - 967 |
Inhibiting spontaneous etching of nanoscale electron beam induced etching features: Solutions for nanoscale repair of extreme ultraviolet lithography masks Lassiter MG, Liang T, Rack PD |
968 - 972 |
Dependence of Zn1-xMgxO : P film properties on magnesium concentration Kim HS, Lugo F, Pearton SJ, Norton DP, Ren F |
973 - 977 |
Fabrication of three-dimensional nanostructures by focused ion beam milling Tjerkstra RW, Segerink FB, Kelly JJ, Vos WL |
978 - 982 |
Conformal metal oxide coatings on nanotubes by direct low temperature metal-organic pyrolysis in supercritical carbon dioxide Peng Q, Spagnola JC, Daisuke H, Park KJ, Parsons GN |
983 - 989 |
Field emission properties of individual zinc oxide nanowire field emitter Yeong KS, Thong JTL |
990 - 994 |
Effects of laterally overgrown n-GaN thickness on defect and deep level concentrations Polyakov AY, Smirnov NB, Govorkov AV, Markov AV, Yakimov EB, Vergeles PS, Lee IH, Lee CR, Pearton SJ |
995 - 1000 |
Nitrogen and hydrogen plasma treatments of multiwalled carbon nanotubes Jones JG, Waite AR, Muratore C, Voevodin AA |
1001 - 1005 |
Potential of pulsed electron-beam deposition for nanomaterial fabrication: Spatial distribution of deposited materials Steigerwald A, Mu R |
1006 - 1010 |
Insights into the electron-field emission mechanism from nanostructured carbons: A multistep phenomenon and modeling Gupta S |
1011 - 1020 |
Linewidth roughness transfer measured by critical dimension atomic force microscopy during plasma patterning of polysilicon gate transistors Pargon E, Martin M, Thiault J, Joubert O, Foucher J, Lill T |
1021 - 1024 |
Field emission properties of ZnO nanorods coated with NiO film Yang JH, Lee SY, Song WS, Shin YS, Park CY, Kim HJ, Cho W, An KS |
1025 - 1029 |
Observation and control of electrochemical etching effects in the fabrication of InAs/AlSb/GaSb heterostructure devices Su N, Tang Y, Zhang Z, Kuech TF, Fay P |
1030 - 1032 |
Performance improvement of CuOx with gradual oxygen concentration for nonvolatile memory application Zhou P, Lv HB, Yin M, Tang L, Song YL, Tang TA, Lin YY, Bao A, Wu A, Cai S, Wu H, Liang C, Chi MH |
1033 - 1037 |
Fully sealed carbon nanotube flat-panel light source and its application as thin film transistor-liquid-crystal display backlight Zhang Y, Deng SZ, Xu NS, Chen J |
1038 - 1040 |
Field-emission cascades prepared by boron nitride cluster beam deposition Song FQ, Zhou F, Han M, Wan JG, Liu ZW, Zhou JF, Wang GH |
1049 - 1052 |
Molecular beam epitaxy III-nitride growth for polarization sensitive devices based on M-plane films with in situ real time analysis by spectroscopic ellipsometry Boney C, Misra P, Pillai R, Starikov D, Bensaoula A |
1053 - 1057 |
Effects of bismuth on wide-depletion-width GaInNAs solar cells Ptak AJ, France R, Jiang CS, Reedy RC |
1058 - 1063 |
Role of ion damage on unintentional Ca incorporation during the plasma-assisted molecular-beam epitaxy growth of dilute nitrides using N-2/Ar source gas mixtures Oye MM, Bank SR, Ptak AJ, Reedy RC, Goorsky MS, Holmes AL |
1064 - 1067 |
Growth and structural characteristics of GaN/AlN/nanothick gamma-Al2O3/Si (111) Lee WC, Lee YJ, Tung LT, Wu SY, Lee CH, Hong M, Ng HM, Kwo J, Hsu CH |
1068 - 1073 |
Real-time mass spectroscopy of reflected fluxes during molecular beam epitaxy growth of HgCdTe Sewell RH, Dell JM, Faraone L |
1074 - 1077 |
In situ molecular beam epitaxial growth of SiN films using a source port compatible electron-gun for silicon evaporation Hoke WE, Kennedy TD, Torabi A, Vandermeulen KY, Mosca JJ |
1078 - 1080 |
High electron mobility InAs0.8Sb0.2 grown on InP substrates by gas source molecular beam epitaxy Liao CC, Wu BR, Hsieh KC, Cheng KY |
1081 - 1083 |
Quantitative mobility spectrum analysis of carriers in GaSb/InAs/GaSb superlattice Rao TVC, Antoszewski J, Rodriguez JB, Plis E, Krishna S, Faraone L |
1084 - 1088 |
In(Ga, Al)As quantum dot/wire growth on InP Tzeng TE, Feng DJY, Chen CY, Lay TS |
1089 - 1092 |
Temperature dependence of photoluminescence oxygen-related deep levels in Al0.2Ga0.3In0.5P : Be grown by solid source molecular beam epitaxy Soubervielle-Montalvo C, Mishoumyi V, Hernandez IC, Mendez-Garcia VH |
1093 - 1096 |
Molecular beam epitaxy growth of AlGaAs on the (631)-oriented GaAs substrates Mendez-Garcia VH, Ramirez-Elias MG, Gorbatchev A, Cruz-Hernandez E, Rojas-Ramirez JS, Martinez-Velis I, Zamora-Peredo L, Lopez-Lopez M |
1097 - 1099 |
Direct electron beam patterning and molecular beam epitaxy growth of InAs: Site definition of quantum dots Yokota H, Tsunashima K, Iizuka K, Okamoto H |
1100 - 1104 |
Improved quantum confinement of self-assembled high-density InAs quantum dot molecules in AlGaAs/GaAs quantum well structures by molecular beam epitaxy Swe NC, Tangmattajittakul O, Suraprapapich S, Changmoang P, Thainoi S, Wissawinthanon C, Kanjanachuchai S, Ratanathammaphan S, Panyakeow S |
1105 - 1109 |
Selective growth of CdTe on patterned CdTe/Si(211) Seldrum T, Bommena R, Samain L, Dumont J, Sivananthan S, Sporken R |
1110 - 1114 |
Improved epitaxy of barium titanate by molecular beam epitaxy through a single crystalline magnesium oxide template for integration on hexagonal silicon carbide Goodrich TL, Cai Z, Losego MD, Maria JP, Kourkoutis LF, Muller DA, Ziemer KS |
1115 - 1119 |
Molecular beam epitaxy growth of metamorphic high electron mobility transistors and metamorphic heterojunction bipolar transistors on Ge and Ge-on-insulator/Si substrates Lubyshev D, Fastenau JM, Wu Y, Liu WK, Bulsara MT, Fitzgerald EA, Hoke WE |
1120 - 1123 |
Fabrication of periodically polarity-inverted ZnO films Minegishi T, Ishizawa A, Kim J, Kim D, Ahn S, Park S, Park J, Im I, Oh DC, Nakano H, Fujii K, Jeon H, Yao T |
1124 - 1127 |
High-quality nanothick single-crystal Y2O3 films epitaxially grown on Si (111): Growth and structural characteristics Lee YJ, Lee WC, Nieh CW, Yang ZK, Kortan AR, Hong M, Kwo J, Hsu CH |
1128 - 1131 |
Molecular beam epitaxy grown Ga2O3(Gd2O3) high kappa dielectrics for germanium passivation-x-ray photoelectron spectroscopy and electrical characteristics Lee CH, Lin TD, Tung LT, Huang ML, Hong M, Kwo J |
1132 - 1135 |
Oxide scalability in Al2O3/Ga2O3(Gd2O3)/In0.20Ga0.80As/GaAs heterostructures Shiu KH, Chiang CH, Lee YJ, Lee WC, Chang P, Tung LT, Hong M, Kwo J, Tsai W |
1136 - 1139 |
Low-strain InAs/InGaAs/GaAs quantum dots-in-a-well infrared photodetector Shenoi RV, Attaluri RS, Siroya A, Shao J, Sharma YD, Stintz A, Vandervelde TE, Krishna S |
1140 - 1144 |
Tailoring detection wavelength of InGaAs quantum wire infrared photodetector Tsai CL, Cheng KY, Chou ST, Lin SY, Xu C, Hsieh KC |
1145 - 1148 |
nBn detectors based on InAs/GaSb type-II strain layer superlattice Bishop G, Plis E, Rodriguez JB, Sharma YD, Kim HS, Dawson LR, Krishna S |
1149 - 1152 |
Growth and characterization of GaAs1-xSbx barrier layers for advanced concept solar cells Bremner SP, Liu GM, Faleev N, Ghosh K, Honsberg CB |
1153 - 1156 |
Molecular beam epitaxial growth and characteristics of 1.52 mu m metamorphic InAs quantum dot lasers on GaAs Mi Z, Wu C, Yang J, Bhattacharya P |
1157 - 1159 |
InGaAsP/InP buried-heterostructure laser diodes grown on InP using molecular beam epitaxy and metal-organic chemical vapor deposition Pickrell GW, Zhang HL, Ren HW, Zhang D, Xue Q, Anselm KA, Hwang WY |
1160 - 1162 |
High-power, narrow-ridge, mid-infrared interband cascade lasers Canedy CL, Kim CS, Kim M, Larrabee DC, Nolde JA, Bewley WW, Vurgaftman I, Meyer JR |
1163 - 1166 |
InGaAlAs/InGaAs strain-balanced multi-quantum-well laser/semiconductor optical amplifiers operating at excited transitions Feng DJY, Chiu CL, Lin SH, Lay TS, Chang TY |
1167 - 1170 |
Manufacturing of laser diodes grown by molecular beam epitaxy for coarse wavelength division multiplexing systems Anselm KA, Hwang WY, Ren HW, Zhang D, Um J |
1171 - 1173 |
Growth and characterization of ZnxCd1-xSe/Znx' Cdy' Mg1-x'-y' Se asymmetric coupled quantum well structures for quantum cascade laser applications Charles WO, Shen A, Franz K, Gmachl C, Zhang Q, Gong Y, Neumark GF, Tamargo MC |
1174 - 1177 |
Designing high electron mobility transistor heterostructures with quantum dots for efficient, number-resolving photon detection Rowe MA, Gansen EJ, Greene MB, Rosenberg D, Harvey TE, Su MY, Hadfield RH, Nam SW, Mirin RP |
1178 - 1181 |
Si metal-oxide-semiconductor devices with high kappa HfO2 fabricated using a novel MBE template approach followed by atomic layer deposition Pan CH, Kwo J, Lee KY, Lee WC, Chu LK, Huang ML, Lee YJ, Hong M |
1182 - 1186 |
Fabrication and characterization of metal-oxide-semiconductor GaAs capacitors on Ge/Si1-xGex/Si substrates with Al2O3 gate dielectric Shahrjerdi D, Nuntawong N, Balakrishnan G, Garcia-Gutierrez DI, Khoshakhlagh A, Tutuc E, Huffaker D, Lee JC, Banerjee SK |
1187 - 1190 |
Molecular beam epitaxy growth of InAs and In0.8Ga0.2As channel materials on GaAs substrate for metal oxide semiconductor field effect transistor applications Li N, Harmon ES, Salzman DB, Zakharov DN, Jeon JH, Stach E, Woodall JM, Wang XW, Ma TP, Walker F |