Journal of Vacuum Science & Technology B

Journal of Vacuum Science & Technology B, Vol.27, No.5 Entire volume, number list

ISSN: 1071-1023 (Print)

In this Issue (44 articles)

L21 - L24	Effect of sidewall passivation in BCl3/N-2 inductively coupled plasma etching of two-dimensional GaAs photonic crystals Atlasov KA, Gallo P, Rudra A, Dwir B, Kapon E
L25 - L27	Effects of Ga+ milling on InGaAsP quantum well laser with mirrors milled by focused ion beam Vallini F, Figueira DSL, Jarschel PF, Barea LAM, Von Zuben AAG, Frateschi NC
L28 - L31	Analysis of dielectric constant of a self-forming barrier layer with Cu-Mn alloy on TEOS-SiO2 Chung SM, Koike J
2079 - 2083	Impact of in situ SiNx layer grown with metal organic vapor phase epitaxy on the electrical and optical properties of AlN/GaN metal insulator semiconductor field effect transistor structures Cho E, Seo S, Jin C, Pavlidis D, Fu G, Tuerck J, Jaegermann W
2084 - 2090	Analysis of thermally activated kinetics and uniformity of photoresist ashing process on 300 mm wafers Mezerette DL, Tanimura K, Vinogradov GK
2091 - 2096	Effects of exposure time on defects and demolding force in soft ultraviolet nanoimprint lithography Ye XD, Ding YC, Duan YG, Liu HZ, Lu BH
2097 - 2101	Inductively coupled plasma reactive ion etching of bulk ZnO single crystal and molecular beam epitaxy grown ZnO films Mehta M, Ruth M, Piegdon KA, Krix D, Nienhaus H, Meier C
2102 - 2105	Enhancement of operation temperature of InAs/GaAs quantum-dot infrared photodetectors with hydrogen-plasma treatment Lin WH, Tseng CC, Chao KP, Lin SY, Wu MC
2106 - 2111	Growth scaling of metal oxide columnar thin films deposited by glancing angle depositions Taschuk MT, Krause KM, Steele JJ, Summers MA, Brett MJ
2112 - 2116	Effect of Ta buffer layer and thickness on the structural and magnetic properties of Co thin films Vahaplar K, Tari S, Tokuc H, Okur S
2117 - 2123	Mechanism of reducing line edge roughness in ArF photoresist by using CF3I plasma Soda E, Kondo S, Saito S, Koyama K, Jinnai B, Samukawa S
2124 - 2127	Structural and electrical properties of metal contacts on n-type ZnO thin film deposited by vacuum coating technique Periasamy C, Chakrabarti P
2128 - 2131	Transparent dual-gate InGaZnO thin film transistors: OR gate operation Lim W, Douglas EA, Lee J, Jang J, Craciun V, Norton DP, Pearton SJ, Ren F, Son SY, Yuh JH, Shen H, Chang W
2132 - 2137	Plasma treatment methods to improve indium bump bonding via indium oxide removal Greer F, Dickie M, Vasquez RP, Jones TJ, Hoenk ME, Nikzad S
2138 - 2144	Highly sensitive positive-working molecular resist based on new molecule Hattori S, Yamada A, Saito S, Asakawa K, Koshiba T, Nakasugi T
2145 - 2152	Pd/Ru/Au Ohmic contacts to InAlSb/InAs heterostructures for high electron mobility transistors Dormaier R, Zhang Q, Chou YC, Lange MD, Yang JM, Oki A, Mohney SE
2153 - 2160	Controlled etching and regrowth of tunnel oxide for antenna-coupled metal-oxide-metal diodes Tiwari B, Bean JA, Szakmany G, Bernstein GH, Fay P, Porod W
2161 - 2165	Nonlinear large deflection of nanopillars fabricated by focused ion-beam induced chemical vapor deposition using double-cantilever testing Tanaka H, Shinkai M, Shibutani Y, Kogo Y
2166 - 2169	Cu-plated through-wafer vias for AlGaN/GaN high electron mobility transistors on Si Chen KH, Ren F, Pais A, Xie HK, Gila BP, Pearton SJ, Johnson JW, Rajagopal P, Roberts JC, Piner EL, Linthicum KJ
2170 - 2174	Fabrication and optical properties of Ti-doped W18O49 nanorods using a modified plasma-arc gas-condensation technique Su CY, Lin HC, Lin CK
2175 - 2181	Effects of Si interlayer on resistance switching of Pt/Si/TiO2/Pt structures Go S, Jeong K, Lee K, Kim A, Ruh H, Kim CS, Lee J
2182 - 2186	Novel heterostructure of CdS nanoparticle/WO3 nanowhisker: Synthesis and photocatalytic properties Kim H, Tak Y, Senthil K, Joo J, Jeon S, Yong K
2187 - 2191	Evolution of surface morphology of dry-etched ZnO with Cl-2/Ar plasma Hsueh KP, Hou RJ, Tun CJ
2192 - 2199	Effect of liquid dispensing on flow field for immersion lithography Chen WY, Chen Y, Zou J, Fu X, Yang HY, Ruan XD, Gong GF
2200 - 2205	The effect of acid on superconformal filling in 100 nm trenches Gallaway JW, West AC
2206 - 2208	Organopalladium catalyst on S-terminated GaAs(001)-(2x6) surface Konishi T, Toujyou T, Ishikawa T, Bell GR, Tsukamotoa S
2209 - 2216	Characterization of focused-ion-beam induced defect structures in graphite for the future guided self-assembly of molecules O'Donnell SE, Reinke P
2217 - 2221	Calculation of electron emission from a gated single nanowire Lei D, Wang WB, Zeng LY, Liang JQ
2222 - 2226	Electrical characterization of thin InAs films grown on patterned W/GaAs substrates Astromskas G, Wallenberg LR, Wernersson LE
2227 - 2231	Comparison of conjugated polymer deposition techniques by photoluminescence spectroscopy Lantz KR, Pate R, Stiff-Roberts AD, Duffell AG, Smith ER, Everitt HO
2232 - 2237	Oxygen effects on radiation hardness of ZnO thin films Gur E, Asil H, Cinar K, Coskun C, Tuzemen S, Meral K, Onganer Y, Serifoglu K
2238 - 2241	Luminescence mechanisms in Si quantum dots-SiNx nanocomposite structures Rezgui B, Sibai A, Nychyporuk T, Lemiti M, Bremond G
2242 - 2247	Surface plasmon resonance of gold nanoparticles formed by cathodic arc plasma ion implantation into polymer Teixeira FS, Salvadori MC, Cattani M, Carneiro SM, Brown IG
2248 - 2251	Structural and luminescent properties of Er-doped ZnO films grown by metalorganic chemical vapor deposition Terai Y, Yamaoka K, Yamaguchi T, Fujiwara Y
2252 - 2258	Etch stop in via-hole etching on aluminum interconnection using inductively coupled C2F6 plasma with O-2 additive gas Imai S, Jiwari N
2259 - 2263	Nanoimprint mold fabrication and duplication for embedded servo and discrete track recording media Tan EL, Aung KO, Sbiaa R, Wong SK, Tan HK, Poh WC, Piramanayagam SN, Chum CC
2264 - 2269	Uniformity conditioning of diamond field emitter arrays Jarvis JD, Andrews HL, Brau CA, Choi BK, Davidson J, Kang WP, Wong YM
2270 - 2279	Time-multiplexed, inductively coupled plasma process with separate SiCl4 and O-2 steps for etching of GaAs with high selectivity Golka S, Arens M, Reetz M, Kwapien T, Bouchoule S, Patriarche G
2280 - 2285	Numerical approach for the theory of harmonic self-heating technique to measure thermophysical properties of suspended thin samples Feng B, Li ZX, Zhang X, Peterson GP
2286 - 2291	Film-thickness dependence of 10 GHz Nb coplanar-waveguide resonators Inomata K, Yamamoto T, Watanabe M, Matsuba K, Tsai JS
2292 - 2300	Self-assembled monolayers of poly(ethylene glycol) siloxane as a resist for ultrahigh-resolution electron beam lithography on silicon oxide Gao B, Bernstein GH, Lieberman M
2301 - 2308	Effect of etch-clean delay time on post-etch residue removal for front-end-of-line applications Vos I, Hellin D, Vereecke G, Pavel E, Boullart W, Vertommen J
2309 - 2320	Diagnostics and modeling of CH4-CO2 plasmas for nanosmooth diamond deposition: Comparison to experimental data Gries T, Vandenbulcke L, de Persis S, Aubry O, Delfau JL
2321 - 2323	Influence of room temperature control on atomic force microscope imaging Fu J, Wei C, Vorburger T