Journal of Vacuum Science & Technology B

Journal of Vacuum Science & Technology B, Vol.11, No.6 Entire volume, number list

ISSN: 1071-1023 (Print)

In this Issue (198 articles)

1955 - 1961	Gas-Phase Etching of Si(111)-(7X7) Surfaces by Oxygen Observed by Scanning-Tunneling-Microscopy Donig F, Feltz A, Kulakov M, Hessel HE, Memmert U, Behm RJ
1962 - 1967	Fabrication of Micromachined Silicon Tip Transducer for Tactile Sensing Jiang JC, Faynberg V, White RC, Allen PK
1968 - 1981	Influence of Oxygen on the Formation of Ripples on Si Elst K, Vandervorst W, Alay J, Snauwaert J, Hellemans L
1982 - 1986	Scanning-Tunneling-Microscopy Study of Deoxygenated and Deionized Water Rinsed GaAs(111)-B Surfaces Fukuda T, Hirota Y
1987 - 1991	Development of an Ultrahigh-Vacuum Atomic-Force Microscope for Investigations of Semiconductor Surfaces Kageshima M, Yamada H, Nakayama K, Sakama H, Kawazu A, Fujii T, Suzuki M
1992 - 1999	Nanofabrication of Metal Structures in Gold-Films Deposited on Mica Silva LA, Laitenberger P, Palmer RE
2000 - 2005	Rearrangement of Au(111) Surface as a Result of Scanning with Scanning Tunneling Atomic-Force Microscopes Wang H, Jing J, Chu HT, Henriksen PN
2006 - 2011	Analysis of Highly Ordered Pyrolytic-Graphite Step Defects via Scanning Tunneling Microscope Noll JD, Cooper JB, Myrick ML
2012 - 2015	Digital Scan Model for Focused Ion-Beam-Induced Gas Etching Harriott LR
2016 - 2020	Transmission Electron-Microscopy Specimen Preparation Technique Using Focused Ion-Beam Fabrication - Application to GaAs Metal-Semiconductor Field-Effect Transistors Yamaguchi A, Shibata M, Hashinaga T
2021 - 2024	Novel Scheme for the Preparation of Transmission Electron-Microscopy Specimens with a Focused Ion-Beam Overwijk MH, Vandenheuvel FC, Bullelieuwma CW
2025 - 2032	Hydrogen Plasma Processing of GaAs and AlGaAs Choquette KD, Freund RS, Hong M, Luftman HS, Chu SN, Mannaerts JP, Wetzel RC
2033 - 2037	Ultraviolet-Ozone Oxidation of GaAs(100) and InP(100) Lu ZH, Bryskiewicz B, Mccaffrey J, Wasilewski Z, Graham MJ
2038 - 2045	Identification of Volatile Products in Low-Pressure Hydrocarbon Electron-Cyclotron-Resonance Reactive Ion Etching of InP and GaAs Melville DL, Simmons JG, Thompson DA
2046 - 2056	Ion Velocity Distributions in Helicon Wave Plasmas - Magnetic-Field and Pressure Effects Nakano T, Giapis KP, Gottscho RA, Lee TC, Sadeghi N
2057 - 2061	P-Type ZnSe Grown by Molecular-Beam Epitaxy with Remote Microwave Plasma of N2 Kawakami Y, Ohnakado T, Tsuka M, Tokudera S, Ito Y, Fujita S, Fujita S
2062 - 2066	Galvanomagnetic Study of P-Hg1-xCdxTe Passivated Surfaces Hoschl P, Moravec P, Franc J, Grill R, Milev P, Belas E
2067 - 2070	Electron-Cyclotron-Resonance Sputter Removal of SiO2 on Silicon-Wafers Gopinath V, Salbert GT, Grotjohn TA, Reinhard DK
2071 - 2080	Influence of Reactant Transport on Fluorine Reactive Ion Etching of Deep Trenches in Silicon Arnold JC, Gray DC, Sawin HH
2081 - 2089	Characterization of Silicon Dioxide and Phosphosilicate Glass Deposited Films Rojas S, Zanotti L, Borghesi A, Sassella A, Pignatel GU
2090 - 2095	Comparison of Passivation Films - The Effect of Thermal Cycles and Comparison of Phosphorus-Doped Oxide-Films Wu TH, Obrien K, Hemmes DG
2096 - 2101	Ellipsometric Monitoring and Control of the Rapid Thermal-Oxidation of Silicon Conrad KA, Sampson RK, Massoud HZ, Irene EA
2102 - 2106	Ellipsometric Determination of the Thickness and Refractive-Index of Silicon Films Li M, Yakovlev VA, Wall J, Irene EA
2107 - 2113	Selective and Blanket Copper Chemical-Vapor-Deposition for Ultra-Large-Scale Integration Jain A, Kodas TT, Jairath R, Hampdensmith MJ
2114 - 2120	Tolerance on Alignment Error in Ghost Proximity Effect Correction Moritzumi K, Broers AN
2121 - 2122	Lift-Off Process for Noble-Metals Domansky K, Petelenz D, Janata J
2123 - 2126	Nanofabrication Techniques for a 100 nm-Scale Tungsten Polycide Gate Structure Azuma T, Nakasugi T, Oogi S, Takigami Y, Oyamatsu H
2127 - 2129	Layer Structure Evaluation of Multilayer X-Ray Mirror by Combination of Focused Ion-Beam Etching and Transmission Electron-Microscopy Nakajima K, Sudo S, Yakushiji M, Ishii T, Aoki S
2130 - 2131	Hafnium Dioxide Etch-Stop Layer for Phase-Shifting Masks Shih KK, Chieu TC, Dove DB
2132 - 2136	Photo-Beam and Electron-Beam Lithography Sharing Common Stencil Krupenin VA, Lotkhov SV, Vyshenskii SV
2137 - 2138	Temperature-Measurement for Scanning Tunnel Microscope Samples Using a Detachable Thermocouple John KD, Wan KJ, Yates JT
2151 - 2151	Papers from the 37th International-Symposium on Electron, Ion, and Photon Beams - 1-4 June 1993 Sheraton-Harbor-Island-Hotel San-Diego, California - Preface Hohn FJ
2152 - 2152	Papers from the 37th International-Symposium on Electron, Ion, and Photon Beams - 1-4 June 1993 Sheraton-Harbor-Island-Hotel San-Diego, California - Preface Cerrina F
2153 - 2153	Papers from the 37th International-Symposium on Electron, Ion, and Photon Beams - 1-4 June 1993 Sheraton-Harbor-Island-Hotel San-Diego, California - Preface Okazaki S
2155 - 2163	Lithographic Patterning of Self-Assembled Films Calvert JM
2164 - 2174	Alignment Signal Failure-Detection and Recovery in Real-Time Progler CJ, Chen AC, Hughlett E
2175 - 2178	Marks for Alignment and Registration in Projection Electron Lithography Farrow RC, Liddle JA, Berger SD, Huggins HA, Kraus JS, Camarda RM, Tarascon RG, Jurgensen CW, Kola RR, Fetter L
2179 - 2182	Improvement of Heterodyne Alignment Technique for X-Ray Steppers Koga K, Itoh T, Kusumoto S, Araki K, Yasui J, Takeuchi H, Aoki S
2183 - 2190	Confocal Filtering of the Instantaneous Image in Scanned Dark-Field Alignment Rosenbluth AE, Progler C, Fullenbaum M
2191 - 2194	Novel on-Axis Interferometric Alignment Method with Sub-10-nm Precision Moel A, Moon EE, Frankel RD, Smith HI
2195 - 2199	Focused-Ion Beam-Induced Deposition of Copper Dellaratta AD, Melngailis J, Thompson CV
2200 - 2203	Focused Ion-Beam Xef2 Etching of Materials for Phase-Shift Masks Harriott LR
2204 - 2209	Selective Electroless Plating on Electron-Beam Seeded Nanostructures Lee KL, Thomas RR, Viehbeck A, Osullivan EJ
2210 - 2213	Modification of Polymer Surfaces and the Fabrication of Submicron-Scale Functionalized Structures by Deep-Ultraviolet and Electron-Beam Lithography Wybourne MN, Wu JC, Yan MD, Cai SX, Keana JF
2214 - 2218	Characteristics of Ion-Beam-Assisted Etching of GaAs - Surface Stoichiometry Kosugi T, Iwase H, Gamo K
2219 - 2223	Resolution Limits in Electron-Beam-Induced Tungsten Deposition Kohlmannvonplaten KT, Chlebek J, Weiss M, Reimer K, Oertel H, Brunger WH
2224 - 2228	High-Resolution Reactive Ion Etching and Damage Effects in the Si/Gexsi1-X System Cheung R, Zijlstra T, Vanderdrift E, Geerligs LJ, Verbruggen AH, Werner K, Radelaar S
2229 - 2232	Fabrication of Silicon Nanostructures with Electron-Beam Lithography Using AIN as a Dry-Etch Durable Resist Tada T, Kanayama T
2233 - 2236	Controlling the Profile of Nanostructures Tsutsui K, Hu EL, Wilkinson CD
2237 - 2243	Very-Low Damage Etching of GaAs Murad SK, Wilkinson CD, Wang PD, Parkes W, Sotomayortorres CM, Cameron N
2244 - 2248	Selectively Dry Gate Recessed GaAs Metal-Semiconductor Field-Effect Transistors, High-Electron-Mobility Transistors, and Monolithic Microwave Integrated-Circuits Cameron NI, Ferguson S, Taylor MR, Beaumont SP, Holland M, Tronche C, Soulard M, Ladbrooke PH
2249 - 2253	Characterization of Low-Energy Ion-Induced Damage Using the Multiple-Quantum-Well Probe Technique with an Intervening Superlattice Green DL, Hu EL, Petroff PM, Liberman V, Nooney M, Martin R
2254 - 2257	Fabrication of Parallel Quantum Wires in GaAs/AlGaAs Heterostructures Using AlAs Etch-Stop Layers Grundbacher R, Chang H, Hannan M, Adesida I
2258 - 2261	Characteristics of Selective Reactive Ion Etching of InGaAs/InAlAs Heterostructures Using HBr Plasma Agarwala S, Adesida I, Caneau C, Bhat R
2262 - 2265	300-KHz Pulse Plasma-Etching of GaAs Using a Mixture of Cich3 and H2 Law VJ, Tewordt M, Clary DC, Jones GA
2266 - 2269	Characteristics of in-Situ Cl2 Etched Regrown GaAs/GaAs Interfaces Mui DS, Strand TA, Thibeault BJ, Coldren LA, Petroff PM, Hu EL
2270 - 2274	Etching on Silicon Membranes for Sub-0.25-Mu-M X-Ray Mask Manufacturing Muller KP, Eib NK, Faure TB
2275 - 2279	Controllable Layer-by-Layer Etching of III-V Compound Semiconductors with an Electron-Cyclotron-Resonance Source Ko KK, Pang SW
2280 - 2283	Highly Selective Reactive Ion Etch Process for InP-Based Device Fabrication Using Methane Hydrogen Argon Schramm JE, Hu EL, Merz JL, Brown JJ, Melendes MA, Thompson MA, Brown AS
2284 - 2287	Multilayer Resist Dry-Etching Technology for Deep-Submicron Lithography Tokashiki K, Sato K, Aoto N, Ikawa E
2288 - 2293	Low-Damage Electron-Beam-Assisted Dry-Etching of GaAs and AlGaAs Using Electron-Cyclotron-Resonance Plasma Electron Source Watanabe H, Matsui S
2294 - 2298	Particle-Particle Interaction Effects in Image Projection Lithography Systems Berger SD, Eaglesham DJ, Farrow RC, Freeman RR, Kraus JS, Liddle JA
2299 - 2303	Limits of Low-Energy-Electron Optics Hordon LS, Huang ZR, Maluf N, Browning R, Pease RF
2304 - 2308	Large-Area Electron-Beam Source Livesay WR
2309 - 2314	El-4 Column and Control Petric PF, Gordon MS, Senesi JJ, Haire DF
2315 - 2318	Magnetic Microlens with an Atomically Sharp Field Emitter Terris BD, Zuger O, Rugar D
2319 - 2322	Effect of Beam Condition in Variable-Shaped Electron-Beam Direct Writing for 0.25 Mu-M and Below Hirasawa S, Nakajima K, Tamura T, Aizaki N
2323 - 2326	Continuous Writing Method for High-Speed Electron-Beam Direct Writing System HL-800D Kawano M, Mizuno K, Yoda H, Sakitani Y
2327 - 2331	Oxygen Processed Field-Emission Tips for Microcolumn Applications Kim HS, Yu ML, Staufer U, Muray LP, Kern DP, Chang TH
2332 - 2341	El-4, a New-Generation Electron-Beam Lithography System Pfeiffer HC, Davis DE, Enichen WA, Gordon MS, Groves TR, Hartley JG, Quickle RJ, Rockrohr JD, Stickel W, Weber EV
2342 - 2345	Spatial-Phase-Locked Electron-Beam Lithography - Initial Test-Results Ferrera J, Wong VV, Rishton S, Boegli V, Anderson EH, Kern DP, Smith HI
2346 - 2351	Electron-Beam Direct Writing System Ex-8D Employing Character Projection Exposure Method Hattori K, Yoshikawa R, Wada H, Kusakabe H, Yamaguchi T, Magoshi S, Miyagaki A, Yamasaki S, Takigawa T, Kanoh M, Nishimura S, Housai H, Hashimoto S
2352 - 2356	Laboratory Setup for Projection Electron Lithography and a Monte-Carlo Simulation of Scattering Mask Transmission Miller PD, Gibson JM, Bieeker AJ, Liddle JA
2357 - 2361	Electron-Beam Block Exposure System for a 256-M Dynamic Random-Access Memory Sakamoto K, Fueki S, Yamazaki S, Abe T, Kobayashi K, Nishino H, Satoh T, Takemoto A, Ookura A, Oono M, Sago S, Oae Y, Yamada A, Yasuda H
2362 - 2366	Integration of Microstructures Onto Negative Electron-Affinity Cathodes - Fabrication and Operation of an Addressable Negative Electron-Affinity Cathode Santos EJ, Macdonald NC
2367 - 2372	Proximity Effects in Low-Energy Electron-Beam Lithography Stark TJ, Edenfeld KM, Griffis DP, Radzimski ZJ, Russell PE
2373 - 2377	Multiple Beam-Shaping Diaphragm for Efficient Exposure of Gratings Elsner H, Hahmann P, Dahm G, Koops HW
2378 - 2385	Electrodynamics of Fast Beam Blankers Gesley M, Colby D, Raymond F, Mcclure D, Abboud F
2386 - 2389	Constructive 3-Dimensional Lithography with Electron-Beam-Induced Deposition for Quantum Effect Devices Koops HW, Kretz J, Rudolph M, Weber M
2390 - 2396	Feasibility Study of New Graybeam Writing Strategies for Raster Scan Mask Generation Murray A, Abboud F, Raymond F, Berglund CN
2397 - 2399	Use of a Variable Shaped Beam Electron Lithography System for Diffractive Optics Components Manufacturing Trotel J
2400 - 2403	Intelligent Design Splitting in the Stencil Mask Technology Used for Electron-Beam and Ion-Beam Lithography Behringer U, Engelke H
2404 - 2408	Edge Roughness of a 200-nm Pitch Resist Pattern Fabricated by Ion Projection Lithography Brunger WH, Blaschke J, Torkler M, Buchmann LM
2409 - 2415	Projection Ion-Beam Lithography Loschner H, Stengl G, Chalupka A, Fegerl J, Fischer R, Hammel E, Lammer G, Malek L, Nowak R, Traher C, Vonach H, Wolf P, Hill RW
2416 - 2419	Focused-Ion-Beam Damage-Etch Patterning for Isolation of Quantum Structures in AlGaAs/GaAs Templeton IM, Fallahi M, Charbonneau S, Champion HG, Allard LB
2420 - 2426	New Characterization Method of Ion Current-Density Profile Based on Damage Distribution of Ga+ Focused-Ion Beam Implantation in GaAs Benassayag G, Vieu C, Gierak J, Sudraud P, Corbin A
2427 - 2431	Effects of Focused Ion-Beam Reticle Repair on Optical Lithography at I-Line and Deep-Ultraviolet Wavelengths Prewett PD, Martin B, Eastwood AW, Watson JG
2432 - 2435	Ion Exposure Characterization of a Chemically Amplified Epoxy Resist Stumbo DP, Wolfe JC
2436 - 2440	Quasi-Periodic Nanostructures in Focused Ion-Beam Deposited Tungsten at High Angles of Incidence Xu X, Melngailis J
2441 - 2445	Investigations of Artificial Nanostructures and Lithography Techniques with a Scanning Probe Microscope Griesinger UA, Kaden C, Lichtenstein N, Hommel J, Lehr G, Bergmann R, Menschig A, Schweizer H, Hillmer H, Koops HW, Kretz J, Rudolph M
2446 - 2451	Optimization of Aerial Image Quality Turner S, Cerrina F
2452 - 2455	Time-of-Flight Electron Spectrometer for Voltage Measurements on Integrated-Circuits Dinnis AR, Khursheed A
2456 - 2462	Metrology of High-Resolution Resist Structures on Insulating Substrates Difabrizio E, Grella L, Luciani L, Gentili M, Baciocchi M, Figliomeni M, Mastrogiacomo L, Maggiora R, Leonard Q, Cerrina F, Molino M, Powderly D
2463 - 2467	Metrology for Replicated X-Ray Masks Using an Electron-Beam Machine Luciani L, Difabrizio E, Grella L, Baciocchi M, Figliomeni M, Gentili M, Mastrogiacomo L, Maggiora R, Kraspenova A, Reilly M
2468 - 2472	Real-Time Latent Image Monitoring During Holographic Fabrication of Submicron Diffraction Gratings Gregus JA, Green CA, Yoon E, Ostermayer FW, Hayes TR, Pawelek R, Gottscho RA, Sohail S, Naqvi H
2473 - 2476	Line-Profile Measurement with a Scanning Probe Microscope Griffith JE, Marchman HM, Miller GL, Hopkins LC, Vasile MJ, Schwalm SA
2477 - 2481	Simulation of X-Ray Generation Based on Electron Trajectory Calculation Koshishiba H, Yoshimura M, Nakagawa Y
2482 - 2486	Metrology for Phase-Shifting Masks Marchman HM, Vaidya S, Pierrat C, Griffith J
2487 - 2492	Schottky Field-Emission Based Scanning Auger Microprobe Narum DH
2493 - 2496	Fabrication of a Novel Split-Backgate Transistor by in-Situ Focused Ion-Beam Lithography and Molecular-Beam Epitaxial Regrowth Brown KM, Linfield EH, Jones GA, Ritchie DA, Thompson JH
2497 - 2501	Micromachining in III-V Semiconductors Using Wet Photoelectrochemical Etching Khare R, Hu EL, Brown JJ, Melendes MA
2502 - 2508	Fabrication Limits of Nanometer-T and Gamma-Gates - Theory and Experiment Maile BE
2509 - 2513	Multiwavelength Distributed-Bragg-Reflector Laser Array Fabricated Using Near-Field Holographic Printing with an Electron-Beam Generated Phase Grating Mask Tennant DM, Koch TL, Verdiell JM, Feder K, Gnall RP, Koren U, Young MG, Miller BI, Newkirk MA, Tell B
2514 - 2518	Fabrication of Curved Mirrors for Visible Semiconductor-Lasers Using Electron-Beam Lithography and Chemically Assisted Ion-Beam Etching Unger P, Boegli V, Buchmann P, Germann R
2519 - 2523	Fabrication of Sub-10 nm Structures by Lift-Off and by Etching After Electron-Beam Exposure of Poly(Methylmethacrylate) Resist on Solid Substrates Chen W, Ahmed H
2524 - 2527	10 nm Si Pillars Fabricated Using Electron-Beam Lithography, Reactive Ion Etching, and HF Etching Fischer PB, Dai K, Chen E, Chou SY
2528 - 2531	Design and Analysis of InAs/AlSb Ballistic Constrictions for High-Temperature Operation and Low Gate Leakage Koester SJ, Bolognesi CR, Hu EL, Kroemer H, Rooks MJ, Snider GL
2532 - 2537	Self-Limiting Oxidation of Si Nanowires Liu HI, Biegelsen DK, Johnson NM, Ponce FA, Pease RF
2538 - 2543	Integrated Silicon Process for Microdynamic Vacuum Field-Emission Cathodes Zhang ZL, Macdonald NC
2544 - 2547	Investigation of the Longitudinal and Lateral Distribution of Implantation-Induced Damage in GaAs/InGaAs Heterostructures Kieslich A, Doleschel H, Faller F, Forchel A, Stoffel NG
2548 - 2551	Fabrication of Freestanding Structures and Proposed Applications in Tunneling Sensors Moore DF, Lutwyche MI, Hoole AC
2552 - 2555	Self-Aligned Fabrication of Arrays of Back-to-Back External 45-Degrees Reflectors Integrated with Ridge-Wave-Guide Lasers for Surface-Emitting High-Power Semiconductor-Laser Sources in AlGaAs/GaAs Porkolab GA, Wolf ED
2556 - 2559	Optical Analysis of Quantum-Confined Stark-Effect in Overgrown InGaAs/InP Quantum Wires Schilling O, Forchel A, Kohl A, Brittner S
2560 - 2564	Multilayer Resist Process for Asymmetric Gate Recess in Field-Effect Transistors Ballegeer DG, Nummila K, Adesida I
2565 - 2569	New Technique for Computation and Challenges for Electron-Beam Lithography Huang XK, Bazan G, Bernstein GH
2570 - 2573	Ultrahigh-Resolution Magnetic Force Microscope Tip Fabricated Using Electron-Beam Lithography Fischer PB, Wei MS, Chou SY
2574 - 2578	Directly Patterned Low-Voltage Planar Tungsten Lateral Field-Emission Structures Hoole AC, Moore DF, Broers AN
2579 - 2583	Fabrication of Mesoscopic Structures by Channeled Ion-Implantation for the Study of Boundary Scattering of Electrons Hornsey RI, Cleaver JR, Ahmed H
2584 - 2587	Fabrication and Optical-Properties of InGaAs/InP Quantum Wires and Dots with Strong Lateral Quantization Effects Ils P, Michel M, Forchel A, Gyuro I, Klenk M, Zielinski E
2588 - 2591	Fabrication of Hard X-Ray Phase Zone-Plate by X-Ray-Lithography Krasnoperova AA, Xiao J, Cerrina F, Difabrizio E, Luciani L, Figliomeni M, Gentili M
2592 - 2596	Effects of Low-Energy Ion Exposure on Modulation-Doped GaAs Heterostructures Li F, Spencer GF, Wang T, Andrews CC, Kirk WP
2597 - 2602	Determination of Acid Diffusion Rate in a Chemically Amplified Resist with Scanning Tunneling Microscope Lithography Perkins FK, Dobisz EA, Marrian CR
2603 - 2606	Fabrication of Y-Gate, Submicron Gate Length GaAs Metal-Semiconductor Field-Effect Transistors Ren F, Pearton SJ, Lothian JR, Abernathy CR
2607 - 2611	Integrated Approach to Quantum-Dot Fabrication Rishton SA, Lee YH, Milkove KR, Hong JM, Boegli V, Defranza M, Sivan U, Kern DP
2612 - 2614	High-Performance Sub-0.1 Mu-M Silicon N-Metal Oxide Semiconductor Transistors with Composite Metal Polysilicon Gates Rishton SA, Mii YJ, Kern DP, Taur Y, Lee KY, Lii T, Jenkins K, Quinlan D, Brown T, Danner D, Sewell F, Polcari M
2615 - 2620	Electron-Beam Lithography for Advanced Device Prototyping - Process Tool Metrology Rosenfield MG, Thomson MG, Coane PJ, Kwietniak KT, Keller J, Klaus DP, Volant RP, Blair CR, Tremaine KS, Newman TH, Hohn FJ
2621 - 2624	Ridge-Wave-Guide Sidewall-Grating Distributed-Feedback Structures Fabricated by X-Ray-Lithography Wong VV, Choi WY, Carter JM, Fonstad CG, Smith HI, Chung Y, Dagli N
2625 - 2628	Fabrication of 100-nm T-Gates for Monolithic Microwave Integrated-Circuits Using X-Ray-Lithography Gupta N, Hector SD, Rhee KW, Smith HI
2629 - 2632	Focused Ion-Beam Interaction with a Shallow 2-Dimensional Electron-Gas Soh YA, Snider GL, Skvarla MJ, Craighead HG
2633 - 2636	Diffraction Gratings for Measuring Slow Mode Surface-Plasmon Polaritons Tiberio RC, Pugh GM, Sjodin T, Reed BW, Sparks PD
2637 - 2640	Nanofabrication of Photonic Lattice Structures in GaAs/AlGaAs Wendt JR, Vawter GA, Gourley PL, Brennan TM, Hammons BE
2641 - 2644	Low-Loss Beamwidth Transformers on InP with Reduced Requirements on Lithographic Resolution Zengerle R, Bruckner HJ, Hubner B, Weiershausen W
2645 - 2650	Etched-Quartz Fabrication Issues for a 0.25 Mu-M Phase-Shifted Dynamic Random-Access Memory Application Ferguson R, Martino R, Budd R, Hughes G, Skinner J, Staples J, Ausschnitt C, Weed J
2651 - 2658	Mask Assisted Off-Axis Illumination Technique for Random Logic Garofalo J, Biddick CJ, Kostelak RL, Vaidya S
2659 - 2664	Edge Location Errors in Cr-Less and rim-Type Phase-Shifting Lithography Weiss M, Henke W, Ronse K
2665 - 2668	Evaluation of Repair Phase and Size Tolerance for a Phase-Shift Mask Ohtsuka H, Kuwahara K, Onodera T
2669 - 2674	Phase-Shifting Lithography - Maskmaking and Its Application Watanabe H, Todokoro Y
2675 - 2679	Optical Projection System for Gigabit Dynamic Random-Access Memories Jeong H, Markle DA, Owen G, Pease RF, Grenville A
2680 - 2685	Key Technologies in Lower Submicron Lithography - Ultimate Super Resolution Imaging-System and Chemically Amplified Resist Using the Self-Solubility Acceleration Effect Nakase M, Inoue S, Fujisawa T, Kihara N, Ushirogouchi T
2686 - 2691	Direct Aerial Image Measurement as a Method of Testing High Numerical Aperture Microlithographic Lenses Partlo WN, Fields CH, Oldham WG
2692 - 2696	Performance of 0.2 Mu-M Optical Lithography Using KrF and ArF Excimer-Laser Sources Yamashita K, Endo M, Sasago M, Nomura N, Nagano H, Mizuguchi S, Ono T, Sato T
2697 - 2699	Optical-Properties of Hydrogenated Amorphous-Carbon Film for Attenuated Phase-Shift Mask Applications Callegari A, Pomerene AT, Hovel HJ, Babich ED, Purushothaman S, Shaw JM
2700 - 2704	Image Monitor for Markle-Dyson Optics Grenville A, Owen G, Pease RF
2705 - 2713	Printing of Phase-Shifting Mask Defects Kostelak RL, Pierrat C, Garofalo JG, Vaidya S
2714 - 2719	Advanced Dynamic Process Simulation for an Excimer-Laser Lithography Ohfuji T, Nalamasu O, Stone DR
2720 - 2724	Evaluation of Depth-of-Focus in Photolithography at 193 and 248 nm for Feature Sizes of 0.25 Mu-M and Below Rothschild M, Doran SP, Barouch E, Hollerbach U, Orszag SA
2725 - 2732	Process Issue Improvement of Surface Image Transfer Technique - Depth-of-Focus Characteristics and Their Comparison with Simulation Results Tomo Y, Ogawa T, Nagayama T, Kimura M
2733 - 2740	Reduction and Elimination of Proximity Effects Dobisz EA, Marrian CR, Salvino RE, Ancona MA, Perkins FK, Turner NH
2741 - 2745	Proxecco Proximity Effect Correction by Convolution Eisenmann H, Waas T, Hartmann H
2746 - 2753	Efficiency of Electron-Beam Proximity Effect Correction Groves TR
2754 - 2757	Analytical Evaluation of the Energy Deposition Function in Electron-Beam Lithography in the Case of a Composite Substrate Raptis I, Glezos N, Hatzakis M
2758 - 2761	2 Methods of Experimental Evaluation of Long-Range Proximity Function Components in Electron-Beam Lithography Bogdanov AL, Polyakov A
2762 - 2767	Fast Proximity Effect Correction - An Extension of Pyramid for Thicker Resists Cook BD, Lee SY
2768 - 2772	Incident Dose Modification for Proximity Effect Correction Thomson MG
2773 - 2778	Chemical Amplification Electron-Beam Positive Resist Process Free from Surface Insoluble Layer Fujino T, Maeda H, Kumada T, Moriizumi K, Kubota S, Koezuka H, Morimoto H, Watakabe Y, Tsubouchi N
2779 - 2782	Single-Component Deep-Ultraviolet and X-Ray Resists - The Lithographic Behavior of Poly((2-Methyl-4-T-Butoxycarbonyloxystyrene)Sulfone) and Poly((3-Chloro-4-T-Butoxycarbonyloxystyrene)Sulfone) Neenan TX, Kumar U, Kometani JM, Novembre AE
2783 - 2788	Single-Layer Chemically Amplified Photoresists for 193-nm Lithography Wallraff GM, Allen RD, Hinsberg WD, Larson CF, Johnson RD, Dipietro R, Breyta G, Hacker N, Kunz RR
2789 - 2793	New Silicon-Rich Silylating Reagents for Dry-Developed Positive-Tone Deep-Ultraviolet Lithography Wheeler DR, Hutton S, Stein S, Baiocchi F, Cheng M, Taylor G
2794 - 2797	Water-Soluble Conducting Polyanilines - Applications in Lithography Angelopoulos M, Patel N, Shaw JM, Labianca NC, Rishton SA
2798 - 2806	Relationship Between Resist Performance and Reaction Order in a Chemically Amplified Resist System Fedynyshyn TH, Szmanda CR, Blacksmith RF, Houck WE, Root JC
2807 - 2811	Evaluation and Application of a Very High-Performance Chemically Amplified Resist for Electron-Beam Lithography Lee KY, Huang WS
2812 - 2817	Development of Positive Electron-Beam Resist for 50 kv Electron-Beam Direct-Writing Lithography Sakamizu T, Yamaguchi H, Shiraishi H, Murai F, Ueno T
2818 - 2822	Imaging Dissolution Rate Monitor - Mapping the Photoresist Response Sullivan M, Taylor JW
2823 - 2828	Self-Assembled Monolayer Electron-Beam Resists on GaAs and SiO2 Lercel MJ, Tiberio RC, Chapman PF, Craighead HG, Sheen CW, Parikh AN, Allara DL
2829 - 2833	Effect of Low-Solubility Surface-Layer on Development of AZ-Pf514 Krasnoperova AA, Turner SW, Ocola L, Cerrina F
2834 - 2838	Patterning of X-Ray Masks Using the Negative-Acting Resist P(Si-CMS) Mixon DA, Novembre AE, Tai WW, Jurgensen CW, Frackoviak J, Trimble LE, Kola RR, Celler GK
2839 - 2844	Parametric Modeling of Photoelectron Effects in X-Ray-Lithography Ocola LE, Cerrina F
2845 - 2849	Optimization Design Program for Chemically Amplified Resist Process Pan SW, Reilly MT, Taylor JW, Cerrina F
2850 - 2854	Soft-X-Ray Photochemistry of Chemisorbed Self-Assembled Monolayers Suh D, Simons JK, Taylor JW, Koloski TS, Calvert JM
2855 - 2861	Dissolution Rate Properties of 3-Component Deep-Ultraviolet Positive Photoresists Thackeray JW, Denison M, Fedynyshyn TH, Georger J, Mori JM, Orsula GW
2862 - 2866	Simulation of Locally Enhanced 3-Dimensional Diffusion in Chemically Amplified Resists Zuniga M, Wallraff G, Tomacruz E, Smith B, Larson C, Hinsburg WD, Neureuther AR
2867 - 2871	Insolubilization Mechanism of Chemically Amplified Negative Photoresists Yamaguchi A, Kishimura S, Tsujita K, Morimoto H, Tsukamoto K, Nagata H
2872 - 2875	Study of Electron-Beam Patterning of Resist on Tungsten X-Ray Masks Cummings KD, Resnick DJ, Frackoviak J, Kola RR, Trimble LE, Grant B, Silverman S, Haas L, Jennings B
2876 - 2880	Patterning Issues of 256Mb Dynamic Random-Access Memory X-Ray Masks Koek B, Jennings B, Grant R
2881 - 2887	Effect of Mask Absorber Thickness on X-Ray-Exposure Latitude and Resolution Mccord MA, Wagner A, Seeger D
2888 - 2896	Overlay Performance of X-Ray Steppers in IBM Advance Lithography Facility Progler CJ, Chen AC, Gunther TA, Kaiser P, Cooper KA, Hughlett RE
2897 - 2901	Sub-Half-Micron Metal-Oxide-Semiconductor Device Fabrication Using a Compact Synchrotron-Radiation Lithography System Fujii K, Tsuboi S, Yoshihara T, Tanaka Y, Suzuki K, Setoguchi S, Miyatake T
2902 - 2905	Experimental-Study of Aerial Images in X-Ray-Lithography Guo JZ, Leonard Q, Cerrina F, Difabrizio E, Luciani L, Gentili M, Frank J
2906 - 2909	Fabrication of Flip-Bonded Mesa Masks for X-Ray-Lithography Schattenburg ML, Polce NA, Smith HI, Stein R
2910 - 2919	Fabrication of High-Performance 512K Static-Random Access Memories in 0.25 Mu-M Complementary Metal-Oxide-Semiconductor Technology Using X-Ray-Lithography Viswanathan R, Seeger D, Bright A, Bucelot T, Pomerene A, Petrillo K, Blauner P, Agnello P, Warlaumont J, Conway J, Patel D
2920 - 2925	X-Ray Mask Membrane Motion in Narrow-Gap Lithography - Hydrodynamic Model and Experiment Yanof AW, Zipfel GL, Moon EE
2926 - 2929	Repair of Soft-X-Ray Optical-Elements by Stripping and Redeposition of Mo/Si Reflective Coatings Early K, Windt DL, Waskiewicz WK, Wood OR, Tennant DM
2930 - 2937	Physical-Properties of the X-Ray Membrane Materials Elkhakani MA, Chaker M
2938 - 2942	Development of an Electron-Beam Process for the Fabrication of X-Ray Nanomasks Gentili M, Grella L, Difabrizio E, Luciani L, Baciocchi M, Figliomeni M, Maggiora R, Mastrogiacomo L, Cerrina F
2943 - 2946	Pattern-Formation in Amorphous Wnx by Low-Temperature Electron-Cyclotron-Resonance Etching for Fabrication of X-Ray Mask Inoue T, Kanayama T, Komuro M
2947 - 2952	Stress and Microstructure of Sputter-Deposited Thin-Films - Molecular-Dynamics Simulations and Experiment Fang CC, Jones F, Kola RR, Celler GK, Prasad V
2953 - 2957	Practical Considerations in X-Ray Mask Mounting Methodology Laird DL, Laudon MF, Engelstad RL
2958 - 2963	Resolution Limits and Process Latitude of X-Ray Mask Fabrication Mccord MA, Wagner A, Donohue T
2964 - 2970	Defect Coverage Profile and Propagation of Roughness of Sputter-Deposited Mo/Si Multilayer Coating for Extreme-Ultraviolet Projection Lithography Nguyen KB, Nguyen TD
2971 - 2975	X-Ray Mask Replication Using Square Synchrotron-Radiation Illumination Reilly M, Wells GM, Guo J, Wallace JP, Edwards N, Cerrina F, Melngailis J
2976 - 2980	Performance of a Wide-Field Flux Delivery System for Synchrotron X-Ray-Lithography Silverman JP, Archie CN, Oberschmidt JM, Rippstein RP
2981 - 2985	Simultaneous-Optimization of Spectrum, Spatial Coherence, Gap, Feature Bias, and Absorber Thickness in Synchrotron-Based X-Ray-Lithography Hector SD, Smith HI, Schattenburg ML
2986 - 2989	Soft-X-Ray Production from Laser-Produced Plasmas for Lithography Applications Spitzer RC, Kauffman RL, Orzechowski T, Phillion DW, Cerjan C
2990 - 2993	Low-Stress and Optically Transparent Chromium-Oxide Layer for X-Ray Mask Making Trube J, Yabe H, Aya S, Marumoto K, Matsui Y
2994 - 2996	X-Ray Mask Fabrication Using Advanced Optical Lithography Tsuboi S, Suzuki K
2997 - 3002	X-Ray Stepper Aiming at 0.2-Mu-M Synchrotron Orbital Radiation Lithography Uchida N, Kuwabara O, Ishibashi Y, Kikuiri N, Hirano R, Nishida J, Nishizaka T, Kikuchi Y, Yoshino H
3003 - 3007	Polycapillary Collimator for Point-Source Proximity X-Ray-Lithography Vartanian M, Youngman R, Gibson D, Drumheller J, Frankel R
3008 - 3011	Evaluation of Beryllium Foils for X-Ray-Lithography Beamlines Wells GM, Brodsky EL, Cerrina F, Waldo WG