Plasma Chemistry and Plasma Processing
Plasma Chemistry and Plasma Processing, Vol.19, No.1 Entire volume, number list
ISSN: 0272-4324 (Print)
In this Issue (7 articles)
1 - 31 |
Thermal plasma technology: Where do we stand and where are we going? Pfender E |
33 - 51 |
Thermophoretic force on a small particle suspended in a plasma with a combined specular and diffuse reflection at the particle surface Chen X |
53 - 67 |
Investigation of the chemical action of the gliding and "point" arcs between the metallic electrode and aqueous solution Janca J, Kuzmin S, Maximov A, Titova J, Czernichowski A |
69 - 89 |
Influence of the electromagnetic forces on momentum and heat transfer in a 3-phase ac plasma reactor Ravary B, Fulcheri L, Bakken JA, Flamant G, Fabry F |
91 - 109 |
Coherent anti-Stokes Raman scattering applied to hydrocarbons in a microwave excited process plasma Hadrich S, Pfelzer B, Uhlenbusch J |
111 - 130 |
A new method of the microwave diagnostics for determining the electron density Gundermann S, Winkler R |
131 - 151 |
Oxidation of styrene in a silent discharge plasma Anderson GK, Snyder H, Coogan J |