화학공학소재연구정보센터

Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing, Vol.19, No.1 Entire volume, number list
ISSN: 0272-4324 (Print) 

In this Issue (7 articles)

1 - 31 Thermal plasma technology: Where do we stand and where are we going?
Pfender E
33 - 51 Thermophoretic force on a small particle suspended in a plasma with a combined specular and diffuse reflection at the particle surface
Chen X
53 - 67 Investigation of the chemical action of the gliding and "point" arcs between the metallic electrode and aqueous solution
Janca J, Kuzmin S, Maximov A, Titova J, Czernichowski A
69 - 89 Influence of the electromagnetic forces on momentum and heat transfer in a 3-phase ac plasma reactor
Ravary B, Fulcheri L, Bakken JA, Flamant G, Fabry F
91 - 109 Coherent anti-Stokes Raman scattering applied to hydrocarbons in a microwave excited process plasma
Hadrich S, Pfelzer B, Uhlenbusch J
111 - 130 A new method of the microwave diagnostics for determining the electron density
Gundermann S, Winkler R
131 - 151 Oxidation of styrene in a silent discharge plasma
Anderson GK, Snyder H, Coogan J