Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing, Vol.19, No.2 Entire volume, number list

ISSN: 0272-4324 (Print)

153 - 170	Numerical study of a free-burning argon arc with copper contamination from the anode Menart J, Lin L
171 - 189	Separation of gold from sulfide using a plasma arc fuming process Abdenouri N, Flamant G, Badie JM, Berjoan R, Belghit RA
191 - 216	Synthesis of ozone at atmospheric pressure by a quenched induction-coupled plasma torch Stratton BC, Knight R, Mikkelsen DR, Blutke A, Vavruska J
217 - 227	Deposition of diamond-like carbon film and mass spectrometry measurement in CH4/O-2 RF plasma Tanaka K, Mutsukura N
229 - 239	Iodine- and bromine-based dry etching of LaCaMnO3 Wang JJ, Cho H, Childress JR, Pearton SJ, Sharifi F, Dahmen KH, Gillman ES
241 - 254	Reactions of nonequilibrium oxygen plasmas with liquid olefins Patino P, Sanchez N, Suhr H, Hernandez N
255 - 284	Spatially dependent kinetics of electrons and excited atoms in the column plasma of a He-Xe dc discharge Lange H, Leipold F, Otte M, Pfau S, Uhrlandt D
285 - 298	Direct spectroscopic evidence of the influence of chamber wall condition on oxide etch rate Lee S, Tien YC, Hsu CF
299 - 310	SnOx thin film gas sensors prepared by plasma deposition from tetrabutyltin Zhang Y, Zhou KL, Cao WM, Wen XG
311 - 326	Atmospheric plasma sterilization and deodorization of dielectric surfaces Koulik P, Begounov S, Goloviatinskii S