Plasma Chemistry and Plasma Processing
Plasma Chemistry and Plasma Processing, Vol.20, No.2 Entire volume, number list
ISSN: 0272-4324 (Print)
In this Issue (7 articles)
| 165 - 181 |
Reduction of chemical reactions in nitrogen and nitrogen-hydrogen plasma jets flowing into atmospheric air Park JH, Pfender E, Chang CH |
| 183 - 207 |
Numerical modeling of a He-N-2 capillary surface wave discharge at atmospheric pressure Petrov GM, Matte JP, Peres I, Margot J, Sadi T, Hubert J, Tran KC, Alves LL, Loureiro J, Ferreira CM, Guerra V, Gousset G |
| 209 - 224 |
Use of liquid precursors for diamond chemical vapor deposition - The effects of mass transport and oxygen Asmann M, Heberlein J, Pfender E |
| 225 - 233 |
By-products NOx control and performance improvement of a packed-bed nonthermal plasma reactor Xia JF, Gao XX, Kong JY, Hui HX, Cui M, Yan KP |
| 235 - 258 |
Chemical kinetics database and predictive schemes for humid air plasma chemistry. Part I: Positive ion-molecule reactions Sieck LW, Herron JT, Green DS |
| 259 - 275 |
Hydrogen isotope exchange reactions in an electrical discharge Kim HJ, Park YD, Lee WM |
| 277 - 278 |
Obituary for Professor Heinz Maecker Pfender E, Veprek S |