화학공학소재연구정보센터

Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing, Vol.26, No.2 Entire volume, number list
ISSN: 0272-4324 (Print) 

In this Issue (8 articles)

103 - 117 An iron catalytic probe for determination of the O-atom density in an Ar/O-2 afterglow
Mozetic M, Vesel A, Cvelbar U, Ricard A
119 - 126 Surface energy and wettability of plasma-treated polyacrylonitrile fibers
Yan CL, Lu DN
127 - 135 A study of two-dimensional microdischarge pattern formation in dielectric barrier discharges
Chirokov A, Gutsol A, Fridman A, Sieber KD, Grace JM, Robinson KS
137 - 148 Pulsed-spray radiofrequency plasma enhanced chemical vapor deposition of CuInS2 thin films
Rodriguez RG, Pulsipher DJV, Lau LD, Shurdha E, Pak JJ, Jin MH, Banger KK, Hepp AF
149 - 175 Comparative study of plasma spray flow fields and particle behavior near to flat inclined substrates
Kang CW, Ng HW, Yu SCM
177 - 186 Removal of SO2 from gas streams by oxidation using plasma-generated hydroxyl radicals
Bai MD, Zhang ZT, Bai MD, Yi CW, Bai XY
187 - 196 Evaluation of multiple corona reactor modes and the application in odor removal
Shi Y, Ruan JJ, Wang X, Li W, Tan TE
197 - 203 Influence of the plasma chemistry on the composition of ZrOx and NbOx thin films deposited by reactive magnetron sputtering
Mraz S, Schneider JM