Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing, Vol.31, No.2 Entire volume, number list

ISSN: 0272-4324 (Print)

In this Issue (11 articles)

251 - 256	Thin Film Growth of Germanium Selenides from PECVD of GeCl4 and Dimethyl Selenide Whitham PJ, Strommen DP, Lau LD, Rodriguez RG
259 - 271	A Comparative Study of HBr-Ar and HBr-Cl-2 Plasma Chemistries for Dry Etch Applications Efremov A, Kim Y, Lee HW, Kwon KH
273 - 290	Ethylene Epoxidation over Alumina- and Silica-Supported Silver Catalysts in Low-Temperature AC Dielectric Barrier Discharge Suttikul T, Sreethawong T, Sekiguchi H, Chavadej S
291 - 306	Oxidative Conversion of Hexane to Olefins-Influence of Plasma and Catalyst on Reaction Pathways Boyadjian C, Agiral A, Gardeniers JGE, Lefferts L, Seshan K
307 - 314	Principal Limitations in Homogeneous Gas Phase Chemistry in Non-Thermal Plasmas Holzer F, Kohler R, Roland U, Stelter E, Kopinke FD
315 - 325	Carbon Dioxide Reforming of Methane Using a Dielectric Barrier Discharge Reactor: Effect of Helium Dilution and Kinetic Model Goujard V, Tatibouet JM, Batiot-Dupeyrat C
327 - 335	Methane Decomposition Leading to Deposit Formation in a DC Positive CH4-N-2 Corona Discharge Horvath G, Zahoran M, Mason NJ, Matejcik S
337 - 352	Formation and Excitation of CN Molecules in He-CO-N-2-O-2 Discharge Plasmas Grigorian G, Cenian A
353 - 372	Atmospheric Pressure Plasma Discharge for Polysiloxane Thin Films Deposition and Comparison with Low Pressure Process Siliprandi RA, Zanini S, Grimoldi E, Fumagalli FS, Barni R, Riccardi C
373 - 392	Modeling on the Momentum and Heat/Mass Transfer Characteristics of an Argon Plasma Jet Issuing into Air Surroundings and Interacting with a Counter-Injected Argon Jet Wang HX, Chen X, Li HP
393 - 403	Carbon Nano-Flakes Produced by an Inductively Coupled Thermal Plasma System for Catalyst Applications Pristavita R, Meunier JL, Berk D