화학공학소재연구정보센터

Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing, Vol.33, No.2 Entire volume, number list
ISSN: 0272-4324 (Print) 

In this Issue (8 articles)

433 - 451 Superhigh-Rate Epitaxial Silicon Thick Film Deposition from Trichlorosilane by Mesoplasma Chemical Vapor Deposition
Wu SD, Kambara M, Yoshida T
453 - 466 Dry Reforming of Methane by DC Spark Discharge with a Rotating Electrode
Moshrefi MM, Rashidi F, Bozorgzadeh HR, Haghighi ME
467 - 477 Pulsed Discharge Regeneration of Diesel Particulate Filters
Graupner K, Binner J, Fox N, Garner CP, Harry JE, Hoare D, Ladha KS, Mason A, Williams AM
479 - 490 Designing Atmospheric-Pressure Plasma Sources for Surface Engineering of Nanomaterials
Yan W, Han ZJ, Liu WZ, Lu XP, Phung BT, Ostrikov K
491 - 515 3D Unsteady State MHD Modeling of a 3-Phase AC Hot Graphite Electrodes Plasma Torch
Rehmet C, Rohani V, Cauneau F, Fulcheri L
517 - 526 Cathode Erosion due to Evaporation in Plasma Arc Cutting Systems
Nemchinsky V
527 - 538 Etching Characteristics and Mechanisms of Mo and Al2O3 Thin Films in O-2/Cl-2/Ar Inductively Coupled Plasmas: Effect of Gas Mixing Ratios
Kang S, Efremov A, Yun SJ, Son J, Kwon KH
539 - 551 1,3-Butadiene as an Adhesion Promoter Between Composite Resin and Dental Ceramic in a Dielectric Barrier Discharge Jet
Han GJ, Chung SN, Chun BH, Kim CK, Oh KH, Cho BH