433 - 451 |
Superhigh-Rate Epitaxial Silicon Thick Film Deposition from Trichlorosilane by Mesoplasma Chemical Vapor Deposition Wu SD, Kambara M, Yoshida T |
453 - 466 |
Dry Reforming of Methane by DC Spark Discharge with a Rotating Electrode Moshrefi MM, Rashidi F, Bozorgzadeh HR, Haghighi ME |
467 - 477 |
Pulsed Discharge Regeneration of Diesel Particulate Filters Graupner K, Binner J, Fox N, Garner CP, Harry JE, Hoare D, Ladha KS, Mason A, Williams AM |
479 - 490 |
Designing Atmospheric-Pressure Plasma Sources for Surface Engineering of Nanomaterials Yan W, Han ZJ, Liu WZ, Lu XP, Phung BT, Ostrikov K |
491 - 515 |
3D Unsteady State MHD Modeling of a 3-Phase AC Hot Graphite Electrodes Plasma Torch Rehmet C, Rohani V, Cauneau F, Fulcheri L |
517 - 526 |
Cathode Erosion due to Evaporation in Plasma Arc Cutting Systems Nemchinsky V |
527 - 538 |
Etching Characteristics and Mechanisms of Mo and Al2O3 Thin Films in O-2/Cl-2/Ar Inductively Coupled Plasmas: Effect of Gas Mixing Ratios Kang S, Efremov A, Yun SJ, Son J, Kwon KH |
539 - 551 |
1,3-Butadiene as an Adhesion Promoter Between Composite Resin and Dental Ceramic in a Dielectric Barrier Discharge Jet Han GJ, Chung SN, Chun BH, Kim CK, Oh KH, Cho BH |