화학공학소재연구정보센터

Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing, Vol.37, No.2 Entire volume, number list
ISSN: 0272-4324 (Print) 

In this Issue (10 articles)

341 - 370 Non-equilibrium Modeling of Tungsten-Inert Gas Arcs
Baeva M
371 - 382 Direct Observation of Anode Arc Root Behaviors in a Non-transferred Arc Plasma Device with Multiple Cathodes
Wang C, Zhang ZL, Xia WL, Cui HC, Xia WD
383 - 399 Effects of Arc Discharge Mode on the Efficiency of Biogas Reforming in an AC-Pulsed Arc Plasma System
Chung WJ, Park HW, Park DW
401 - 413 Surface Treatment of Human Hard Dental Tissues with Atmospheric Pressure Plasma Jet
Santak V, Vesel A, Zaplotnik R, Biscan M, Milosevic S
415 - 431 Bactericidal Effects of Plasma Induced Reactive Species in Dielectric Barrier Gas-Liquid Discharge
Zhang ZL, Xu ZM, Cheng C, Wei J, Lan Y, Ni GH, Sun Q, Qian SL, Zhang H, Xia WD, Shen J, Meng YD, Chu PK
433 - 450 In-Situ Non-intrusive Diagnostics of Toluene Removal by a Gliding Arc Discharge Using Planar Laser-Induced Fluorescence
Gao JL, Zhu JJ, Ehn A, Alden M, Li ZS
451 - 464 Influence of PM Size Distribution and Ingredients on DPF Regeneration by Non-thermal Plasma Technology
Shi YX, Cai YX, Wang J, Pu XY, Gu LB
465 - 474 Surface Processing of Polyester Canvas using Atmospheric Pressure Air Glow Discharge Plasma
Liu WZ, Chen XZ, Lei X, Bian HH, Wang YQ
475 - 487 Partitioned Operation Method for Reactive Oxygen Species Reactor Array at Atmospheric Pressure
Yu Z, Zhang ZT, Xu SJ, Zhang YG, Liu P, Tian YP
489 - 509 On the Etching Mechanisms of SiC Thin Films in CF4/CH2F2/N-2/Ar Inductively Coupled Plasma
Lee J, Efremov A, Kim K, Kwon KH