화학공학소재연구정보센터

Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing, Vol.38, No.2 Entire volume, number list
ISSN: 0272-4324 (Print) 

In this Issue (11 articles)

293 - 310 A Direct Fourier Transform Infrared Spectroscopic Comparison of the Plasma- and Thermally-Driven Reaction of CO2 at Macor
Christensen PA, Ali AB, Mashhadani ZTAW, Martin PA
311 - 329 CN (B I-2 Sigma(+) -> X I-2 Sigma(+)) Violet System in a Cold Atmospheric-Pressure Argon Plasma Jet
Ridenti MA, Amorim J
331 - 345 Removal of Toluene from Industrial Gas by Adsorption-Plasma Catalytic Process: Comparison of Closed Discharge and Ventilated Discharge
Yi HH, Yang X, Tang XL, Zhao SZ, Huang YH, Cui XX, Feng TC, Ma YQ
347 - 354 Indirect Synthesis System for Ammonia from Nitrogen and Water Using Nonthermal Plasma Under Ambient Conditions
Zen SG, Abe T, Teramoto Y
355 - 364 Influence of Duty Cycle on Ozone Generation and Discharge Using Volume Dielectric Barrier Discharge
Wei LS, Pongrac B, Zhang YF, Liang X, Prukner V, Simek M
365 - 378 The Processing of Pyrolysis Fuel Oil by Dielectric Barrier Discharge Plasma Torch
Khosravi A, Khani MR, Goy ED, Shokri B
379 - 395 Characterization of High Voltage Cold Atmospheric Plasma Generation in Sealed Packages as a Function of Container Material and Fill Gas
Brayfield RS, Jassem A, Lauria MV, Fairbanks AJ, Keener KM, Garner AL
397 - 414 Study on the Influence of Nitrogen Plasma on Dyeing Properties of Rex Rabbit Fibers
Liu FM, Liu HY, Su T, Zhang ZC, Li LX
415 - 428 Physico-Chemical Processes Induced by Electrical Breakdown and Discharge Responsible for Memory Effect in Krypton with < 10 ppm Nitrogen
Pejovic MM, Pejovic MM, Stankovic K
429 - 441 Thermal Conductivity of Nanocomposites Based in High Density Polyethylene and Surface Modified Hexagonal Boron Nitride via Cold Ethylene Plasma
Borjas-Ramos JJ, Ramos-de-Valle LF, Neira-Velazquez MG, Hernandez-Hernandez E, Saucedo-Salazar EM, Soria-Arguello G
443 - 459 Non-linear Compensated Dwell Time for Efficient Fused Silica Surface Figuring Using Inductively Coupled Plasma
Dai ZC, Xie XH, Chen H, Zhou L