| 287 - 300 |
2-Term and Multi-Term Approximation of the Nonstationary Electron Velocity Distribution in an Electric-Field in a Gas
Loffhagen D, Winkler R, Braglia GL |
| 301 - 327 |
A Comparative-Study of CH4 and CF4 RF Discharges Using a Consistent Plasma Physics and Chemistry Simulator
Mantzaris NV, Gogolides E, Boudouvis AG |
| 329 - 340 |
Oxidation of Aromatic-Hydrocarbons with Oxygen in a Radiofrequency Plasma
Tezuka M, Yajima T |
| 341 - 363 |
Plasma-Induced Deposition of Titanium Nitride from TiCl4 in a Direct-Current Glow-Discharge - Control of the Chlorine Content and Gas-Phase Nucleation
Patscheider J, Li SZ, Veprek S |
| 365 - 378 |
Dry-Etching of InGaP and Alinp in CH4/H-2/Ar
Lee JW, Pearton SJ, Santana CJ, Lambers ES, Abernathy CR, Hobson WS, Ren F |
| 379 - 398 |
Numerical-Method and Composition in Multitemperature Plasmas - Application to an Ar-H-2 Mixture
Andre P, Abbaoui M, Lefort A, Parizet MJ |
| 399 - 415 |
Numerical-Analysis of the Behavior of Hydrogen Added into a Free-Burning Arc
Suzuki M, Sato Y, Akatsuka H |
| 417 - 448 |
Laser-Based Characterization of a Flame-Assisted Plasma
Sassi M, Hwang J, Mahalingam S, Daily JW |
| 449 - 460 |
UV Spectroscopy of Metal Volatilization During Thermal Plasma Processing of Waste Glass Melts
Wood JW, Cortez R, Cahill DG, Stephenson LD, Zaghloul HH |
