Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing, Vol.21, No.3 Entire volume, number list

ISSN: 0272-4324 (Print)

301 - 310	Methane conversion to higher hydrocarbons in the presence of carbon dioxide using dielectric-barrier discharge plasmas Liu CJ, Xue BZ, Eliasson B, He F, Li Y, Xu GH
311 - 327	Oxidative conversion of PFC via plasma processing with dielectric barrier discharges Yu SJ, Chang MB
329 - 343	Gas-phase removal of acetaldehyde via packed-bed dielectric barrier discharge reactor Lee HM, Chang MB
345 - 354	Pulsed corona discharge-induced reactions of acetophenone in water Wen YZ, Jiang XZ
355 - 369	Calculation of combined diffusion coefficients from the simplified theory of transport properties Rat V, Aubreton J, Elchinger MF, Fauchais P
371 - 400	Transient response of radio frequency inductively coupled plasma for pulse modulation Paul KC, Mostaghimi J, Ishigaki T, Sakuta T
401 - 420	A proposed process control chart for DC plasma spraying process. Part II. Experimental verification for spraying alumina Ang CB, Devasenapathi A, Ng HW, Yu SCM, Lam YC
421 - 439	Negative electron mobility in attachment-dominated plasmas Dyatko NA, Loffhagen D, Napartovich AP, Winkler R
441 - 457	Pulsed electron-beam ionization of humid air and humid air/toluene mixtures: Time-resolved cationic kinetics and comparisons with predictive models Sieck LW, Buckley TJ, Herron JT, Green DS
459 - 481	Chemical kinetics database and predictive schemes for nonthermal humid air plasma chemistry. Part II. Neutral species reactions Herron JT, Green DS