화학공학소재연구정보센터

Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing, Vol.23, No.3 Entire volume, number list
ISSN: 0272-4324 (Print) 

In this Issue (10 articles)

415 - 437 Spatial transition of the electron gas from the active to the remote plasma state
Loffhagen D, Sigeneger F, Winkler R
439 - 461 Study of the anode region of a DC glow discharge by a spatially one-dimensional hybrid method
Arndt S, Sigeneger F, Winkler R
463 - 488 Abnormal optical emissions in a condensing monosilane-argon gas jet activated by electron beam plasma
Sharafutdinov RG, Khmel SY
489 - 499 Effect of plasma and control parameters on SiC etching in a C2F6 plasma
Kim B, Lee BT
501 - 518 Ozone production in the negative DC corona: The dependence of discharge polarity
Chen JH, Davidson JH
519 - 539 The characteristics of direct hydroxylation of benzene to phenol with molecular oxygen enhanced by pulse DC corona at atmospheric pressure
Lee DW, Lee JH, Chun BH, Lee KY
541 - 558 Abatement of gas-phase p-xylene via dielectric barrier discharges
Lee HM, Chang MB
559 - 568 An ozone generator of miniaturization and modularization with the narrow discharge gap
Zhang ZT, Bao XY, Bai MD, Yang B, Zhou XJ
569 - 583 Studies on oxidants' generation in a foaming column with a needle to dielectric covered plate electrode
Pawlat J, Hayashi N, Ihara S, Yamabe C
585 - 606 Numerical study of a free-burning argon arc with anode melting
Tanaka M, Terasaki H, Ushio M, Lowke JJ