Plasma Chemistry and Plasma Processing
Plasma Chemistry and Plasma Processing, Vol.40, No.3 Entire volume, number list
ISSN: 0272-4324 (Print)
In this Issue (5 articles)
| 641 - 642 |
Special Issue: Papers by Plenary and Invited Lecturers at the 24th International Symposium on Plasma Chemistry (ISPC 24), 9-14 June 2019, Naples, Italy Gherardi M |
| 697 - 712 |
Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure Karwal S, Verheijen MA, Arts K, Faraz T, Kessels WMM, Creatore M |
| 713 - 725 |
Dynamics of Gas Heating in the Afterglow of Pulsed CO2 and CO2-N-2 Glow Discharges at Low Pressure Silva T, Grofulovic M, Terraz L, Pintassilgo CD, Guerra V |
| 749 - 773 |
Transient Spark Discharge Generated in Various N-2/O-2 Gas Mixtures: Reactive Species in the Gas and Water and Their Antibacterial Effects Kucerova K, Machala Z, Hensel K |
| 775 - 794 |
Simulating Turbulent Thermal Plasma Flows for Nanopowder Fabrication Shigeta M |