Plasma Chemistry and Plasma Processing
Plasma Chemistry and Plasma Processing, Vol.14, No.4 Entire volume, number list
ISSN: 0272-4324 (Print)
In this Issue (7 articles)
| 383 - 406 |
Growth-Rate Studies of CVD Diamond in an RF Plasma Torch Baldwin SK, Owano TG, Kruger CH |
| 407 - 423 |
Effect of a Substrate on the Temperature Distribution in an Argon-Hydrogen Thermal Plasma-Jet Lapierre D, Kearney RJ, Vardelle M, Vardelle A, Fauchais P |
| 425 - 436 |
Unsteadiness and Mixing in Thermal Plasma Jets Russ S, Pfender E, Strykowski PJ |
| 437 - 450 |
Volumetric Emission of Argon Plasmas in the Presence of Vapors of Fe, Si, and Al Essoltani A, Proulx P, Boulos MI, Gleizes A |
| 451 - 490 |
Transport-Coefficients of Argon, Nitrogen, Oxygen, Argon-Nitrogen, and Argon-Oxygen Plasmas Murphy AB, Arundell CJ |
| 491 - 504 |
Synergistic Effects of Catalysts and Plasmas on the Synthesis of Ammonia and Hydrazine Tanaka S, Uyama H, Matsumoto O |
| 505 - 522 |
Low-Temperature Dry-Etching of Tungsten, Dielectric, and Trilevel Resist Layers on GaAs Pearton SJ, Abernathy CR, Ren F, Lothian JR, Kopf RF |