Plasma Chemistry and Plasma Processing
Plasma Chemistry and Plasma Processing, Vol.17, No.4 Entire volume, number list
ISSN: 0272-4324 (Print)
In this Issue (6 articles)
| 371 - 391 |
Reactions of No in a Positive Streamer Corona Plasma Tas MA, Vanhardeveld R, Vanveldhuizen EM |
| 393 - 407 |
Spectroscopic Characterization of Ch4+co2 Plasmas Excited by a Dielectric Barrier Discharge at Atmospheric-Pressure Motret O, Pellerin S, Nikravech M, Massereau V, Pouvesle JM |
| 409 - 432 |
Modeling of a DC Plasma Torch in Laminar and Turbulent-Flow Bauchire JM, Gonzalez JJ, Gleizes A |
| 433 - 452 |
LDA Simultaneous Measurements of Local-Density and Velocity Distribution of Particles in Plasma Fluidized-Bed at Atmospheric-Pressure Francke E, Amouroux J |
| 453 - 465 |
Deposition of Gallium Nitride Thin-Films by MOCVD in Microwave Plasma Ihashi N, Itoh K, Matsumoto O |
| 467 - 478 |
Diagnostics of a Radiofrequency Plasma Expanding Through a Nozzle (Petn) at Low-Pressure Avni R, Miralai SF, Prevot F, Morvan D, Amoroux J, Nickel H |