Plasma Chemistry and Plasma Processing
Plasma Chemistry and Plasma Processing, Vol.18, No.4 Entire volume, number list
ISSN: 0272-4324 (Print)
In this Issue (7 articles)
| 429 - 446 |
Experimental and theoretical studies of a pulsed microwave excited Ar/CF4 plasma Baeva M, Luo X, Schafer JH, Uhlenbusch J, Zhang Z |
| 447 - 460 |
Concentrations of active species in the flowing afterglow of a nitrogen microwave plasma Diamy AM, Hochard L, Legrand JC, Ricard A |
| 461 - 485 |
An optical emission study on expanding low-temperature cascade arc plasmas Yu QS, Yasuda HK |
| 487 - 507 |
Parametric study on nitridation and carburization of MoSi2 powders in an induction plasma Fan XB, Ishigaki T |
| 509 - 533 |
Tetrachlorosilane consumption in radio frequency glow discharge Blinov LM, Golovkin AG, Kaganov LI, Oparin VB, Razhavski AA, Shterenberg AM, Volodko VV, Zyn VI |
| 535 - 550 |
Evaluation of energy utilization efficiencies for SO2 and NO removal by pulsed corona discharge process Mok YS, Ham SW, Nam IS |
| 551 - 574 |
Heat generation and particle injection in a thermal plasma torch Vardelle A, Fauchais P, Dussoubs B, Themelis NJ |