Plasma Chemistry and Plasma Processing
Plasma Chemistry and Plasma Processing, Vol.19, No.4 Entire volume, number list
ISSN: 0272-4324 (Print)
In this Issue (6 articles)
| 445 - 466 |
CARS diagnostic and modeling of a dielectric barrier discharge Baeva M, Dogan A, Ehlbeck J, Pott A, Uhlenbusch J |
| 467 - 486 |
Calculated plasma parameters and excitation spectra of high-pressure helium discharges Peres I, Alves LL, Margot J, Sadi T, Ferreira CM, Tran KC, Hubert J |
| 487 - 504 |
Comparisons between numerical model and experiments for a direct current plasma flow Aithal SM, Subramaniam VV, Babu V |
| 505 - 512 |
The CO2 reforming of natural gas in a pulsed corona discharge reactor Malik MA, Jiang XZ |
| 513 - 544 |
Supersonic pulse, plasma sampling mass spectrometry: Theory and practice Gaddy GA, Webb SF, Blumenthal R |
| 545 - 563 |
Etching of silicon nitride in CCl2F2, CHF3, SiF4, and SF6 reactive plasma: A comparative study Pant BD, Tandon US |