Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing, Vol.27, No.4 Entire volume, number list

ISSN: 0272-4324 (Print)

In this Issue (11 articles)

349 - 358	MgO erosion profile in the high pressure coplanar discharge Lee SM, Yang SS, Seo YS, Lee JK
359 - 380	Effect of cathode nozzle geometry and process parameters on the energy distribution for an argon transferred arc Bini R, Monno M, Boulos MI
381 - 403	Transport coefficients of Ag-SiO2 plasmas Andre P, Bussiere W, Rochette D
404 - 413	Density of O-atoms in an afterglow reactor during treatment of wool Canal C, Gaboriau F, Ricard A, Mozetic M, Cvelbar U, Drenik A
414 - 445	Effect of propene, n-Decane, and toluene plasma kinetics on NO conversion in homogeneous oxygen-rich dry mixtures at ambient temperature Lombardi G, Blin-Simiand N, Jorand F, Magne L, Pasquiers S, Postel C, Vacher JR
446 - 457	Polyethylene glycol grafting on polypropylene membranes for anti-fouling properties Zanini S, Muller M, Riccardi C, Orlandi M
458 - 472	Investigation of the formation and energy density of high-current pulsed electron beams Daichi Y, Wang ZG, Yamazaki K, Sano S
473 - 485	Pump effect of a capillary discharge in electrically conductive liquids De Baerdemaeker F, Simek M, Leys C, Verstraete W
486 - 495	Kinetics and mechanism of the organic degradation in aqueous solution irradiated with gaseous plasma Tomizawa S, Tezuka M
496 - 503	One-step hydroxylation of benzene to phenol induced by glow discharge plasma in an aqueous solution Liu YJ, Jiang XZ, Wang L
504 - 515	Efficient degradation of nitrobenzene induced by glow discharge plasma in aqueous solution Wang L, Jiang XZ, Liu YJ