1393 - 1415 |
The Role of Interfacial Reactions in Determining Plasma-Liquid Chemistry Anderson CE, Cha NR, Lindsay AD, Clark DS, Graves DB |
1417 - 1430 |
Plasma Treated Sepiolite: A New Adsorbent for Removal of Malachite Green from Contaminated Water Kaya M, Dilekoglu MF, Sahin O, Saka C |
1431 - 1448 |
Molecular-Level Reinforced Adhesion Between Rubber and PTFE Film Treated by Atmospheric Plasma Polymerization Okubo M, Onji T, Kuroki T, Nakano H, Yao E, Tahara M |
1449 - 1469 |
Plasma Chemical Functionalisation of a Cameroonian Kaolinite Clay for a Greater Hydrophilicity Tamo BS, Kamgang-Youbi G, Acayanka E, Simo LM, Tiya-Djowe A, Kuete-Saa D, Laminsi S, Tchadjie L |
1471 - 1484 |
Synthesis of Mixed-Phase TiO2 Nanopowders Using Atmospheric Pressure Plasma Jet Driven by Dual-Frequency Power Sources Wang Y, Yuan QH, Yin GQ, Zhang Y, Zhang YD, Li Y, Li JJ, Wang T, Ma SY |
1485 - 1499 |
MnOx/TiO2 Catalysts for VOCs Abatement by Coupling Non-thermal Plasma and Photocatalysis Aouadi I, Tatibouet JM, Bergaoui L |
1501 - 1515 |
Abatement of Gaseous Xylene Using Double Dielectric Barrier Discharge Plasma with In Situ UV Light: Operating Parameters and Byproduct Analysis Shi Y, Shao ZH, Shou TY, Tian RB, Jiang JQ, He Y |
1517 - 1531 |
Application of Flying Jet Plasma for Production of Biodiesel Fuel from Wasted Vegetable Oil Abdul-Majeed WS, AAl-Thani GS, Al-Sabahi JN |
1533 - 1543 |
Decomposition of Benzene Using a Pulse-Modulated DBD Plasma Ma TP, Jiang HD, Liu JQ, Zhong FC |
1545 - 1558 |
Simultaneous Removal of H2S and Dust in the Tail Gas by DC Corona Plasma Wang XQ, Xu K, Ma YX, Ning P, Cheng C, Wang LL, Cheng JH |
1559 - 1570 |
Comparison of the Active Species in the RF and Microwave Flowing Discharges of N-2 and Ar-20 %N-2 Ricard A, Sarrette JP, Oh SG, Kim YK |
1571 - 1588 |
Etching Characteristics and Mechanisms of TiO2 Thin Films in CF4 + Ar, Cl-2 + Ar and HBr plus Ar Inductively Coupled Plasmas Lee J, Efremov A, Lee BJ, Kwon KH |
1589 - 1601 |
Effects of Pressure and Electrode Length on the Abatement of N2O and CF4 in a Low-Pressure Plasma Reactor Hur M, Lee JO, Lee JY, Kang WS, Song YH |