화학공학소재연구정보센터

Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing, Vol.36, No.6 Entire volume, number list
ISSN: 0272-4324 (Print) 

In this Issue (13 articles)

1393 - 1415 The Role of Interfacial Reactions in Determining Plasma-Liquid Chemistry
Anderson CE, Cha NR, Lindsay AD, Clark DS, Graves DB
1417 - 1430 Plasma Treated Sepiolite: A New Adsorbent for Removal of Malachite Green from Contaminated Water
Kaya M, Dilekoglu MF, Sahin O, Saka C
1431 - 1448 Molecular-Level Reinforced Adhesion Between Rubber and PTFE Film Treated by Atmospheric Plasma Polymerization
Okubo M, Onji T, Kuroki T, Nakano H, Yao E, Tahara M
1449 - 1469 Plasma Chemical Functionalisation of a Cameroonian Kaolinite Clay for a Greater Hydrophilicity
Tamo BS, Kamgang-Youbi G, Acayanka E, Simo LM, Tiya-Djowe A, Kuete-Saa D, Laminsi S, Tchadjie L
1471 - 1484 Synthesis of Mixed-Phase TiO2 Nanopowders Using Atmospheric Pressure Plasma Jet Driven by Dual-Frequency Power Sources
Wang Y, Yuan QH, Yin GQ, Zhang Y, Zhang YD, Li Y, Li JJ, Wang T, Ma SY
1485 - 1499 MnOx/TiO2 Catalysts for VOCs Abatement by Coupling Non-thermal Plasma and Photocatalysis
Aouadi I, Tatibouet JM, Bergaoui L
1501 - 1515 Abatement of Gaseous Xylene Using Double Dielectric Barrier Discharge Plasma with In Situ UV Light: Operating Parameters and Byproduct Analysis
Shi Y, Shao ZH, Shou TY, Tian RB, Jiang JQ, He Y
1517 - 1531 Application of Flying Jet Plasma for Production of Biodiesel Fuel from Wasted Vegetable Oil
Abdul-Majeed WS, AAl-Thani GS, Al-Sabahi JN
1533 - 1543 Decomposition of Benzene Using a Pulse-Modulated DBD Plasma
Ma TP, Jiang HD, Liu JQ, Zhong FC
1545 - 1558 Simultaneous Removal of H2S and Dust in the Tail Gas by DC Corona Plasma
Wang XQ, Xu K, Ma YX, Ning P, Cheng C, Wang LL, Cheng JH
1559 - 1570 Comparison of the Active Species in the RF and Microwave Flowing Discharges of N-2 and Ar-20 %N-2
Ricard A, Sarrette JP, Oh SG, Kim YK
1571 - 1588 Etching Characteristics and Mechanisms of TiO2 Thin Films in CF4 + Ar, Cl-2 + Ar and HBr plus Ar Inductively Coupled Plasmas
Lee J, Efremov A, Lee BJ, Kwon KH
1589 - 1601 Effects of Pressure and Electrode Length on the Abatement of N2O and CF4 in a Low-Pressure Plasma Reactor
Hur M, Lee JO, Lee JY, Kang WS, Song YH