화학공학소재연구정보센터

Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing, Vol.39, No.6 Entire volume, number list
ISSN: 0272-4324 (Print) 

In this Issue (12 articles)

1359 - 1378 Unified Non-equilibrium Modelling of Tungsten-Inert Gas Microarcs in Atmospheric Pressure Argon
Baeva M, Loffhagen D, Uhrlandt D
1379 - 1396 Effects of Buffer Gases on Plasma Properties and Arc Decaying Characteristics of C4F7N-N-2 and C4F7N-CO2 Arc Plasmas
Zhong LL, Wang JY, Xu J, Wang XH, Rong MZ
1397 - 1411 Thermal Plasma Synthesis of Zirconia Powder and Preparation of Premixed Ca-Doped Zirconia
Iovane P, Borriello C, Portofino S, Del Mauro AD, Magnani G, Minarini C, Galvagno S
1413 - 1427 Detection of Nutrition and Toxic Elements in Dry Milk Powders Available in Pakistan Using Laser Induced Breakdown Spectroscopy
Rehan I, Khan MZ, Rehan K, Sultana S, Muhammad R, Rehman MU
1429 - 1447 Application of Calibration-Free Boltzmann Plot Method for Composition and Pressure Measurement in Argon Free-Burning Arcs
Zhang HT, Wu Y, Sun H, Yang F, Rong MZ, Jiang FF, Wang CL, Huang W
1449 - 1468 Plasma Induced Addition of Active Functional Groups to Biochar for Elemental Mercury Removal
Zhang HC, Wang T, Sui ZF, Zhang YS, Norris P, Sun BM, Pan WP
1469 - 1482 The Roles of Various Plasma Active Species in Toluene Degradation by Non-thermal Plasma and Plasma Catalysis
Song H, Peng YE, Liu S, Bai SP, Hong XW, Li JH
1483 - 1498 Characterization of Various Air Plasma Discharge Modes in Contact with Water and Their Effect on the Degradation of Reactive Dyes
Diamond J, Profili J, Hamdan A
1499 - 1517 Enhancement of Poly(vinyl chloride) Electrolyte Membrane by Its Exposure to an Atmospheric Dielectric Barrier Discharge Followed by Grafting with Polyacrylic Acid
Abu-Saied M, Fahmy A, Morgan N, Qutop W, Abdelbary H, Friedrich JF
1519 - 1532 Features of the Current Sustainment in a Low-Current Discharge in Airflow
Korolev YD, Nekhoroshev VO, Frants OB, Landl NV, Suslov AI, Bolotov AV
1533 - 1558 Interaction of CH4 with Electronically Excited O-2: Ab Initio Potential Energy Surfaces and Reaction Kinetics
Pelevkin AV, Sharipov AS
1559 - 1573 Ab Initio Chemical Kinetics for the Thermal Decomposition of SiH2+ and SiH3+ Ions and Related Reverse Ion-Molecule Reactions of Interest to PECVD of alpha-Si:H Films
Nguyen TN, Lee YM, Wu JS, Lin MC