1359 - 1378 |
Unified Non-equilibrium Modelling of Tungsten-Inert Gas Microarcs in Atmospheric Pressure Argon Baeva M, Loffhagen D, Uhrlandt D |
1379 - 1396 |
Effects of Buffer Gases on Plasma Properties and Arc Decaying Characteristics of C4F7N-N-2 and C4F7N-CO2 Arc Plasmas Zhong LL, Wang JY, Xu J, Wang XH, Rong MZ |
1397 - 1411 |
Thermal Plasma Synthesis of Zirconia Powder and Preparation of Premixed Ca-Doped Zirconia Iovane P, Borriello C, Portofino S, Del Mauro AD, Magnani G, Minarini C, Galvagno S |
1413 - 1427 |
Detection of Nutrition and Toxic Elements in Dry Milk Powders Available in Pakistan Using Laser Induced Breakdown Spectroscopy Rehan I, Khan MZ, Rehan K, Sultana S, Muhammad R, Rehman MU |
1429 - 1447 |
Application of Calibration-Free Boltzmann Plot Method for Composition and Pressure Measurement in Argon Free-Burning Arcs Zhang HT, Wu Y, Sun H, Yang F, Rong MZ, Jiang FF, Wang CL, Huang W |
1449 - 1468 |
Plasma Induced Addition of Active Functional Groups to Biochar for Elemental Mercury Removal Zhang HC, Wang T, Sui ZF, Zhang YS, Norris P, Sun BM, Pan WP |
1469 - 1482 |
The Roles of Various Plasma Active Species in Toluene Degradation by Non-thermal Plasma and Plasma Catalysis Song H, Peng YE, Liu S, Bai SP, Hong XW, Li JH |
1483 - 1498 |
Characterization of Various Air Plasma Discharge Modes in Contact with Water and Their Effect on the Degradation of Reactive Dyes Diamond J, Profili J, Hamdan A |
1499 - 1517 |
Enhancement of Poly(vinyl chloride) Electrolyte Membrane by Its Exposure to an Atmospheric Dielectric Barrier Discharge Followed by Grafting with Polyacrylic Acid Abu-Saied M, Fahmy A, Morgan N, Qutop W, Abdelbary H, Friedrich JF |
1519 - 1532 |
Features of the Current Sustainment in a Low-Current Discharge in Airflow Korolev YD, Nekhoroshev VO, Frants OB, Landl NV, Suslov AI, Bolotov AV |
1533 - 1558 |
Interaction of CH4 with Electronically Excited O-2: Ab Initio Potential Energy Surfaces and Reaction Kinetics Pelevkin AV, Sharipov AS |
1559 - 1573 |
Ab Initio Chemical Kinetics for the Thermal Decomposition of SiH2+ and SiH3+ Ions and Related Reverse Ion-Molecule Reactions of Interest to PECVD of alpha-Si:H Films Nguyen TN, Lee YM, Wu JS, Lin MC |