1 - 7 |
Preparation and characterization of gold and ruthenium colloids in thin zinc oxide films Bozlee BJ, Exarhos GJ |
8 - 13 |
Optical properties of Li+ doped electrochromic WO3 thin films Porqueras I, Bertran E |
14 - 20 |
Reflection enhancement of aluminum strips by EB-PVD in highly productive industrial lines Reinhold E, Richter J, Waydbrink H, Zschieschang E |
21 - 26 |
Low-temperature deposition of optical coatings using ion assistance Niederwald H |
27 - 31 |
Optical and structural properties of highly c-axis oriented aluminum nitride prepared by sputter-deposition in pure nitrogen Drusedau TP, Blasing J |
32 - 36 |
Study of ZrO2-Y2O3 films prepared by rf magnetron reactive sputtering Gao PT, Meng LJ, dos Santos MP, Teixeira V, Andritschky M |
37 - 42 |
Influence of process parameters on the structure and the properties of ZrO2 coatings deposited by reactive pulsed magnetron sputtering (PMS) Goedicke K, Liebig JS, Zywitzki O, Sahm H |
43 - 47 |
Real time control of reactive magnetron-sputter deposited optical filters by in situ spectroscopic ellipsometry Vergohl M, Malkomes N, Matthee T, Brauer G |
48 - 56 |
Ellipsometry on thin organic layers of biological interest: characterization and applications Arwin H |
57 - 61 |
Infrared ellipsometric study of SiO2 films: relationship between LO mode frequency and porosity Brunet-Bruneau A, Fisson S, Gallas B, Vuye G, Rivory J |
62 - 67 |
Ellipsometric investigation of the Si/SiO2 interface formation for application to highly reflective dielectric mirrors Gallas B, Fisson S, Brunet-Bruneau A, Vuye G, Rivory J |
68 - 73 |
Characterization of thin-film amorphous semiconductors using spectroscopic ellipsometry Jellison GE, Merkulov VI, Puretzky AA, Geohegan DB, Eres G, Lowndes DH, Caughman JB |
74 - 80 |
ZnO film formation using a steered and shielded reactive vacuum arc deposition Takikawa H, Kimura K, Miyano R, Sakakibara T |
81 - 86 |
Low temperature deposition of ITO thin films by ion beam sputtering Kim D, Han Y, Cho JS, Koh SK |
87 - 91 |
Si doped SiO2 glass light emitter within an optical cavity fabricated by ion beam sputter-deposition Ichinohe T, Kenmochi D, Morisaki H, Masaki S, Kawasaki K |
92 - 96 |
Low-temperature deposition of optical films by oxygen radical beam-assisted evaporation Yamada Y, Harada T, Uyama H, Murata T, Nozoye H |
97 - 102 |
Optical properties of Au nanocluster embedded dielectric films Cho S, Lee S, Oh SG, Park SJ, Kim WM, Cheong BK, Chung M, Song KB, Lee TS, Kim SG |
XV - XV |
Proceedings of the 27(th) International Conference on Metallurgic Coatings and Thin Films, San Diego, California, April 10-14, 2000. Preface Sartwell BD, Mitterer C, Wahl KJ, Pique A |
103 - 108 |
Effects of oxygen radical on the properties of indium tin oxide thin films deposited at room temperature by oxygen ion beam assisted evaporation Kim JS, Bae JW, Kim HJ, Lee NE, Yeom GY, Oh KH |
109 - 114 |
Improvement of hardness in plasma polymerized hexamethyldisiloxane coatings by silica-like surface modification Benitez F, Martinez E, Esteve J |
115 - 121 |
Electrical, optical, and structural characteristics of ITO thin films by krypton and oxygen dual ion-beam assisted evaporation at room temperature Kim HJ, Bae JW, Kim JS, Kim KS, Jang YC, Yeom GY, Lee NE |
122 - 128 |
The interface formation and adhesion of metals (Cu, Ta, and Ti) and low dielectric constant polymer-like organic thin films deposited by plasma-enhanced chemical vapor deposition using para-xylene precursor Kim KS, Jang YC, Kim HJ, Quan YC, Choi J, Jung D, Lee NE |
129 - 133 |
Efficiency of Li doping on electrochromic WO3 thin films Porqueras I, Bertran E |
134 - 137 |
Development of large diameter radical beam sources Murata T, Matsumoto S, Song Y, Yamada Y, Nozoye H |
138 - 147 |
Nanoindentation and FEM study of the effect of internal stress on micro/nano mechanical property of thin CNx films Bai MW, Kato K, Umehara N, Miyake Y |
148 - 155 |
Investigation of the thermal stability of nitrogen-rich amorphous carbon nitride films Kulisch W, Popov C, Zambov L, Bulir J, Delplancke-Ogletree MP, Lancok J, Jelinek M |
156 - 162 |
Optical, electrical and mechanical properties of nitrogen-rich carbon nitride films deposited by inductively coupled plasma chemical vapor deposition Popov C, Zambov LM, Plass MF, Kulisch W |
163 - 169 |
Morphology of crystalline nitrogenated carbon films prepared by HF-CVD Kurt R, Karimi A |
170 - 176 |
A concept for the deposition of adherent cubic boron nitride films Kulisch W, Freudenstein R, Klett A, Plass MF |
177 - 181 |
Hydrogenated nanocrystalline silicon carbide films synthesized by ECR-CVD and its intense visible photoluminescence at room temperature Yu MB, Rusli, Yoon SF, Xu SJ, Chew K, Cui J, Ahn J, Zhang Q |
182 - 187 |
Effects of the addition of helium on the synthesis of diamond films Baranauskas V, Ceragioli HJ, Peterlevitz AC, Tosin MC, Durrant SF |
188 - 192 |
Deposition of undoped and doped textured diamond layers Bartsch K, Waidmann S, Arnold B, Oswald S, Schlafer D, Leonhardt A, Summchen L |
193 - 197 |
A comparison study of diamond adhesion on ductile metals Ali N, Fan QH, Gracio J, Pereira E, Ahmed W |
198 - 202 |
Effects on the deposition and mechanical properties of diamond-like carbon film using different inert gases in methane plasma Sun Z, Lin CH, Lee YL, Shi JR, Tay BK, Shi X |
203 - 207 |
An amorphous hydrocarbon diamond-like polymer as a precursor for diamond growth Sun Z, Sun Y, Wilson SR |
208 - 213 |
Optimising diamond nucleation via combined pre-treatments Ali N, Ahmed W, Fan QH, Rego CA |
214 - 216 |
The electron emissions from nitrogen doped diamond film (effects of defects) Show Y, Matsukawa T, Ito H, Iwase M, Izumi T |
217 - 221 |
Erosion damage and optical transmittance of diamond films Lim DS, Kim JH |
222 - 232 |
Mechanical properties and microstructure of TiC/amorphous hydrocarbon nanocomposite coatings Meng WJ, Tittsworth RC, Rehn LE |
233 - 238 |
Application of diamond-like carbon films to spacer tools for electron guns of cathode ray tube (CRT) Jun Y, Choi JY, Lee KR, Jeong BK, Kwon SK, Hwang CH |
239 - 242 |
Comparison between acid leaching and siliciding pre-treatments on the erosive wear performance of diamond coatings on cemented carbide substrates Dowling DP, Donnelly K, Flood RV, McConnell M, Morgan G |
243 - 248 |
Characterization of ultra-hard silicon carbide coatings deposited by RF magnetron sputtering Costa AK, Camargo SS, Achete CA, Carius R |
249 - 253 |
Properties and durability of thin a-C : H overcoats produced by plasma enhanced chemical vapor deposition Wu ML, Howard K, Grannen K, Gui J, Rauch GC, Sides PJ |
254 - 260 |
Friction and wear properties of DLC-coated plasma nitrided steel in unidirectional and reciprocating sliding Podgornik B, Vizintin J, Ronkainen H, Holmberg K |
261 - 268 |
Design of W buffer layer for adhesion improvement of DLC films on tool steels Lee KR, Eun KY, Kim I, Kim J |
269 - 273 |
Effect of heavy ion implantation on the properties of tetrahedral amorphous carbon film Shi JR, Sun Z, Shi X, Lau SP, Tay BK, Pelzl J |
274 - 279 |
Diamond synthesis via C-H metal precursors processed in hot filament chemical vapor deposition and microwave plasma chemical vapor deposition Wong MS, Lu CA, Chang HK, Yang TS, Wu JH, Liou Y |
280 - 284 |
Hydrogen-containing carbon nitride films produced by the combined hot filament-plasma CVD technique Wang JJ, de Moraes MAB, Baranauskas V, Durrant SF |
285 - 289 |
Fidelity of diamond replicas on silicon substrate Passaro AMP, Salvadori MC, Martins DR, Cattani M |
290 - 294 |
Synthesis and evaluation of high-quality homoepitaxial diamond made by the combustion flame method Takeuchi S, Murakawa M |
295 - 298 |
Fabrication of diamond nano-whiskers Baik ES, Baik YJ, Lee SW, Jeon D |
299 - 302 |
Control of diamond micro-tip geometry for field emitter Baik ES, Baik YJ, Jeon D |
303 - 308 |
Effects of argon dilution of an ethanol/hydrogen gas feed on the growth of diamond by hot-filament chemical vapor deposition Baranauskas V, Ceragioli HJ, Peterlevitz AC, Tosin MC, Durrant SF |
309 - 314 |
Nucleation enhancement of diamond using natural lamellar hematite in the chemical vapor deposition process Baranauskas V, Peterlevitz AC, Ceragioli HJ, Durrant SF, Tosin MC |
315 - 319 |
Structural and photoluminescent properties of carbon structures on thick porous silicon Baranauskas V, Tosin MC, Peterlevitz AC, Ceragioli HJ, Durrant SF |
320 - 325 |
Studies on the structure and bonding state of nitric amorphous carbon (a-CNx) films by reactive rf magnetron sputtering Jung HS, Park HH |
326 - 330 |
The characterization of nitrogen content, diamond-like carbon field emission arrays using a magnetic filtered arc method Chen CF, Shen CH, Lin CL |
331 - 339 |
Deposition of well adhering cBN films up to 2 mu m thickness by B-C-N gradient layer system Yamamoto K, Keunecke M, Bewilogua K |
340 - 345 |
Influence of residual stress gradients on the adhesion strength of sputtered hard coatings Tonshoff HK, Seegers H |
346 - 353 |
Multi-pass sub-critical load testing of titanium nitride coatings Efeoglu I, Arnell RD |
354 - 359 |
Evaluation of the mechanical properties and tribological behavior of the CrN coating deposited on mild steel modified with electroless Ni interlayer Wu FB, Li JJ, Duh JG |
360 - 365 |
Study of mechanical behavior of diamond-like carbon coatings by several instrumented tribometers Gachon Y, Heau C |
366 - 372 |
Determination of mechanical film properties of a bilayer system due to elastic indentation measurements with a spherical indenter Chudoba T, Schwarzer N, Richter F, Beck U |
373 - 381 |
Determination of creep behaviour of monolayer thick plasma sprayed coatings, by means of the impact test and an analytical FEM supported evaluation procedure Bouzakis KD, Lontos A, Vidakis N, David K, Kechagias V |
382 - 388 |
A new method of determining strength and fracture toughness of thin hard coatings Jaeger G, Endler I, Heilmaier M, Bartsch K, Leonhardt A |
389 - 393 |
Qualitative study of beta silicon carbide residual stress by Raman spectroscopy Lu YM, Leu IC |
394 - 400 |
Progress in determination of the area function of indenters used for nanoindentation Herrmann K, Jennett NM, Wegener W, Meneve J, Hasche K, Seemann R |
401 - 406 |
Continuous stiffness measurement and creep behavior of composite magnetic tapes Li XD, Bhushan B |
407 - 412 |
Microstructure-property relationships in arc-evaporated Cr-N coatings Oden M, Almer J, Hakansson G, Olsson M |
413 - 417 |
Thickness dependence of morphology and mechanical properties of on-wafer low-k PTFE dielectric films Wang JG, Kim HK, Shi FG, Zhao B, Nieh TG |
418 - 424 |
In situ studies of diffusion and crystal growth in plasma deposited thin ITO films Wulff H, Quaas M, Steffen H, Hippler R |
425 - 429 |
A structural and mechanical analysis on PVD-grown (Ti,Al)N/Mo multilayers Tavares CJ, Rebouta L, Alves E, Cavaleiro A, Goudeau P, Reviere JP, Declemy A |
430 - 435 |
Optical emission spectroscopy of a PCVD process used for the deposition of TiN on cemented carbides Peter S, Richter F, Tabersky R, Konig U |
436 - 440 |
In situ hard coatings strain measurement using a commercial strain-gage device Cremona M, Gazola LM, do Carmo LCS, Castro JTP, Achete CA |
441 - 446 |
Structural and quantitative analysis of nitrided stainless steel coatings deposited by dc-magnetron sputtering Terwagne G, Colaux J, Collins GA, Bodart F |
447 - 454 |
Image plate X-ray diffraction and X-ray reflectivity characterization of protective coatings and thin films Lee SL, Windover D, Doxbeck M, Nielsen M, Kumar A, Lu TM |
455 - 459 |
Optical and electrical properties of transparent conductive ITO thin films deposited by sol-gel process Alam MJ, Cameron DC |
460 - 466 |
Characterisation by X-ray absorption spectroscopy of oxide thin films prepared by ion beam-induced CVD Holgado JP, Caballero A, Espinos JP, Morales J, Jimenez VM, Justo A, Gonzalez-Elipe AR |
467 - 472 |
The effects of pre-aging and concentration of surface modifying agent on the microstructure and dielectric properties of SiO2 xerogel film Kim JH, Jung SB, Park HH, Hyun SH |
473 - 477 |
A comparison of in situ polishing and ion beam sputtering as surface preparation methods for XPS analysis of PVD coatings Baker MA, Greaves SJ, Wendler E, Fox V |
478 - 483 |
Characterization of ternary Al-B-N films Witthaut M, Cremer R, Reichert K, Neuschutz D |
484 - 489 |
Coating of hydroxyapatite thin film by simultaneous vapor deposition Hamdi M, Hakamata S, Ektessabi AM |
490 - 494 |
Magnetron sputtering SiC films investigated by AFM Simao RA, Costa AK, Achete CA, Camargo SS |
495 - 500 |
Surface analysis of nanostructured ceramic coatings containing silicon carbide nanoparticles produced by plasma modulation chemical vapour deposition Bertran E, Viera G, Martinez E, Esteve J, Maniette Y, Farjas J, Roura P |
501 - 506 |
Formation of highly oriented GeBiSe films from the as-deposited amorphous state by annealing Rajagopalan T, Reddy GB |
507 - 511 |
Nano-organization of thin titanium films by an electrical field during vacuum arc deposition Parkansky N, Alterkop B, Goldsmith S, Boxman RL, Wulff H, Quaas M, Quade A |
512 - 517 |
Microstructural features of wear-resistant titanium nitride coatings deposited by different methods Fortuna SV, Sharkeev YP, Perry AJ, Matossian JN, Shulepov IA |
518 - 524 |
Ultrathin SiO2 film growth on Si by highly concentrated ozone Ichimura S, Kurokawa A, Nakamura K, Itoh H, Nonaka H, Koike K |
525 - 529 |
The effects of plasma treatment on SiO2 aerogel film using various reactive (O-2, H-2, N-2) and non-reactive (He, Ar) gases Kim JJ, Park HH, Hyun SH |
530 - 536 |
Micro-disperse particles as probes for plasma surface interaction Kersten H, Deutsch H, Otte M, Swinkels GHPM, Kroesen GMW |
537 - 542 |
Formation of ultra-thin continuous Pt and Al films by RF sputtering Kawamura M, Mashima T, Abe Y, Sasaki K |
543 - 549 |
Modelling of diffusion-precipitation in nitrided alloyed iron Goune M, Belmonte T, Fiorani JM, Chomer S, Michel H |
550 - 556 |
High rate and process control of reactive sputtering by gas pulsing: the Ti-O system Martin N, Bally AR, Hones P, Sanjines R, Levy F |
557 - 561 |
Influence of sputtering power and the substrate-target distance on the properties of ZrO2 films prepared by RF reactive sputtering Gao PT, Meng LJ, dos Santos MP, Teixeira V, Andritschky M |
562 - 566 |
Effects of nitrogen fraction on the structure of amorphous silicon-carbon-nitrogen alloys Gao Y, Wei J, Zhang DH, Mo ZQ, Hing P, Shi X |
567 - 572 |
Morphological and structural characteristics of homoepitaxial 4H-SiC thin films by chemical vapor deposition using bis-trimethylsilylmethane precursor Jeong JK, Na HJ, Kim BS, Um MY, Kim HJ |
573 - 577 |
Properties of titanium oxide biomaterials synthesized by titanium plasma immersion ion implantation and reactive ion oxidation Leng YX, Chen JY, Zeng ZM, Tian XB, Yang P, Huang N, Zhou ZR, Chu PK |
578 - 584 |
The effect of Cr interlayer on the microstructure of CrN coatings on steel Han S, Lin JH, Guo XJ, Tsai SH, Su YO, Huang JH, Lu FH, Shih HC |
585 - 591 |
Investigations on the energy influx at plasma processes by means of a simple thermal probe Kersten H, Rohde D, Berndt J, Deutsch H, Hippler R |
592 - 596 |
Palladium seeding on the tantalum-insulated silicon oxide film by plasma immersion ion implantation for the growth of electroless Copper Lin JH, Tsai YY, Chiu SY, Lee TL, Tsai CM, Chen PH, Lin CC, Feng MS, Kou CS, Shih HC |
597 - 601 |
Structural characterization of epitaxial Bi2Sr2CuO6+delta thin films deposited on SrTiO3 substrates using inverted cylindrical magnetron sputtering Ye M, Zhang YZ, de Marneffe JF, Delplancke-Ogletree MP, Deltour R |
602 - 606 |
Nanotribology and surface chemistry of reactively sputtered Ti-B-N hard coatings Ott RD, Ruby C, Huang F, Weaver ML, Barnard JA |
607 - 610 |
Influence of silane partial pressure on the properties of amorphous SiCN films prepared by ECR-CVD Zhang DH, Gao Y, Wei J, Mo ZQ |
611 - 616 |
Effect of elastic stresses on solid-state amorphization of Zr/Co multilayers Huh JY, Moon SJ |
617 - 620 |
Study on stress measurement of PVD-coating layer Murotani T, Hirose H, Sasaki T, Okazaki K |
621 - 625 |
XPS study of ion beam modified polyimide films Ektessabi AM, Hakamata S |
626 - 630 |
Investigation of the aluminium oxidation in an oxygen plasma excited by microwaves Quade A, Wulff H, Steffen H, Tun TM, Hippler R |
631 - 634 |
Optical constants of CNx thin films from reflection electron energy loss spectroscopy Barreca F, Mezzasalma AM, Mondio G, Neri F, Trusso S, Vasi C |
635 - 639 |
Nanoindentation with a Knoop indenter Riester L, Blau PJ, Lara-Curzio E, Breder K |
640 - 645 |
Study of electrical and interfacial properties of CVD-W/p-Si0.83Ge0.17/Si(001) Jang YC, Kim KS, Shin DO, Kim HJ, Shim KH, Lee NE, Youn SP, Roh KJ, Roh YH |
646 - 649 |
Superlattice effects on the amorphization of Ni-Ti multilayers Jankowski AF |
650 - 656 |
Behavior of the pulsed ion nitrided AISI 4140 steel/CVD TiN coatings as tribological pair Staia MH, Fragiel A, Bruhl SP, Feugeas JN, Gomez BJ |
657 - 664 |
Effect of substrate roughness induced by grit blasting upon adhesion of WC-17% Co thermal sprayed coatings Staia MH, Ramos E, Carrasquero A, Roman A, Lesage J, Chicot D, Mesmacque G |
665 - 674 |
Microstructural and tribological characterization of an A-356 aluminum alloy superficially modified by laser alloying Staia MH, Cruz M, Dahotre NB |
675 - 680 |
Role of hydrogen on adhesion of NiCr thermal sprayed coatings Lesage J, Chicot D, Araujo P, Zampronio M, De Miranda PEV |
681 - 686 |
Effect of thermal treatments on adhesive properties of a NiCr thermal sprayed coating Lesage J, Staia MH, Chicot D, Godoy C, De Miranda PEV |
687 - 693 |
Diffusion in Ti/TiC multilayer coatings Dahan I, Admon U, Frage N, Sariel J, Dariel MP |
694 - 698 |
Effects of additives on properties of MgO thin films by electrostatic spray deposition Kim SG, Choi KH, Eun JH, Kim HJ, Hwang CS |
699 - 704 |
Electron tunneling and noise studies in ferromagnetic junctions Nowak ER, Spradling P, Weissman MB, Parkin SSP |
705 - 711 |
Deposition technology for thin film magnetic recording heads reader fabrication Kools JCS, Rook K, Hegde H, Sant SB, Wong J, Xiong W, Druz B, Lam A, Devayasaham A, Wagner I |
712 - 718 |
Ferroelectric and antiferroelectric films for microelectromechanical systems applications Xu BM, Cross LE, Bernstein JJ |
719 - 726 |
In-plane tip deflection and force achieved with asymmetrical polysilicon electrothermal microactuators Kolesar ES, Ko SY, Howard JT, Allen PB, Wilken JM, Boydston NC, Ruff MD, Wilks RJ |
727 - 732 |
Chemical, optical and tribological characterization of perfluoropolymer films as an anti-stiction layer in micro-mirror arrays Lee KK, Cha NG, Kim JS, Park JG, Shin HJ |
733 - 738 |
Structural and electrical properties of Sr1-xBaxBi2Ta2O9 thin films Melgarejo R, Tomar MS, Dobal PS, Katiyar RS |
739 - 744 |
The effect of excess Pb content on the crystallization and electrical properties in sol-gel derived Pb (Zr0.4Ti0.6)O-3 thin films Yang JK, Kim WS, Park HH |
745 - 749 |
Thin films of lithium intercalation complex oxides for cathodes Nieto-Ramos S, Tomar MS, Hernandez S, Aliev F |
750 - 754 |
Transparent conducting films of In2O3-ZrO2, SnO2-ZrO2 and ZnO-ZrO2 Qadri SB, Kim H, Khan HR, Pique A, Horwitz JS, Chrisey D, Kim WJ, Skelton EF |
755 - 759 |
Coating of polymers with titanium-based layers by a novel plasma-assisted chemical vapor deposition process Breme F, Buttstaedt J, Emig G |
760 - 765 |
Hard coating adhesion on ion implanted polymer surfaces Guzman L, Miotello A, Voltolini E, Adami M |
766 - 771 |
Interface control in the chemical vapor deposition of titanium dioxide on silicon(100) Tuan A, Yoon M, Medvedev V, Ono Y, Ma Y, Rogers JW |
772 - 775 |
Electrical resistance of Ti-B-Al-O thin films deposited by r.f. magnetron sputtering Kim SK, Ahn YH |
776 - 780 |
Study the impact of liner thickness on the 0.18 mu m devices using low dielectric constant hydrogen silsesquioxane as the interlayer dielectric Lan JK, Wang YL, Wu YL, Liou HC, Wang JK, Chiu SY, Cheng YL, Feng MS |
781 - 787 |
Nitride thin films grown by pulsed laser deposition assisted by atomic nitrogen beam Fernandez FE, Rodrigez E, Pumarol M, Guzman T, Jia WY, Martinez A |
788 - 792 |
Low pressure plasma spray coatings Young EJ, Mateeva E, Moore JJ, Mishra B, Loch M |
793 - 797 |
Changes in chemical states of PET films due to low and high energy oxygen ion beam Ektessabi AM, Yamaguchi K |
798 - 802 |
Effect of aluminum doping on zinc oxide thin films grown by pulsed laser deposition for organic light-emitting devices Kim H, Pique A, Horwitz JS, Murata H, Kafafi ZH, Gilmore CM, Chrisey DB |
803 - 808 |
Growth of epitaxial doped strontium sulfide thin films by pulsed laser deposition Pique A, Auyeung RCY, Qadri SB, Kim H, Justus BL, Huston AL |