1 - 9 |
The synthesis and properties of the europium(III) complexes using trifluorene-phenanthroline derivative as ligand Yu JT, Xiao MJ, Tan H, Zhu WG |
10 - 16 |
Effect of the oxidation of aluminum bottom electrode in a functionalized-carbon nanotube based organic rewritable memory device Rosales-Gallegos IA, Avila-Nino JA, Reyes-Reyes M, Nunez-Olvera O, Lopez-Sandoval R |
17 - 24 |
Fluorine ligand exchange effect in poly (vinylidenefluoride-co-hexafluoropropylene) with embedded fluorinated barium titanate nanoparticles Han W, Yoo B, Kwon KH, Cho HH, Park HH |
25 - 32 |
A better understanding of Cbd-Zn(S, O) using hydrogen peroxide as an additive Hildebrandt T, Loones N, Schneider N, Vigneron J, Bouttemy M, Etcheberry A, Lincot D, Naghavi N |
33 - 40 |
Comprehensive structural characterization of CuNi (90/10) thin films prepared by DC magnetron sputtering Bukhari SM, Fritzsche H, Tun Z |
41 - 47 |
Thermoelectric energy harvesting using array of vertically aligned Al-doped ZnO nanorods Norouzi M, Kolahdouz M, Ebrahimi P, Ganjian M, Soleimanzadeh R, Narimani K, Radamson H |
48 - 52 |
Study on reverse-biased gate leakage current mechanisms in Al2O3/InAlAs metal-oxide-semiconductor structures Jin CJ, Lu HL, Zhang YM, Guan H, Li Z, Zhang YM |
53 - 60 |
Assessment of candidate metallization systems deposited on diamond using nano-indentation and nano-scratching tests Msolli S, Alexis J, Kim HS, Dalverny O, Karama M |
61 - 67 |
Annealing effects on the structural and electrical properties of sputtered tungsten thin films Kaidatzis A, Psycharis V, Mergia K, Niarchos D |
68 - 72 |
Growth of ZnO thin film on graphene transferred Si (100) substrate Lee A, Kim G, Yoo SJ, Cho IS, Seo H, Ahn B, Yu HK |
73 - 80 |
Characterization of thin MnSi and MnGe layers prepared by reactive UV pulsed laser deposition Kostejn M, Fajgar R, Dytrych P, Kupcik J, Drinek V, Jandova V, Huber S, Novotny F |
81 - 85 |
Epitaxial Ge2Sb2Te5 films on Si(111) prepared by pulsed laser deposition Hilmi I, Thelander E, Schumacher P, Gerlach JW, Rauschenbach B |
86 - 90 |
Effect of oxygen partial pressure on the structural and optical properties of ion beam sputtered TiO2 thin films Tantray FA, Agrawal A, Gupta M, Andrews JT, Sen P |
91 - 101 |
The influence of deposition temperature on the structure, microstructure, morphology and magnetic properties of sputter deposited nickel thin films Sharma A, Mohan S, Suwas S |
102 - 111 |
Complementary photogating effect in microcrystalline silicon n-i-p structures Rubinelli FA |
112 - 119 |
Substrate effects and evaluation of elastic moduli of components of inhomogeneous films by nanoindentation Kossovich EL, Borodich FM, Bull SJ, Epshtein SA |
120 - 124 |
Application of wide-energy-gap material 3,4-di(9H-carbazol-9-yl)benzonitrile in organic light-emitting diodes Tanaka Y, Takahashi T, Nishide J, Hiraga Y, Nakanotani H, Adachi C |
125 - 130 |
Influence of backbone structure on orientation of conjugated polymers in the dynamic casting of thin floating-films Pandey M, Pandey SS, Nagamatsu S, Hayase S, Takashima W |
131 - 136 |
Structural stability and electronic properties of multi-functionalized two-dimensional chromium carbides Je M, Lee Y, Chung YC |
137 - 143 |
Elaboration of nanostructured TiO2/SiO2 films by plasma enhanced chemical vapor deposition at atmospheric pressure Gazal Y, Dublanche-Tixier C, Antoine A, Colas M, Chazelas C, Tristant P |
144 - 147 |
Ni 3d - O 2p hybridization dependent magnetic properties of LaNiO3 thin films Kumar Y, Singh AP, Sharma SK, Choudhary RJ, Thakur P, Knobel M, Brookes NB, Kumar R |
148 - 152 |
Reduced parasitic contact resistance and highly stable operation in a-In-Ga-Zn-O thin-film transistors with microwave treatment Liu PT, Chang CH, Zheng GT, Fuh CS, Teng LF, Wu MC, Lee YJ |
153 - 159 |
Scanning tunneling microscopy study of the early stages of epitaxial growth of CoSi2 and CoSi films on Si(111) substrate: Surface and interface analysis Kotlyar VG, Alekseev AA, Olyanicha DA, Utas TV, Zotov AV, Saranin AA |
160 - 165 |
Properties of CrN/Mo2N nano-multilayer films synthesized by multi-cathodic arc ion plating system Han B, Pelenovich VO, Yousaf MI, Yan SJ, Wang W, Zhou SY, Yang B, Ai ZW, Liu CS, Fu DJ |
166 - 173 |
Non-doped red-green-blue electroluminescence for fumaronitrile and fluorene bridge with pyrenyl or phenanthrylamino group Zhang WG, Liang CJ, He ZQ, Wang YS, Zhao SM |
174 - 178 |
Unipolar resistance switching behavior of Pr4O7-Pr2CuO4-delta thin films Yin JT, Liu XS, Wei L, Yin YF, Zhang WF |
179 - 186 |
Slot-die coating of organic thin films for active-matrix organic light-emitting diode displays Shin D, Lee JY, Hong KY, Park J, Seo YS |
187 - 194 |
Superhydrophobic-electrochromic PEDOT/PFHP bilayer surfaces Caglar A, Yildirim M, Cengiz U, Kaya I |
195 - 201 |
Effects of Cr interlayer thickness on adhesive, structural, and thermoelectric properties of antimony telluride thin films deposited by radio-frequency magnetron sputtering Sasaki Y, Takashiri M |
202 - 207 |
Development and degradation behavior of protective multilayer coatings for aluminum reflectors for solar thermal applications Mishra SK, Kumar V, Tiwari SK, Mishra T, Angula G, Adhikari S |
208 - 213 |
Quantum efficiency modeling of thin film solar cells under biased conditions with a case study of CZTSSe solar cells Lee S, Price K, Park J |
214 - 219 |
Thickness dependence of electrical and piezoelectric properties of ferroelectric Ba0.8Sr0.2TiO3 thin films Kiselev DA, Afanasiev MS, Levashov SA, Sivov AA, Chucheva GV |
220 - 226 |
Surface defect passivation by a thin metallic barrier for Cu( InxGa1-x)Se-2 co-evaporation on Cr-steel substrates Donzel-Gargand O, Thersleff T, Fourdrinier L, Leifer K, Edoff M |
227 - 230 |
Study on ferromagnetic properties in FeCo-based amorphous thin films with different thickness Luo XJ, Zhou PH, Lu HP, Xie JL, Deng LJ |
231 - 238 |
Effects of high-k zirconium oxide (ZrO2) interlayer on the electrical and transport properties of Au/n-type InP Schottky diode Balaram N, Reddy MSP, Reddy VR, Park C |
239 - 249 |
Microstructure of hard and optically transparent HfO2 films prepared by high-power impulse magnetron sputtering with a pulsed oxygen flow control Pi NW, Zhang MH, Jiang JC, Belosludtsev A, Vlcek J, Houska J, Meletis EI |
250 - 260 |
Additional control of bombardment by deep oscillation magnetron sputtering: Effect on the microstructure and topography of Cr thin films Ferreira F, Serra R, Cavaleiro A, Oliveira JC |
261 - 264 |
High mobility thin film transistors based on zinc nitride deposited at room temperature Dominguez MA, Pau JL, Gomez-Castano M, Luna-Lopez JA, Rosales P |
265 - 272 |
Manganese half-sandwich complexes as metal-organic chemical vapor deposition precursors for manganese-based thin films Assim K, Jeschke J, Jakob A, Dhakal D, Melzer M, Georgi C, Schulz SE, Gessner T, Lang H |
273 - 280 |
Morphology and micro-structural studies of distinct silicon thin films deposited using very high frequency plasma enhanced chemical vapor deposition process Juneja S, Sudhakar S, Srivastava AK, Kumar S |
281 - 287 |
Elucidating the influences of mechanical bending on charge transport at the interfaces of organic light-emitting diodes Zhou H, Park JW |
288 - 296 |
Main properties of Al2O3 thin films deposited by magnetron sputtering of an Al2O3 ceramic target at different radio-frequency power and argon pressure and their passivation effect on p-type c-Si wafers Garcia-Valenzuela JA, Rivera R, Morales-Vilches AB, Gerling LG, Caballero A, Asensi JM, Voz C, Bertomeu J, Andreu J |
297 - 301 |
Effect of morphological and physicochemical properties of dielectric-organic semiconductor interfaces on photoresponse of organic phototransistors Park HL, Lee IH, Keum CM, Lee SH, Lee SD |
302 - 307 |
Processing of Al-doped ZnO protective thin films on aluminum current collectors for lithium ion batteries Teucher G, Van Gestel T, Krott M, Gehrke HG, Eichel RA, Uhlenbruck S |
308 - 316 |
Effect of substrate temperature on the structural and electrical properties of La and Mn co-doped BiFeO3 thin films Kolte J, Daryapurkar AS, Agarwal M, Gulwade DD, Gopalan P |
317 - 322 |
The effect of ozone concentration during atomic layer deposition on the properties of ZrO2 films for capacitor applications Song H, Jeon H, Shin C, Shin S, Jang W, Park J, Chang J, Choi JH, Kim Y, Lim H, Seo H, Jeon H |
323 - 327 |
Temperature dependences of current density-voltage and capacitance-frequency characteristics of hydrogenated nanocrystalline cubic SiC/crystalline Si heterojunction diodes Tabata A |
328 - 335 |
Comparative study on physical and electrochemical characteristics of thin films deposited from electroless platinum plating baths Mizuhashi S, Cordonier CEJ, Matsui H, Honma H, Takai O |
336 - 341 |
On the thickness dependence of both the optical band gap and reversible photodarkening in amorphous Ge-Se films Kutalek P, Tichy L |
342 - 346 |
Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition Hur M, Lee JY, Kang WS, Lee JO, Song YH, Kim SJ, Kim ID |
347 - 352 |
Charge carrier extraction study of hole mobility and dynamics in poly(3-hexylthiophene) films subjected to photothermal aging Moskvin YL, Piven NP, Susarova DK, Babenko SD, Troshin PA |
353 - 358 |
Microstruture and surface characteristics evolution of mesoporous multiple spin-coated titania films Geramipour T, Oveisi H |
359 - 363 |
Ellipsometric and magneto-optical study of nanosized ferromagnetic metal-dielectric structures [Co/TiO2](n)/Si Pavlov VV, Usachev PA, Stognij AI, Pashkevich MV, Novitskii NN, Rasing T, Pisarev RV |