| 1 - 2 |
Proceedings of the 6th International Conference on Microelectronics and Plasma Technology (ICMAP 2016), Gyeonju, Korea
[Anonymous] |
| 3 - 8 |
High performance a-InZnSnO thin-film transistor with a self-diffusion-barrier formable copper contact
Lee SH, Oh DJ, Hwang AY, Park JW, Jeong JK |
| 9 - 13 |
Structural and optical properties of Er-doped TiO2 thin films prepared by dual-frequency magnetron co-sputtering
Yang JQ, Hu YB, Jin CG, Zhuge LJ, Wu XM |
| 14 - 20 |
Enhanced efficiency of the honeycomb-structured film WO3 composed of nanorods for electrochromic properties
Lee Y, Choi HJ, Kim T, Hwang LH, Yu JH, Nam SH, Ryu DH, Boo JH |
| 21 - 26 |
Ethanol gas sensing using a networked PbO-decorated SnO2 nanowires
Hyun SK, Sun GJ, Lee JK, Lee C, Lee WI, Kim HW |
| 27 - 31 |
Inductively coupled plasma surface modification of polyethylene terephthalate and application in a triboelectric generator
Lim N, Hong D, Kim C, Jeong J, Lee HW, Kwon KH |
| 32 - 36 |
Effects of plasma treatment on the electrical reliability of multilayer MoS2 field-effect transistors
Lee BJ, Lee BJ, Lee J, Yang JW, Kwon KH |
| 37 - 42 |
Investigation on etching characteristics of Pd thin films using CH3COOH/Ar gas
Lee JY, Hwang SM, Choi JS, Cho DH, Chung CW |
| 43 - 48 |
Angular dependences of SiO2 etch rates at different bias voltages in CF4, C2F6, and C4F8 plasmas
Kim JH, Cho SW, Park CJ, Chae H, Kim CK |
| 49 - 54 |
Anisotropic etching of CoFeB magnetic thin films in C2H5OH/Ar plasma
Choi JS, Garay AA, Hwang SM, Lee JY, Cho DH, Chung CW |
