Thin Solid Films

Thin Solid Films, Vol.650 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (12 articles)

1 - 6	Dependence of photoluminescence of Bi-doped Y2O3 phosphor thin films on oxygen content in the sputtering atmosphere Lee HB, Kim SI, Lee JH, Kim YH
7 - 10	Deposition of highly oriented (K,Na)NbO3 films on flexible metal substrates Grivel JC, Thyden K, Bowen JR, Haugen AB
11 - 19	Adhesive-deformation relationships and mechanical properties of nc-AlCrN/a-SiNx hard coatings deposited at different bias voltages Harsani M, Ghafoor N, Calamba K, Zackova P, Sahul M, Vopat T, Satrapinskyy L, Caplovicova M, Caplovic L
20 - 31	Effects of cyclic deformation on a barrier thin film for flexible organic optoelectronic devices Tran DP, Lin CK, To BD
32 - 36	Effects of helium concentration on microcrystalline silicon thin film solar cells deposited by atmospheric-pressure plasma deposition at 13.3 kPa Kwon JD, Yang J, Park JS, Kang DW
37 - 43	Preparation of nickel-containing conductive amorphous carbon films by magnetron sputtering with negative high-voltage pulsed substrate bias Solovyev AA, Oskomov KV, Grenadyorov AS, Maloney PD
44 - 50	Magnetic parameters in giant magnetoresistance spin valve and their roles in magnetoresistance sensitivity Chung KH, Kim SN, Lim SH
51 - 57	Structural and compositional characteristics of vacuum deposited methylammonium lead halide perovskite layers in dependence on background pressure and substrate temperature Wittich C, Mankel E, Clemens O, Lakus-Wollny K, Mayer T, Jaegermann W, Kleebe HJ
58 - 64	Effects of silver segregation on sputter deposited antibacterial silver-containing diamond-like carbon films Wang LJ, Zhang F, Fong A, Lai KM, Shum PW, Zhou ZF, Gao ZF, Fu T
65 - 70	Effect of substrate bias on the growth behavior of iridium on A-plane sapphire using radio frequency sputtering at low temperatures Frank M, Sabine O, Andreas G, Eduard R, Eva-Regine C, Alexander F, Marco W, Lukas G, Frank B
71 - 77	Density and size effects on the thermal conductivity of atomic layer deposited TiO2 and Al2O3 thin films DeCoster ME, Meyer KE, Piercy BD, Gaskins JT, Donovan BF, Giri A, Strnad NA, Potrepka DM, Wilson AA, Losego MD, Hopkins PE
78 - 87	Fluorine doped titanium dioxide films manufactured with the help of plasma enhanced chemical vapor deposition technique Sobczyk-Guzenda A, Owczarek S, Wojciechowska A, Batory D, Fijalkowski M, Gazicki-Lipman M