화학공학소재연구정보센터

Thin Solid Films

Thin Solid Films, Vol.659 Entire volume, number list
ISSN: 0040-6090 (Print) 

In this Issue (12 articles)

1 - 6 Physical and electrical characteristics of GexSb100-x films for use as phase-change materials
Kim JH, Byeon DS, Ko DH, Park JH
7 - 15 A morphology study on the epitaxial growth of graphene and its buffer layer
Kruskopf M, Pierz K, Pakdehi DM, Wundrack S, Stosch R, Bakin A, Schumacher HW
16 - 23 Radio-frequency plasma-enhanced chemical vapour deposition of carbon films on AISI 316LVM steel: Formation of a transition layer and metal whiskers, and their influence on coating properties
Jastrzebski K, Grabarczyk J
24 - 35 Nucleation and growth of oriented metal-organic framework thin films on thermal SiO2 surface
Kim KJ, Zhang YJ, Kreider PB, Chong XY, Wang AX, Ohodnicki PR, Baltrus JP, Chang CH
36 - 40 Performance control for amorphous silicon germanium alloys by in situ optical emission spectroscopy
Wang GH, Shi CY, Zhao L, Mo LB, Diao HW, Wang WJ
41 - 47 Ultra-compact titanium oxide prepared by ultrasonic spray pyrolysis method for planar heterojunction perovskite hybrid solar cells
Hsieh HC, Yu JF, Rwei SP, Lin KF, Shih YC, Wang LY
48 - 56 Ordered titania nanotubes layer selectively annealed by laser beam for high contrast electrochromic switching
Siuzdak K, Szkoda M, Sawczak M, Karczewski J, Ryl J, Cenian A
57 - 63 Photocatalytic activity of BiOCl thin films deposited by thermal evaporation
Cuellar EL, Cortez JO, Martinez-de la Cruz A, Loera AG, Mendez UO
64 - 69 Formation of PtSn4 and PtSn in the initial reaction between Pt and molten Sn
Liu TY, Wang KK, Huang HC, Fang YS, Yeh CF, Hsu YW, Gan D, Huang HL
70 - 80 Depth profiling of noble gas atoms implanted in Al matrix: A photoelectron energy loss spectroscopy study
Godet C, Santana VMD, David DGF
81 - 88 Characterizations of thermal stability and electrical performance of Au-Ni coating on CuCrZr substrate for high vacuum radio-frequency contact application
Chen ZX, Hillairet J, Turq V, Song YT, Laloo R, Bernard JM, Vulliez K, Lombard G, Hernandez C, Yang QX, Ferreira L, Fesquet F, Mollard P, Volpe R
89 - 93 Thin films of relaxor ferroelectric/antiferroelectric heterolayered structure for energy storage
Nguyen MD, Rijnders G