Thin Solid Films

Thin Solid Films, Vol.682 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (23 articles)

1 - 9	Influence of nitrogen partial pressure on optical properties of magnetron sputtered Al-Si-N thin films Soni, Mishra SK, Sharma SK
10 - 17	Magneto-optical effect in GaAs/GaAlAs semi-parabolic quantum well Hien ND, Duque CA, Feddi E, Hieu NV, Trien HD, Phuong LT, Hoi BD, Hoa L, Nguyen CV, Hieu NN, Phuc HV
18 - 23	Growth and characterization of F-doped alpha-Ga2O3 thin films with low electrical resistivity Morimoto S, Nishinaka H, Yoshimoto M
24 - 28	Structural, chemical and electrical properties of CdS thin films fabricated by pulsed laser deposition using varying background gas pressure Martinez-Landeros VH, Hernandez-Como N, Gutierrez-Heredia G, Quevedo-Lopez MA, Aguirre-Tostado FS
29 - 36	Fabrication and characterization of furnace oxidized vanadium dioxide thin films Taylor S, Long LS, Wang LP
37 - 43	Fabrication and characterization of perovskite CH3NH3PbI3 films via two-step sol-gel process: Impact of soaking time of PbI2 Gao H, Meng X, Du YL, Gao XY
44 - 49	Growth of thin Sn films on Ag(111) studied with low-energy electron diffraction and X-ray photoelectron spectroscopy Luh DA, Wang CH, Yang YW
50 - 56	Tetraethylenepentamine and (3-aminopropyl)triethoxysilane adsorbed on multi-walled carbon nanotubes for stable water and ethanol nanofluids Jorge L, Coulombe S, Girard-Lauriault PL
57 - 62	Surface analysis and surface doping of graphene on indium-tin-oxide Christodoulou C, Wolter B, Ioakeimidis A, Chouliaras G, Wiesner S, Lauermann I, Centeno A, Zurutuza A, Fostiropoulos K
63 - 75	Multifunctional Ti based carbonitride coatings for applications in severe environments Pruncu CI, Vladescu A, Parau AC, Braic M, Dearn KD, Constantin LR, Braic V
76 - 81	Sputter deposited sub-stochiometric MoOx thin film as hole-selective contact layer for silicon based heterojunction devices Parashar PK, Komarala VK
82 - 92	Nanostructured molybdenum nitride-based coatings: Effect of nitrogen concentration on microstructure and mechanical properties Wang J, Munroe P, Zhou ZF, Xie ZH
93 - 98	Growth and characterization of gallium oxide films grown with nitrogen by plasma-assisted molecular-beam epitaxy Ngo TS, Le DD, Song JH, Hong SK
99 - 108	Cluster adsorption and migration energetics on hcp Ti (0001) surfaces via atomistic simulations El Atouani L, El Koraychy E, Sbiaai K, Mazroui M, Hasnaoui A
109 - 120	Influence of ion beam parameters onto two-dimensional optical thin film thickness distributions deposited by ion beam sputtering Sakiew W, Schrameyer S, Jupe M, Schwerdtner P, Erhart N, Starke K, Ristau D
121 - 125	Microscopic study of polydopamine modified BaTiO3/poly(vinylidene fluoride-trifluoroethylene) nanocomposite films Guo HY, Liu N, Liu X, Hong S
126 - 130	Role of chamber pressure on crystallinity and composition of silicon films using silane and methane as precursors in hot-wire chemical vapour deposition technique Madaka R, Kumari J, Kanneboina V, Jha HS, Agarwal P
131 - 134	Effects of oxygen partial pressure within the growth ambient on the properties and defect behavior of magnetron sputtered InCdO films Le NM, Lee CS, Patil V, Lee BT
135 - 141	Electrochromic properties of tungsten oxide films prepared by sparking method using external electric field Thongpan W, Louloudakis D, Pooseekheaw P, Kumpika T, Kantarak E, Panthawan A, Tuantranont A, Thongsuwa W, Singjai P
142 - 146	In-situ X-ray photoelectron spectroscopy analysis of the initial growth of CdS thin films by chemical bath deposition Garza-Hernandez R, Carrillo-Castillo A, Martinez-Landeros VH, Martinez-Puente MA, Martinez-Guerra E, Aguirre-Tostado FS
147 - 155	In-situ annealing characterization of atomic-layer-deposited Al2O3 in N-2, H-2 and vacuum atmospheres Broas M, Lemettinen J, Sajavaara T, Tilli M, Vuorinen V, Suihkonen S, Paulasto-Krockel M
156 - 162	Effects of ion irradiation on the structural and electrical properties of HfO2/SiON/Si p-metal oxide semiconductor capacitors Manikanthababu N, Saikiran V, Basu T, Prajna K, Vajandar S, Pathak AP, Panigrahi BK, Osipowicz T, Rao SVSN
163 - 168	Potentiostatically pretreated electrochromic tungsten oxide films with enhanced durability: Electrochemical processes at interfaces of indium-tin oxide Qu HY, Rojas-Gonzalez EA, Granqvist CG, Niklasson GA