Thin Solid Films

Thin Solid Films, Vol.236, No.1-2 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (64 articles)

1 - 5	Properties of Transparent Conducting Oxides Deposited at Room-Temperature Davis L
6 - 13	Optical Switching Technology for Glazings Lampert CM
14 - 19	Low-Temperature Preparation of Transparent Conducting ZnO-Al Thin-Films by Chemical Beam Deposition Sato H, Minami T, Takata S, Miyata T, Ishii M
20 - 26	SnO2 Transparent Conductor Films Produced by Filtered Vacuum Arc Deposition Benshalom A, Kaplan L, Boxman RL, Goldsmith S, Nathan M
27 - 31	Transparent Conducting P-Type NiO Thin-Films Prepared by Magnetron Sputtering Sato H, Minami T, Takata S, Yamada T
32 - 36	Characterization of N-CdS/P-Cugaxin1-Xse2 Thin-Film Heterojunctions Aparna Y, Reddy PS, Naidu BS, Reddy PJ
37 - 39	Low-Temperature Preparation of SrTiO3 Thin-Films Dayalan E, Tomar MS
40 - 45	Thermal-Stability of Pyrolytic Tin Oxide-Films on Aluminum Roos A, Chinyama G, Hedenqvist P
46 - 50	Optical-Properties and Equilibrium Temperatures of Titanium-Nitride and Graphite-Coated Langmuir Probes for Space Application Veszelei M, Veszelei E
51 - 57	Deposition and Characterization of Multicomponent Oxide-Films and Multilayers from Aqueous-Solution Exarhos GJ, Hess NJ
58 - 63	Silicon-Based, Protective Transparent Multilayer Coatings Deposited at High-Rate on Optical Polymers by Dual-Mode MW/RF PECVD Rostaing JC, Coeuret F, Drevillon B, Etemadi R, Godet C, Huc J, Parey JY, Yakovlev VA
64 - 66	Inhomogeneous Dielectrics Grown by Plasma-Enhanced Chemical-Vapor-Deposition Lim S, Ryu JH, Wager JF, Casas LM
67 - 71	Characterization of Magnetron-Sputtered Diamond-Like Thin-Films for Optical Coatings in Ir Clarke GA, Parsons RR
72 - 76	Thermal-Reaction of Ta Thin-Films with Polycrystalline Diamond Chen JS, Kolawa E, Nicolet MA, Pool FS
77 - 81	Effect of Oxygen on Hydrogenated Amorphous-Carbon Films Suefuji Y, Nakamura Y, Watanabe Y, Hirayama S, Tamaki K
82 - 86	Fabrication of Amorphous Diamond Films Falabella S, Boercker DB, Sanders DM
87 - 90	Selective-Area Deposition of Diamond on 4 in Si Wafers Hanni W, Muller C, Binggeli M, Hintermann HE, Krebs P, Grisel A
91 - 95	Plasma Diagnostics of a DC Arcjet Chemical-Vapor-Deposition Diamond Reactor Reeve SW, Weimer WA
96 - 102	Properties of Mixed-Phase BN Films Deposited by RF Pacvd Cameron DC, Karim MZ, Hashmi MS
103 - 105	Thermal-Expansion of Chemical-Vapor-Deposition Grown Diamond Films Qadri SB, Kim C, Skelton EF, Hahn T, Butler JE
106 - 110	Diamond Thin-Films Synthesized by a Multinozzle Oxy-Acetylene Chemical-Vapor-Deposition Method Zhu W, Tan BH, Tan HS
111 - 114	Application of Nickel-Plating for the Synthesis of Chemical-Vapor-Deposition of Diamond on Steels Shih HC, Hsu WT, Hwang CT, Sung CP, Lin LK, Lee CK
115 - 119	Nucleation of Diamond Particles by Hot-Filament Chemical-Vapor-Deposition Tamaki K, Watanabe Y, Nakamura Y, Hirayama S
120 - 124	Microwave Diamond Synthesis with High Oxygen Hydrocarbons (Carbon-Dioxide, Oxygen) Chen CF, Chen SH, Hong TM, Ko HW, Sheu SE
125 - 129	Calibration of an Off-Axis Quartz-Crystal Thickness Monitor for a Pulsed-Laser Deposition System Using a High-Resolution Scanning Electron-Microscope Walck SD, Zabinski JS, Donley MS, Bultman JE
130 - 134	XRD Characterization of Multilayered Systems Scardi P, Lutterotti L, Tomasi A
135 - 139	Temperature-Dependence of Atomic Mixing at the Copper-Silicon Interface Ektessabi AM
140 - 145	Low-Energy-Electron Microscopy Studies of Ge and Ag Growth on Si(111) Vandergon AW, Tromp RM, Reuter MC
146 - 152	Thermal Modeling of a Calorimetric Technique for Measuring the Emittance of Surfaces and Coatings Jaworske DA
153 - 158	Further Investigation of Proton Elastic-Scattering Cross-Section on Carbon and Silicon Xie T, Liu J, Fischbeck HJ
159 - 163	Energy Calibration Accomplished by Proton-Resonance Scattering Simulation Xie T, Liu J, Fischbeck HJ
164 - 168	Application of X-Ray Photoelectron-Spectroscopy Valence Bands in Studying Ceramic Surfaces and Interfaces Majumdar D, Chatterjee D
169 - 172	Auger-Electron Spectroscopy Studies of Interfacial Reactions in Metal/Semiconductor Multilayers Activated During Differential Scanning Calorimetry Measurements Zalar A, Hofmann S, Pimentel F, Panjan P
173 - 179	New Trends in Analytical Tribology Martin JM, Belin M
180 - 183	Optical-Properties and Surface-Morphology Studies of Palladium Contacts on Mercuric Iodide Single-Crystals George MA, Azoulay M, Burger A, Biao Y, Silberman E, Nason D
184 - 190	Decorative Hard Coatings - Advances in Optical Characterization Techniques Beck U, Reiners G, Witt K
191 - 198	Photothermal Characterization of Optical Thin-Films Wu ZL, Kuo PK, Wei LH, Gu SL, Thomas RL
199 - 203	Kinetics of Aluminum Film Oxidation Measured by a Modified Quartz-Crystal Microbalance Martin M, Fromm E
204 - 208	Investigation of the Adhesion Mechanisms of Silicon Alloy Thin-Films on Polymer Substrates by Ir Ellipsometry Drevillon B, Rostaing JC, Vallon S
209 - 213	Elastic Behavior of Tin Thin-Films Elena M, Bonelli M, Bottani CE, Ghislotti G, Miotello A, Mutti P, Ossi PM
214 - 218	The Nanoindentation Response of Systems with Thin Hard Carbon Coatings Hainsworth SV, Bartlett T, Page TF
219 - 224	The Temperature-Variant Hardness Response of Duplex Tbcs Twigg PC, Page TF
225 - 229	Finite-Element Studies of Tensile Testing on Thin-Film Multilayers Krus D, Hoffman RW
230 - 235	An Overview on Metal/Pet Adhesion Silvain JF, Ehrhardt JJ
236 - 239	Interface Structure and Adhesion of Sputtered Ti Layers on Si - The Effect of Heat-Treatment Kondo I, Yoneyama T, Kondo K, Takenaka O, Kinbara A
240 - 246	Cusp-Like Flaws Along a Rough-Surface Li JW, Chiu CH, Gao HJ, Wu TW
247 - 252	Measurement of Youngs Moduli of TiC-Coated Film by the X-Ray-Method Asada H, Kishi Y, Hirose Y
253 - 256	Measurement of the Adhesion of Tin and Al Coatings by Fracture-Mechanics Tests Muller D, Cho YR, Fromm E
257 - 266	Advanced Multilayer Metallization Schemes with Copper as Interconnection Metal Murarka SP, Gutmann RJ, Kaloyeros AE, Lanford WA
267 - 273	Properties of Titanium and Aluminum Thin-Films Deposited by Collimated Sputtering Liu D, Dew SK, Brett MJ, Janacek T, Smy T, Tsai W
274 - 280	Selective Plasma Deposition Ray MA, Duarte J, Mcguire GE
281 - 286	Stability and Surface-Morphology of Films Obtained by a Chemical-Vapor-Deposition Process Viljoen HJ
287 - 293	Characterization of Phosphosilicate Glass-Films Obtained Using Plasma-Enhanced Chemical-Vapor-Deposition from Tetraethylorthosilicate and Trimethylphosphite Pillote CL, Shemansky FA, Cale TS, Raupp GB
294 - 300	Kinetics and Conformality of Tin Films from Tdeat and Ammonia Cale TS, Chaara MB, Raupp GB, Raaijmakers IJ
301 - 305	Amorphous W40Re40B20 Diffusion-Barriers for (Si)/Al and (Si)/Cu Metallizations Kolawa E, Sun X, Reid JS, Chen JS, Nicolet MA, Ruiz R
306 - 310	Study of Sputtered Molybdenum Nitride as a Diffusion Barrier Anitha VP, Bhattacharya A, Patil NG, Major S
311 - 318	Properties of Chemical-Vapor-Deposited Titanium Nitride Price JB, Borland JO, Selbrede S
319 - 324	Evaluation of Amorphous (Mo, Ta, W)-Si-N Diffusion-Barriers for (Si)/Cu Metallizations Reid JS, Kolawa E, Ruiz RP, Nicolet MA
325 - 329	Manufacturing Aspects of Low-Pressure Chemical-Vapor-Deposited Tin Barrier Layers Travis EO, Fiordalice RW
330 - 333	Characterization of Low-Pressure Chemically Vapor-Deposited Tungsten Nitride Films Marcus SD, Foster RF
334 - 340	Spatial Composition Variation in Sputtered Ti-W Films Rogers BR, Cale TS
341 - 346	Mass and Surface Conductivity Gain on Polymer Surfaces Metallized Using Vacuum-Arc Deposition Boxman RL, Goldsmith S
347 - 351	Properties of Reactively Sputter-Deposited Ta-N Thin-Films Sun X, Kolawa E, Chen JS, Reid JS, Nicolet MA
352 - 358	3-Dimensional Simulation of an Isolation Trench Refill Process Liao H, Cale TS